Scanning Liquid Nanoparticle Counter STPC 3

Liquid Particle Counter (Semiconductor and Wafer Related)

Are you familiar with Particle Precursors? The cleaning process, which removes debris and contaminants, is extremely important for improving semiconductor yield, and foundries must manage the cleanliness of UPW (Ultra-Pure Water) and chemicals used in cleaning. Until now, liquid-phase particles have been considered a cause of yield reduction, with management focusing on keeping "the number of 20nm particles below a certain threshold." However, it has recently been recognized that contaminants, which are not visible as particles but dissolve in UPW or chemicals and appear when dried, negatively impact yield. "While they couldn't be counted in the liquid, they manifest on the wafer like a stain..." These contaminants are referred to as Particle Precursors. In an environment where terms like miniaturization and integration are prevalent, foundries and suppliers interested in managing particles and precursors in UPW (Ultra-Pure Water) and chemicals (IPA, ammonium hydroxide, hydrogen peroxide, hydrochloric acid, PGME) are encouraged to reach out for inquiries.

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