Laser mask
By setting a substrate with a patterned reflective film in a laser marking device or laser processing machine and irradiating it, it is possible to perform patterned processing on the target object. Utilizing advanced photo printing technology allows for fine patterning. Since the specifications of the reflective film vary depending on the laser wavelength used, it is also possible to design according to the required specifications.
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basic information
Our company not only processes reflective mirrors and reflective plates for various lasers, but also handles products that incorporate patterning using photolithography technology. In particular, we have a long track record in supplying glass masks for YAG laser marking devices used in semiconductor packaging. These masks are manufactured using a method that directly patterns dielectric multilayers, allowing for timely responses. We can also produce durable dielectric film specifications for glass masks used in KrF excimer laser processing machines. If you have concerns about the durability of metal film specifications, please feel free to consult us. Additionally, we offer a variety of products including total reflection mirrors, half mirrors, metal masks, and diffusion masks (sandblasted or glass-etched). We accept orders starting from a single prototype.
Price information
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Delivery Time
Applications/Examples of results
YAG laser marker masks, glass masks for excimer laser processing machines, metal masks for CO2 lasers, metal thin film patterning masks for AL, Cr, Cu, Au, photo masks, various optical mirrors, filters, and others.
Company information
In the future, as represented by MEMS, the research and development department will become indispensable in this industry, where higher precision and greater refinement are increasingly required. Our company will assist with prototyping and development using the know-how we have cultivated over many years. We look forward to inquiries from all industries, not just in the fields of electronics and optics.
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