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  3. Electronic Components and Modules
  4. Semiconductors and ICs
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  6. Circuit formation CVD (Chemical Vapor Deposition)

Circuit formation CVD (Chemical Vapor Deposition)

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last updated:Sep 04, 2023

デュブリン・ジャパン・リミテッド 本社
デュブリン・ジャパン・リミテッド 本社
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Maintain process stability! Arrange nanometer-thick films of dielectric and metallic materials.

We would like to introduce our semiconductor circuit formation process, "CVD (Chemical Vapor Deposition)." Chemical vapor deposition involves placing nanometer-thick films of dielectric and metal materials on a wafer. Since this process occurs at very high temperatures (800-2000°C), we maintain the safety of the process by cooling the equipment with a Dubrin rotary union. 【Features】 ■ Placement of nanometer-thick films of dielectric and metal materials on the wafer ■ Maintenance of process safety through equipment cooling with a Dubrin rotary union *For more details, please refer to the related links or feel free to contact us.

    Other semiconductors
07.PNG

Circuit formation CVD (Chemical Vapor Deposition)

07.PNG
07.PNG
  • Related Link - https://www.deublin.com/ja-JP/Industries/Semicondu…

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デュブリン・ジャパン・リミテッド

デュブリン・ジャパン・リミテッド 本社

Machine elements and parts

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Since our establishment in 1945, we have maintained the philosophy of providing our customers with the best products as a dedicated manufacturer of rotary joints. In recent years, we have also created unique products based on our original design concepts in slip rings, which facilitate the exchange of electrical signals, data, and power in rotating bodies. To realize our customers' visions, we will propose strong solutions through our skilled engineering team and modern manufacturing facilities. We will provide the best products that truly satisfy our users. We have launched a Japanese website. https://www.deublin.com/ja-JP/

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