Road lock type sputtering device RAS-1100BII
This is a medium-sized production model that can reproducibly achieve high-quality optical thin films without wavelength shifts at low temperatures using the independently developed RAS (Radical Assisted Sputtering) method, and can also produce functional thin films such as decorative films and nitride films.
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basic information
This is a medium-sized production model that can reproducibly achieve high-quality optical thin films without wavelength shifts at low temperatures using the independently developed RAS (Radical Assisted Sputtering) method, enabling the realization of functional thin films such as decorative films and nitride films.
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Applications/Examples of results
1. High-density optical thin film formation without wavelength shift is possible. 2. Low-temperature film formation can accommodate various applications. 3. Complex optical characteristic films with strict specifications can be deposited in accordance with optical thin film design using only time control. 4. Substrates can be flat as well as uneven. 5. A reproducible intermediate refractive index film is possible with mixed films of high refractive index materials and low refractive index materials. 6. Functional thin films such as nitride films and decorative films can be realized. 7. A load-lock system allows for the maintenance of stable film quality. 8. Improved film formation efficiency and compactness reduce CO2 emissions, considering the global environment. 9. Maintenance and cleaning are significantly reduced compared to conventional deposition systems. 10. The film formation area is approximately 1.0 square meter, and it is possible to keep the variation coefficient of film thickness distribution within 0.5%. 11. An external adjustment mechanism for the correction plate can be added as an option. 12. The sputtering process is automated.
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Company information
Since our establishment, what we have always strived for is to listen to our customers' voices and continue to create products that satisfy them. Fortunately, we have received support from many customers and have been able to achieve a top-class market share in the country, but even after 50 years since our founding, this attitude has not changed. We believe that our increasing attention and exchanges not only from within Japan but also from overseas, particularly in Asia, reflect this understanding. We sincerely seek the ideal form of management and will continue to strive to be a company that can compete internationally in all aspects, including technology, quality, speed, service, and cost performance. In this era where new waves of innovation are constantly emerging, we are determined to evolve further as a comprehensive thin film formation equipment manufacturer, utilizing advanced and sophisticated technologies and being well-versed in all aspects of vacuum thin film formation, driven by an unyielding spirit of challenge.