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  6. Semiconductor device failure analysis solution

Semiconductor device failure analysis solution

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last updated:Oct 09, 2024

プラズマ・サーモ・ジャパン
プラズマ・サーモ・ジャパン
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In the dry etching process, precise exposure of the insulating layer and metal layer is possible!

The "Corial Shuttleline Series for Failure Analysis" is a failure analysis device capable of selectively removing not only the insulating layers of semiconductor ICs but also the metal layers. It features a small footprint and is a cost-effective failure analysis system. To maintain electrical characteristics, it provides highly precise etching processes using RIE and ICP-RIE, ranging from multi-level deprocessing that does not etch the metal layers to damage-free processes with high selectivity, including metal etching. The failure analysis solution can analyze die packages and full wafers up to 200mm. 【Features】 ■ Does not etch metal layers to maintain electrical characteristics ■ High selectivity processes including metal etching from multi-level deprocessing ■ Reduces analysis time from 1 to 5 days with wet etching to just 1 to 2 hours *For more details, please feel free to contact us.

    Other analyses
故障解析用Corial

Semiconductor device failure analysis solution

故障解析用Corial Shuttlelineシリーズ1.JPG
故障解析用Corial Shuttlelineシリーズ1.JPG
  • Related Link - https://www.plasmatherm.com/

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【Other Features】 - Capable of analyzing not only wafers up to 200mm but also die and package die - Prevents over-etching by adopting a highly sensitive endpoint detection system - Enables efficient substrate temperature control through backside helium cooling - Compact footprint with high cost-effectiveness (reducing the conventional footprint by 30%) *For more details, please feel free to contact us.

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【Purpose】 ■ Etching processes for dielectric layers and metal layers in individual steps during failure analysis of semiconductor ICs, etc. *For more details, please feel free to contact us.

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プラズマ・サーモ・ジャパン

プラズマ・サーモ・ジャパン

Electronic Components and Semiconductors

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Our company offers etching, film deposition, and cutting equipment utilizing plasma technology, as well as the sale of ICP, RIE, DSE, IBE, IBD, PECVD, HDPCVD, and HDRF F.A.S.T.-ALD equipment, along with customer service related to these devices. Plasma-Therm LLC, headquartered in Florida, USA, was established in 1974. Since its founding, it has been manufacturing and selling semiconductor manufacturing equipment utilizing plasma technology for 48 years. Please feel free to contact us for inquiries. ▼ Group company Corial official website https://corial.plasmatherm.com/en

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