Visualizing values below ng/cm² that were not visible with conventional QCM.
The AWSensors X1 / X4 series is an acoustic wave sensor measurement platform that quantitatively measures adsorption, desorption, and reactions occurring on solid surfaces in real-time. It decomposes the structural changes of trace adsorption, thin hydration layers, and sub-monolayer films that were buried in the signals of conventional 5–10 MHz QCMs, using the high mass resolution of HFF-QCM (50–150 MHz) (gas phase 8 pg/cm², liquid phase 0.6 ng/cm² class). The main feature is the ability to switch and operate three types of sensors—HFF-QCM, Classical QCM, and Love-SAW (120 MHz)—on the same platform without changing the main unit. It supports tracking of cycle units for initial growth in ALD, in-situ observation of SEI formation in secondary batteries, and label-free quantification of biomolecules in liquid, all with a single device. It simultaneously acquires up to 7 overtone Δf / ΔD at 250 samples per second, automatically applying Sauerbrey conversion and Voigt fitting. With a modular configuration that accommodates small samples, Ar glove boxes, and in-situ electrochemistry, it adapts to the expansion of research themes.
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basic information
Number of Channels (Simultaneous Measurement)14 Supported Sensor TypesQCM / HFF-QCM / Love-SAWQCM / HFF-QCM / Love-SAW Measurement Mode"Tracking Mode / High Resolution Mode (Single Harmonic / Multiple Harmonics)""Tracking Mode / High Resolution Mode (Single Harmonic / Multiple Harmonics)" Number of OvertonesMax 7 (Fundamental + 6 Harmonics)Max 7 (Fundamental + 6 Harmonics) Operating Frequency Range4 MHz to 160 MHz4 MHz to 160 MHz Frequency Resolution0.1 Hz0.1 Hz Frequency Accuracy±0.5 Hz±0.5 Hz Mass Sensitivity (Gas Phase)8 pg/cm²8 pg/cm² Mass Sensitivity (Liquid Phase)0.6 ng/cm²0.6 ng/cm² Dissipation Sensitivity (Gas Phase)1.71×10⁻¹⁰1.71×10⁻¹⁰ Dissipation Sensitivity (Liquid Phase)3.5×10⁻⁸3.5×10⁻⁸ Maximum Sampling Rate250 samples/sec250 samples/sec Temperature Control Range (with TCU)15 °C to 45 °C15 °C to 45 °C Temperature Stability±0.05 °C"±0.05 °C"
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Applications/Examples of results
■ Semiconductor and Thin Film Processes (ALD/CVD) - Quantification of precursor adsorption amount for ALD - Detection of nucleation onset timing (incubation time) - High-resolution monitoring of growth per cycle (GPC) - Confirmation of self-limiting adsorption (evaluation of saturation behavior) ■ Secondary Batteries and Electrochemistry - Simultaneous tracking of mass change and viscoelastic change during SEI (solid electrolyte interface) formation - Quantification of deposition amount of electrolyte decomposition products in cathode and anode materials - In-situ measurement linked to electroplating and dissolution processes (eQCM-D) - Quantification of swelling and contraction of polymer electrolytes ■ Adhesives, Coatings, and Surface Treatments - Tracking of resin curing process (viscoelastic change) at adhesive interfaces - Evaluation of film thickness and density of surface modification layers such as silane coupling agents - Long-term stability evaluation of anti-corrosion and anti-fouling coatings - Interfacial behavior of lubricating films and PFAS alternative films Achieved 1-2 orders of magnitude sensitivity improvement over conventional SPR and QCM, with LOD equivalent to ELISA.
Company information
Matsubo provides services in two business areas: [Industrial Machinery & Information] and [Powder Technology], supported by a [Technical Center] backup system. Breaking away from the confines of a specialized machinery trading company, we have established a comprehensive service system to ensure our customers can use our products with confidence, ranging from consulting prior to implementation, engineering related to installation and localization, to maintenance and proposals for improvements and modifications after installation.
