QCM-D measurement system

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AWS X1 / X4 Series

last updated：May 14, 2026

マツボー

Visualizing values below ng/cm² that were not visible with conventional QCM.

The AWSensors X1 / X4 series is an acoustic wave sensor measurement platform that quantitatively measures adsorption, desorption, and reactions occurring on solid surfaces in real-time. It decomposes the structural changes of trace adsorption, thin hydration layers, and sub-monolayer films that were buried in the signals of conventional 5–10 MHz QCMs, using the high mass resolution of HFF-QCM (50–150 MHz) (gas phase 8 pg/cm², liquid phase 0.6 ng/cm² class). The main feature is the ability to switch and operate three types of sensors—HFF-QCM, Classical QCM, and Love-SAW (120 MHz)—on the same platform without changing the main unit. It supports tracking of cycle units for initial growth in ALD, in-situ observation of SEI formation in secondary batteries, and label-free quantification of biomolecules in liquid, all with a single device. It simultaneously acquires up to 7 overtone Δf / ΔD at 250 samples per second, automatically applying Sauerbrey conversion and Voigt fitting. With a modular configuration that accommodates small samples, Ar glove boxes, and in-situ electrochemistry, it adapts to the expansion of research themes.

Special site - Product/service details - https://pr.mono.ipros.com/matsubo/product/

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basic information

Number of Channels (Simultaneous Measurement)14 Supported Sensor TypesQCM / HFF-QCM / Love-SAWQCM / HFF-QCM / Love-SAW Measurement Mode"Tracking Mode / High Resolution Mode (Single Harmonic / Multiple Harmonics)""Tracking Mode / High Resolution Mode (Single Harmonic / Multiple Harmonics)" Number of OvertonesMax 7 (Fundamental + 6 Harmonics)Max 7 (Fundamental + 6 Harmonics) Operating Frequency Range4 MHz to 160 MHz4 MHz to 160 MHz Frequency Resolution0.1 Hz0.1 Hz Frequency Accuracy±0.5 Hz±0.5 Hz Mass Sensitivity (Gas Phase)8 pg/cm²8 pg/cm² Mass Sensitivity (Liquid Phase)0.6 ng/cm²0.6 ng/cm² Dissipation Sensitivity (Gas Phase)1.71×10⁻¹⁰1.71×10⁻¹⁰ Dissipation Sensitivity (Liquid Phase)3.5×10⁻⁸3.5×10⁻⁸ Maximum Sampling Rate250 samples/sec250 samples/sec Temperature Control Range (with TCU)15 °C to 45 °C15 °C to 45 °C Temperature Stability±0.05 °C"±0.05 °C"

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Applications/Examples of results

■ Semiconductor and Thin Film Processes (ALD/CVD) - Quantification of precursor adsorption amount for ALD - Detection of nucleation onset timing (incubation time) - High-resolution monitoring of growth per cycle (GPC) - Confirmation of self-limiting adsorption (evaluation of saturation behavior) ■ Secondary Batteries and Electrochemistry - Simultaneous tracking of mass change and viscoelastic change during SEI (solid electrolyte interface) formation - Quantification of deposition amount of electrolyte decomposition products in cathode and anode materials - In-situ measurement linked to electroplating and dissolution processes (eQCM-D) - Quantification of swelling and contraction of polymer electrolytes ■ Adhesives, Coatings, and Surface Treatments - Tracking of resin curing process (viscoelastic change) at adhesive interfaces - Evaluation of film thickness and density of surface modification layers such as silane coupling agents - Long-term stability evaluation of anti-corrosion and anti-fouling coatings - Interfacial behavior of lubricating films and PFAS alternative films Achieved 1-2 orders of magnitude sensitivity improvement over conventional SPR and QCM, with LOD equivalent to ELISA.