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  3. Scientific and Physics Equipment
  4. Cleaning machine
  5. Ultrasonic Cleaner
  6. Cleaning unit for semiconductor wafers 'PA10-Q60AE-S'

Cleaning unit for semiconductor wafers 'PA10-Q60AE-S'

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last updated:Dec 11, 2025

プレテック 静岡製作所
プレテック 静岡製作所
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Efficient removal of fine particles through direct substrate irradiation. Precision wafer cleaning unit using high-frequency megasonic. *Demo unit available.

The proximity megasonic cleaning unit "PA10-Q60AE-S" directly irradiates high-frequency sound waves of 1.0MHz or 3.0MHz onto the substrate, efficiently removing fine particles and residues in a non-contact manner. Equipped with a unique liquid supply system, it ensures a uniform cleaning area up to the outer edge of the substrate. It minimizes liquid splatter and energy loss, making it suitable for the precise cleaning of semiconductor wafers and photomask substrates with fine structures. The main body is made of high-purity quartz, which has low dust generation and excellent chemical resistance, allowing for combined cleaning with strong acids and strong alkalis. Its direct irradiation method above the substrate is compatible with single-wafer cleaning devices, enabling flexible design for each process. [Applications] - Removal of fine particles from semiconductor wafers - Cleaning of residues after photoresist stripping - Cleaning after TSV, MEMS structures, and film formation, etc. *Demo units are available for you to check the usability. *For more details, please download the PDF or feel free to contact us.

    Ultrasonic Cleaner
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Cleaning unit for semiconductor wafers 'PA10-Q60AE-S'

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  • Related Link - https://www.pre-tech.co.jp/
  • Special site - Product/service details - https://pr.mono.ipros.com/pre-tech/product/

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【Other Features】 ■ Capable of liquid supply with anti-miss function ■ Enables sweeping motion on the substrate, achieving highly reproducible cleaning across the entire substrate *For more details, please download the PDF or feel free to contact us.

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【Usage】 ■ Cleaning of silicon wafers, photomasks, LCD glass, magnetic disks, etc., cleaning after CMP, single wafer cleaning * For more details, please download the PDF or feel free to contact us.

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Comprehensive Catalog of Cleaning Equipment

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プレテック 静岡製作所

プレテック 静岡製作所

Industrial Electrical Equipment

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Our company develops, designs, manufactures, and sells various equipment tailored to customer applications and manufacturing lines in the semiconductor, photomask, disk, and lens industries. We specialize in customized production based on customer specifications, providing total support for the product lifecycle from design, development, assembly, inspection, installation, to maintenance. By building close relationships with customers at every stage, we can directly sense the issues and technological trends they perceive, allowing us to quickly initiate development in response.

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