Block isocyanate compatible with low-temperature, high-speed curing at 100°C in pMDI-based solutions.
Blonate 1447V is a blocked isocyanate that uses polymeric MDI blocked with amine. It is suitable for low-temperature and fast curing, making it ideal for manufacturing with short cycles such as hot pressing. **Features** - pMDI-based, amine-blocked - Low-temperature, fast curing type that progresses at 100°C - Compatible with short hot press processes *For more details, please download the PDF or feel free to contact us.*
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basic information
【Specifications】 ■ Main component: Amine-blocked isocyanate ■ Appearance: Yellow liquid ■ Active ingredient: 50% ■ NCO%: 2.5% ■ Solvent: Isophorone ■ Viscosity: 2,800 mPa·s (25℃) ■ Curing temperature guideline: 100℃ * Curing characteristics can vary significantly depending on the type of polyol used and the presence of catalysts.
Price information
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Delivery Time
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Applications/Examples of results
【Examples of Use】 - Adhesive used in the hot press process - Adhesive layers for films, sheets, and laminated materials - Thermosetting coatings that require short heating times - One-component formulations that require low-temperature and fast curing
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Company information
Blonate Co., Ltd. is a urethane chemicals manufacturer engaged in the development, production, and sale of blocked polyisocyanates and functional urethane prepolymers. In addition to standard products designed for specific applications and curing conditions, including low-temperature curing, yellowing resistance, rapid curing, and extended pot life, we also develop alternatives for discontinued or difficult-to-source products and provide customized products tailored to individual requirements. We provide comprehensive support covering formulation studies, laboratory-scale prototyping, scale-up, small- to medium-scale production, and physical property evaluation. Customers are welcome to consult us from the small-lot development stage regarding technical challenges involving adhesives, coatings, crosslinking agents, molding materials, and other applications.
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