The back pressure in the latter stage can operate at atmospheric pressure! A valve-selectable MFC suitable for flow control in various semiconductor processes.
The "MARU9000s" is a pressure sensor-based MFC that can operate under back pressure conditions at atmospheric pressure. This product allows for the selection of either a front valve type or a rear valve type, enabling appropriate proposals based on the process. It features a design suitable for ultra-fine processing, with the rear valve type being compatible with high flow rate processes, minimizing the impact of pressure fluctuations at the rear, and equipped with a self-diagnosis Level 2 function. The front valve type is suitable for low flow rate processes, reducing the impact of pressure fluctuations at the front while verifying flow data with a self-diagnosis Level 3 function, and enhancing corrosion resistance through the use of materials like Hastelloy. It can be applied to all semiconductor processes. 【Features】 ■ Operates under back pressure conditions at atmospheric pressure ■ Front and rear valves can be selected, with proposals tailored to specific processes ■ Properly designed for ultra-fine processing ■ Equipped with self-diagnosis functions *For more details, please download the PDF or feel free to contact us.
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【Specifications】 ■Flow Range: 5 SCCM to 50 SLM ■Flow Control Range: 0.5 to 100% of Full Scale ■Accuracy: <=±0.05% of Full Scale (0.5% to 10%), <=±0.5% of Set Point (10% to 100%) ■Response Time: <=0.5 Sec ■Reproducibility: <=±0.3% of Set Point ■Material: STS316L VIM VAR & EP (Option: Hastelloy) ■Valve Type: Solenoid & Piezo V/V (N.C) *For more details, please download the PDF or feel free to contact us.
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【Applications】 ■Ultrafine processing processes in semiconductor manufacturing equipment such as Dry Etcher, Poly Etcher, and Oxide Etcher ■Gas flow control in all semiconductor processes *For more details, please download the PDF or feel free to contact us.
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