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  6. Water-based flux cleaning agent for semiconductors HYDRON SE 230A

Water-based flux cleaning agent for semiconductors HYDRON SE 230A

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last updated:Apr 15, 2025

ゼストロンジャパン
ゼストロンジャパン
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Low surface tension is a characteristic! It provides good cleaning results even in narrow spaces.

"HYDRON SE 230A" is a one-phase type water-based cleaning agent for immersion processes. It reliably removes flux residues generated during die attach from various semiconductors such as lead frames, discrete components, power modules, power LEDs, flip chips, and CMOS. Additionally, it excels in removing oxide films from copper substrates in post-processes such as wire bonding and molding. 【Features】 ■ Activates copper substrates without staining and maintains the activated surface for a certain period ■ Excellent material compatibility with highly sensitive materials ■ Superior flux removal after wafer bump formation ■ Easy process management due to its one-phase structure, demonstrating excellent performance in immersion processes ■ Good rinsing properties with ion-exchanged water, leaving no residues *For more details, please refer to the PDF document or feel free to contact us.

    Cleaning agents
HYDRON

Water-based flux cleaning agent for semiconductors HYDRON SE 230A

HYDRON SE 230A.png
HYDRON SE 230A.png
  • Related Link - https://www.zestron.com/jp/product-information/pro…
  • Special site - Product/service details - https://pr.mono.ipros.com/zestron/product/

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Alkaline flux cleaner "HYDRON SE 230A"

Alkaline flux cleaner "HYDRON SE 230A"

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Zestron is a global standard "flux cleaning agent manufacturer" based in Germany, with eight locations worldwide. Our cleaning agents are primarily environmentally friendly water-based cleaners that achieve a balance between cleaning performance and safety, while also enabling the reduction of organic solvents, VOCs, and overall usage to lower costs. At our technical center in Kanagawa, customers can choose from inline and batch-type spray cleaning equipment, as well as jet and ultrasonic devices, tailored to their needs, allowing them to test work cleaning under conditions equivalent to those in production environments. In parallel with the cleaning tests, we analyze cleanliness at our analysis center. Utilizing digital microscopes, FT-IR, ion chromatography, and SEM-EDX/EDS, we can detect flux residues that are often overlooked by visual inspection. After the tests are completed, our engineers will provide a technical report detailing recommended processes. *We generally offer support for cleaning process issues free of charge. If you have any requests or challenges related to flux cleaning, please feel free to contact us.

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