This paper introduces the principle of sspICP-MS and presents a case study on the measurement of metal particles in photoresist.
The technical information magazine The TRC News provides the latest information on analytical techniques that are useful for research and development, solving production troubles, and quality control. **Abstract** Single Particle ICP-MS (hereafter spICP-MS) is a method that utilizes the high sensitivity and elemental selectivity of ICP-MS to detect tiny and trace particles containing specific metals, allowing for the acquisition of their concentration and particle size distribution. This article introduces the principles of spICP-MS and presents a case study measuring metal particles in photoresist. **Table of Contents** 1. Introduction 2. Principles and Features of spICP-MS 3. Direct Introduction Method for Organic Solvents 4. Analysis of Al, Fe, and Cu Particles in Photoresist 5. Conclusion
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Technical Information Magazine The TRC News "Analysis of Metal Particles in Photoresist Using spICP-MS" [Abstract] Single Particle ICP-MS (hereinafter spICP-MS) is a method that utilizes the high sensitivity and elemental selectivity of ICP-MS to detect small and trace particles containing specific metals, allowing for the acquisition of their concentration and particle size distribution. This article introduces the principles of spICP-MS and presents case studies measuring metal particles in photoresist. [Table of Contents] 1. Introduction 2. Principles and Features of spICP-MS 3. Direct Introduction Method for Organic Solvents 4. Analysis of Al, Fe, and Cu Particles in Photoresist 5. Conclusion [Figures and Tables] Figure 1 Image of signals detected by ICP-MS Table 1 Concentrations of Cu, Fe, and Al measured by ICP-MS Figure 2 spICP-MS measurement results of Al, Fe, and Cu particles in PGMEA Figure 3 spICP-MS measurement results of Al, Fe, and Cu particles in photoresist
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