Completely remove dust adhered to the surface of magnetic tapes, photographic films, etc., using a non-contact method.
Introducing the ultrasonic air-type substrate web cleaner "USW-102 (standard pressure)" and "USW-103 (high pressure)." This system mainly consists of a cleaning head, PV blower unit, HEPA filter, piping hose, and ionizer, and is used for dust removal measures in the manufacturing process of secondary batteries. 【Features (USW-103)】 ■ A web cleaner that powerfully vibrates particles to enhance dust removal efficiency ■ Unique ultrasonic generation method provides effective sound pressure (vibration waves) ■ Non-contact, preventing damage to the product surface ■ No generation of static electricity or fiber adhesion like in contact methods ■ Compatible with faster web speeds *For more details, please refer to the PDF document or feel free to contact us.
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basic information
【Demo Evaluation Machine】 ■ Rewinder: Simultaneous cleaning of both sides of the film ■ Conveying speed: 0–200m/min ■ Film width: 50–500mm ■ Core inner diameter: 3, 4, 6 inches ■ Film roll diameter: within φ500mm ■ Work weight: within 50kg ■ Line sensor camera (defect detection device): SCANTEC ELEMENTS II (manufactured by Nagase Sangyo) ■ Inspection method: Transmission inspection, reflection inspection ■ Detection size: 3μm or larger *For more details, please refer to the PDF document or feel free to contact us.
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For more details, please refer to the PDF document or feel free to contact us.
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Company information
Hugle started in 1969 as the Far East branch of the American company Hugle Industries, a world leader in semiconductor manufacturing equipment during the early days of the semiconductor industry. Taking advantage of this first-mover advantage, it established a foundation as an independent manufacturer in 1971. Since then, in the ever-evolving world of semiconductors and flat panels such as LCDs, we have consistently developed and provided numerous innovative products ahead of the times. What we particularly want to highlight is our unwavering commitment to originality, focusing on equipment and devices related to a "pure and clean production environment," which are not commonly addressed by others and significantly impact quality. As you know, semiconductor technological innovation aims for limitless miniaturization, which inevitably requires "ultra" levels of cleanliness and purity in production and inspection environments. Therefore, we have prominently embraced the philosophy of "Clean & Quality," striving to refine our available technologies to realize a more advanced production environment.
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