Tohoku University Technology: High-density plasma sputtering device: T16-141
Damage-less sputtering / Independent control of ion energy and flux / Useable in ferromagnetic target
With the increase of request for device miniaturization and thin crystal film quality improvement, the ion damage on substrate has become a major issue in sputtering. The magnetron sputtering method is widely used but since the plasma is formed directly between the target material and the substrate, “1 it is difficult to avoid ion damage”. This issue is amplified when generating highdensity plasma. In addition, since a single power supply is responsible for both the plasma generation and ion attraction, “2 it is impossible to independently control the ion flux and energy flowing into the target material”. Moreover, since the plasma is confined by the magnetic leakage flux on the target surface, “3 it is difficult to use for ferromagnetic material target”. This invention solves above 1/2/3 issues by generating highdensity plasma with helicon discharge and by controlling the plasma shape with a curved magnetic field, etc. This invention could also be considered to be used as a heating mechanism of the target material, or as an uniform & fast film deposition.
Inquire About This Product
basic information
For details, please contact us or refer to the PDF.
Price range
Delivery Time
Applications/Examples of results
For details, please contact us or refer to the PDF.
catalog（1）
Download All Catalogs
Company information
The revenue generated from technology transfer is reinvested as new research funding for universities and researchers, and is utilized to create further research outcomes. To ensure the smooth operation of this cycle, known as the "Intellectual Creation Cycle," we will vigorously promote technology transfer. The types of seeds we handle include patents, know-how, databases, and programs. We have established a collaborative framework by signing basic technology transfer agreements with the following universities (as of June 1, 2025): Tohoku University, Hirosaki University, Iwate University, Akita University, Fukushima University, Yamagata University, Tohoku Gakuin University, Iwate Medical University, Fukushima Medical University, Aizu University, Miyagi University, Hokkaido University, Muroran Institute of Technology, and Showa Medical University.
![[Leveling Correction] Leveling correction of concrete floors "Teratec Method"](https://image.mono.ipros.com/public/product/image/d08/1267539002/IPROS70063422645318547243.jpeg?w=280&h=280)
