LPP-EUV light source that achieves high brightness and low debris.
ISTEQ's TEUS series is an EUV light source that utilizes laser-produced plasma, achieving high brightness and low debris. Unlike conventional droplet targets, it prevents the adhesion of debris generated during plasma formation to the optical system.
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basic information
- Reduce adhesion of scattered debris to the optical system - Achieve a stable target surface through high-speed rotation of the target - Achieve a maximum output of 44 mW (13.5nm±1%) (TEUS S-400)
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Applications/Examples of results
- Research and inspection of EUV mask blanks - Research and inspection of optical components for EUV - Mask and surface inspection - Materials science - Wafer inspection
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K.L.V. has been discovering cutting-edge optical components from around the world and supporting the development of various optical technologies, particularly in the fields of medicine, environment, and analysis. With the theme of "SOLUTION FOR OPTICAL SYSTEM DEMANDS," we are actively building and expanding our optical solution business. We aim to respond to our customers' increasingly sophisticated and diverse needs more quickly and accurately than anyone else, becoming a company that contributes to both business and society. As a "specialized trading company proposing the utilization of optical energy," we invite you to look forward to our unique and promising optical solutions that will pave the way for a new era of light.