This paper presents an analysis example of the temporal changes of PVA film immediately after spin coating using ellipsometry and the evaluation of inclined etching of silicon insulating films.
The technical information magazine The TRC News provides the latest information on analytical techniques that are useful for research and development, solving production troubles, and quality control. **Abstract** Spectroscopic ellipsometry is known as a method for measuring changes in the polarization state of light to evaluate optical constants (refractive index and extinction coefficient) and film thickness. This article presents analysis examples using the high-speed spectroscopic ellipsometer M-2000UI, which was introduced in 2021, focusing on the temporal changes immediately after spin-coating PVA films and the evaluation of inclined etching of silicon insulating films. **Table of Contents** 1. Introduction 2. About Ellipsometry 3. Temporal Changes Immediately After Spin-Coating PVA Films 4. Evaluation of Inclined Etching of Silicon Insulating Films 5. Conclusion
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Technical Information Magazine The TRC News "Evaluation of Optical Constants and Film Thickness of Thin Films Using Ellipsometry" [Abstract] Spectroscopic ellipsometry is known as a method for measuring changes in the polarization state of light to evaluate optical constants (refractive index and extinction coefficient) and film thickness. This article presents analysis examples of the time-dependent changes immediately after spin-coating PVA films using the high-speed spectroscopic ellipsometer M-2000UI introduced in 2021, as well as the evaluation of inclined etching of silicon insulating films. [Table of Contents] 1. Introduction 2. About Ellipsometry 3. Time-dependent Changes Immediately After Spin-Coating PVA Films 4. Evaluation of Inclined Etching of Silicon Insulating Films 5. Conclusion [Figures and Tables] Figure 1 Change in the polarization state of reflected light Figure 2 Measurement analysis results of PVA film/thermal oxide film/Si substrate Figure 3 Wavelength dispersion of the refractive index of PVA film (red) and thermal oxide film (blue) Figure 4 Time-dependent changes in film thickness and refractive index of PVA film during drying in air after spin-coating Figure 5 Changes in moisture content in the PVA film during drying in air after spin-coating Figure 6 Inclined surface obtained from an automatic etching device Figure 7 Thickness distribution of the thermal oxide film on the inclined etched thermal oxide film/Si substrate Figure 8 Change in film thickness in the Y-axis direction at X=0.45 cm
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