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  6. Aluminum Nitride (AlN) substrate - λ/10 high-precision planar polishing processing

Aluminum Nitride (AlN) substrate - λ/10 high-precision planar polishing processing

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last updated:Oct 01, 2010

セラテックジャパン
セラテックジャパン
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We provide consistent processing of aluminum nitride substrates for power electronics.

Aluminum Nitride (AlN) substrate - λ/10 high-precision planar polishing processing

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cat_ALN.jpg

Aluminum Nitride (AlN) substrate - λ/10 high-precision planar polishing processing

cat_ALN.jpg
cat_ALN.jpg
  • Related Link - http://www.crtj.co.jp/

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**Features** ● Processing of Aluminum Nitride (AlN) substrates We provide consistent processing of aluminum nitride substrates for power electronics. ▼ Processing accuracy (Please consult us regarding other specific substrates.) ▼ ALN polished surface [Ra≦15nm] ● λ/10 high-precision flat grinding processing Using an oblique incidence interference method flatness analysis device and a laser interferometer, we ensure surface accuracy management and product guarantee. ● For other functions and details, please contact us.

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Aluminum Nitride Substrate - λ/10 High Precision Flat Polishing Processing Album

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セラテックジャパン

セラテックジャパン

Manufacturing and processing contract

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Ceratec Japan is a specialized company in the processing of electronic materials and optical materials. In addition to our accumulated processing achievements and technologies, we utilize a variety of processing equipment to provide a consistent system from processing to quality assurance. We are continuously making efforts to respond to our customers' trust and ensure a safe and reliable transaction.

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