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  6. The finishing accuracy of polishing is determined by the condition of the polishing pad.

The finishing accuracy of polishing is determined by the condition of the polishing pad.

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last updated:Feb 12, 2026

八千代マイクロサイエンス
八千代マイクロサイエンス
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The basics of polishing involve the maintenance and management of the precision of the polishing pads. It is dangerous if symptoms such as the following are observed.

Isn't this something you've experienced? - The polishing time has increased. - Decreased yield (the workpiece edge becomes rounded). - There are times when flatness is compromised. While the condition of the polishing material and the polishing processing conditions also have an impact, let's first check if the accuracy of the PAD has deteriorated. The basic idea of polishing is that the accuracy of the polishing PAD is transferred to the workpiece. In many cases, a DP correction carrier is used for PAD correction. However, it is often used without much thought, and the most important point, "correction," is frequently not done properly. To determine if the correction carrier is suitable, please check the following: - Is the PAD designed to be correctable? - Is a DP that can dress the PAD being used? - Is the overall thickness of the correction carrier uniform? If you experience any of the following after using the correction carrier in polishing: - The polishing rate does not recover. - The yield does not improve (does not return). - Changes in the PAD surface condition are not noticeable. Please feel free to consult with us. If you have been using it for a long time without maintenance, the correction capability may have been lost.

    Wafer processing/polishing equipment
修正キャリア_550x550px

The finishing accuracy of polishing is determined by the condition of the polishing pad.

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  • Grinding and Polishing Technology Information Site - GrindingPolishing.com - Contact Page
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【Free Trial Available】 You can experience the highly praised "Ultra-Lightweight DP Equipped Correction Carrier" for free, depending on the machine size and specifications. Especially for large models, users have been very pleased with the improved safety and workability, so we highly recommend trying this product. 【Track Record】 1. Machine Size 3B to 28B (Larger models such as 32B are available upon consultation) 2. Particle Size #140 to #1500 We will make suggestions based on your needs. Some free test loan samples are available. 3. Weight Approximately 10-20% the weight of cast iron carriers (excellent workability) 9B: about 0.7 kg per piece 28B: about 3.2 kg per piece 【The following information will help ensure a smooth process.】 - Current usage of correction carriers Machine size / Correction carrier specifications (gear information, number, etc.) Base plate size / Current challenges and issues, etc. Loan period: Up to 1 month

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【Usage Examples】 - Used immediately after replacement, before starting work, and after completion. - Place evenly on the polishing plate (usually 4 pieces/set) and use while flowing water. * There are many cases where the dressing work time has improved from 2 hours to about 10-30 minutes. - After completion, wash the correction carrier and store it (can be wall-mounted due to lightweight). We will also provide information on maintenance methods for the DP-equipped correction carrier (re-sharpening), etc. * Re-sharpening using grinding pads before replacement is possible (sharpening work can also be done for a fee). * There are customers who have been using it maintenance-free for over 10 years since introduction.

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YMI correction carrier for double-sided grinding pad

YMI correction carrier for double-sided grinding pad

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八千代マイクロサイエンス

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Since its establishment in 1937 (Showa 12), Yachiyo Micro Science has been a specialized trading company for grinding and polishing materials, while also continuously engaging in product development related to grinding and polishing through its research and development department. We also operate the technical information sites "Grinding and Polishing .COM" and "Aglutinants .COM." Please take a look.

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