RF Plasma Source ERFS-500
An RF plasma source that enables a process with minimal metal contamination due to non-electrode discharge. 【Features】 ○ Discharge can be visually confirmed thanks to the optical window. ○ High-precision plasma spectroscopy and other applications are possible with the quartz window. ○ The automatic matching mechanism allows for easy operation and stable long-term performance. ○ It is air-cooled, eliminating concerns about cooling water, and can be easily installed on existing equipment. ○ Stable operation for extended periods is achievable even when introducing active gases, allowing for the generation of clean atomic and radical beams. ● For other functions and details, please download the catalog.
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basic information
An RF plasma source that enables a process with minimal metal contamination through non-electrode discharge. 【Features】 ○ Discharge can be visually confirmed due to the optical window. ○ High-precision plasma spectroscopy and other applications are possible with the quartz window. ○ The automatic matching mechanism allows for easy operation and stable long-term performance. ○ It is air-cooled, eliminating concerns about cooling water, and can be easily installed on existing equipment. ○ Stable long-term operation can be achieved even when introducing active gases, allowing for the generation of clean atomic and radical beams. ● For other functions and details, please download the catalog.
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Applications/Examples of results
【Purpose】 ○ Film formation experiment ○ Etching experiment
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Company information
In 1972, the first president, Horita, established Taisei Sangyo Co., Ltd. using the entrance of his home as a workplace, and since then, we have been dedicated to technology development and research. Initially, we were involved in the development of devices such as the Polack counter for the Meteorological Research Institute, starting our work in the field of atmospheric science. Subsequently, we expanded our work into the vacuum world by starting maintenance services for leak detectors. Around the 10th anniversary of our founding, work in ultra-high vacuum began to increase, and by the 15th anniversary, we were able to manufacture small devices. Currently, our scope of work has significantly expanded, not only covering ultra-high vacuum, MBE, CVD, ECR, and RF radical sources, but also advancing the development of functional components utilizing various plasmas, ions, or electrons. In the future, we aim to become a small enterprise that can truly compete in the world of cutting-edge technology.