Mercury Prober CV/IV Measurement System
This is a CV/IV measurement system using a mercury probe method developed by Four Dimensions, Inc. in the United States, which excels in reproducibility and safety. It can measure the characteristics of various wafers such as Si, compounds, SOI, and bulk. 【Features】 ◆ No need for electrode fabrication. Since mercury itself serves as the electrode, the costly and time-consuming patterning process is unnecessary. Measurements can be taken in a bulk state or with an insulating film formed. ◆ Automatic system. It allows for automatic mapping measurements of up to 49 designated measurement sites, including C-V, I-V characteristics, TDDB, Vdb, Qbd for oxide breakdown evaluation, Dit, doping concentration, oxide film thickness, Low-k, High-k, etc. ◆ High measurement reproducibility. Excellent measurement reproducibility is achieved through a uniquely designed mercury probe area and the use of fresh mercury for each measurement. ◆ Compact structure. Integrates CV and IV meters, transport platform, and probe section. ◆ Compatible with various wafers and chips. Capable of measuring 1 to 12-inch wafers and chip-sized samples.
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This is a CV/IV measurement system using a mercury probe method developed by Four Dimensions, Inc. in the United States, which excels in reproducibility and safety. It can measure the characteristics of various wafers such as Si, compounds, SOI, and bulk. 【Features】 ◆ No need for electrode fabrication. Since the mercury itself acts as the electrode, there is no need for the time-consuming and costly patterning process. Measurements can be taken in a bulk state or with an insulating film formed. ◆ Automatic system. It allows for the specification of up to 49 measurement sites for automatic mapping measurements of C-V, I-V characteristics, TDDB, Vdb, Qbd oxide breakdown evaluation, Dit, doping concentration, oxide film thickness, Low-k, High-k, etc. ◆ High measurement reproducibility. Excellent measurement reproducibility is achieved through a uniquely designed mercury probe area and the use of fresh mercury for each measurement. ◆ Compact structure. Integrates CV, IV meter, transport platform, and probe section. ◆ Compatible with various wafers and chips. Capable of measuring 1 to 12-inch wafers and chip-sized samples.
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Applications/Examples of results
◆ Evaluation of epitaxial/ion implantation layers. Ion implantation dose, carrier concentration, Vfb, etc. of silicon wafers or compound wafers. ◆ Evaluation of insulating films. Relative permittivity (Low-K, High-K), Dit, Vbd, Qbd, TDDB, oxide film capacitance/thickness, carrier generation lifetime, I-V measurements, pinhole density, resistivity, etc. of gate or field insulating films. ◆ Evaluation of ferroelectric films. Hysteresis, response time, K-E, P-E, K-f, etc. *For details, please refer to "Request for Materials."
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Company information
Yamato Corporation's Measurement Equipment Division manufactures and sells inspection, analysis, and evaluation devices necessary for research and development and production in the semiconductor, organic EL, liquid crystal, solar cell, and fuel cell industries. In particular, we specialize in developing devices used in research and development departments that require measurements under special environmental conditions, and we have numerous achievements in delivering to cutting-edge fields. Additionally, we are currently challenging ourselves to integrate conventional probing technology into applied technology fields, aiming to establish a system that can support inspection, analysis, and evaluation in all areas, including applied technologies centered around semiconductors in the future. 【Head Office and Branch Locations】 ◆ Kobe Head Office 〒650-0047 1-4-6 Minamimachi, Port Island, Chuo Ward, Kobe City TEL (078) 304-5178 (DI) FAX (078) 304-6087 ◆ Tokyo Branch 〒107-0062 1-15-9 Minami Aoyama, Minato Ward, Tokyo TEL (03) 3403-0771 FAX (03) 3403-0813 ◆ Nagoya Branch 〒460-0002 2-19-25 Marunouchi, Naka Ward, Nagoya City YH Marunouchi Building TEL (052) 212-4932 FAX (052) 212-4935