Vacuum-type ultrasonic cleaning device ideal for fluorine-based cleaning agents.
●Reduce the usage of expensive fluorinated solvents and cut costs ●Remove dust particles of 0.2 to 0.5μm with ultra-precise cleaning The ultra-precision ultrasonic cleaning machine processes each step under reduced pressure and performs cleaning to drying in a single tank. By utilizing the degassing effect of the cleaning solution due to reduced pressure, it enhances the cleaning effect while enabling precise cleaning in a space-saving manner without moving the items being cleaned. 〜 〜 〜 〜 〜 〜 〜 〜 〜 〜 〜 〜 〜 〜 〜 〜 〜 〜 〜 〜 〜 〜 〜 〜 【Seven Main Features】 1. Optimized for fluorinated solvents, reducing solvent usage and lowering running costs 2. Frequency of the ultrasonic oscillator can be pre-selected 25/28/40/65/70/80/120/170Hz 3. Processes from cleaning to drying in a single tank 4. Space-saving without moving the items being cleaned 5. Simple recipe allowing repeated reduced pressure ultrasonic cleaning 6. Eliminates cleaning unevenness with an up-and-down oscillation function during ultrasonic cleaning 7. Uses 100% filtered liquid for the cleaning solution, supplied to the tank, and improves cleaning quality through filtration circulation cleaning via circulation and overflow.
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basic information
●Reduce the usage of expensive fluorinated solvents and cut costs ●Remove dust particles of 0.2 to 0.5μm with ultra-precise cleaning The ultra-precision ultrasonic cleaning machine processes each step under reduced pressure, performing cleaning to drying in a single tank. By utilizing the degassing effect of the cleaning solution under reduced pressure, it enhances cleaning effectiveness while enabling precise cleaning in a space-saving manner without moving the items being cleaned. 〜 〜 〜 〜 〜 〜 〜 〜 〜 〜 〜 〜 〜 〜 〜 〜 〜 〜 〜 〜 〜 〜 〜 〜 【Seven Main Features】 1. Optimized for fluorinated solvents, reducing solvent usage and lowering running costs 2. Frequency of the ultrasonic oscillator can be pre-selected 25/28/40/65/70/80/120/170Hz 3. Processes from cleaning to drying in a single tank 4. Space-saving without moving the items being cleaned 5. Simple recipe allowing repeated reduced pressure ultrasonic cleaning 6. Eliminates cleaning unevenness with up-and-down oscillation during ultrasonic cleaning 7. Uses 100% filtered liquid for the cleaning solution, supplied to the tank, enhancing cleaning quality through filtration circulation cleaning with circulation and overflow.
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Applications/Examples of results
CCD and CMOS sensors, semiconductor wafers, crystal components, crystal wafers, sensor components, optical components, cleaning of liquid crystal panels, ceramic substrates, particle removal Debonding cleaning after deep etching processing of MEMS device wafers for accelerometers, gyroscopes, printer heads, etc.
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We will propose the optimal system that meets the needs of our customers based on our diverse achievements and experiences. If you have any issues, whether with cleaning machines, chemical supply devices, or automatic transport systems, please feel free to contact us. We are flexible in responding to customer requests beyond just equipment manufacturing. Various Website http://www.various-x.jp/ (Please copy and paste into your browser)
