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  6. RF Radical Beam Source IRFS-503

RF Radical Beam Source IRFS-503

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IRFS-503

last updated:Oct 01, 2010

アリオス
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RF Radical Beam Source IRFS-503

Discharge and extraction sections are made of high-purity PBN, allowing for long-term stable operation even during the introduction of active gases, and enabling the generation of a clean atomic and radical beam, making it a radical beam source. 【Features】 ○ Forms chemically active radicals through ICP-type RF discharge and extracts flux via differential pressure. ○ Standard equipment includes a viewport for visual confirmation of discharge, allowing verification of discharge and excitation states using a light emission monitor or spectrometer. ○ Compatible with various ultra-high vacuum devices such as MBE systems due to complete metal sealing and 200°C bakeable capability. ○ Designed with the premise of attaching a molecular beam cell port, making it possible to expand conventional MBE systems. ● For other functions and details, please contact us.

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rf_rajikarubimugen_irfs-503.jpg

RF Radical Beam Source IRFS-503

rf_rajikarubimugen_irfs-503.jpg
rf_rajikarubimugen_irfs-503.jpg

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Discharge and extraction sections are made of high-purity PBN, allowing for long-term stable operation even during the introduction of active gases, and enabling the generation of clean atomic and radical beams, making it a radical beam source. 【Features】 ○ Forms chemically active radicals through ICP-type RF discharge and extracts flux via differential pressure. ○ Standard equipment includes a viewport for visual confirmation of discharge, allowing verification of discharge and excitation states using a light emission monitor or spectrometer. ○ Compatible with various ultra-high vacuum devices such as MBE systems due to complete metal sealing and 200°C bakeable capability. ○ Designed with the assumption of mounting a molecular beam cell port, making it possible to retrofit to conventional MBE systems. ● For other functions and details, please contact us.

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アリオス

アリオス

Industrial Machinery

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In 1972, the first president, Horita, established Taisei Sangyo Co., Ltd. using the entrance of his home as a workplace, and since then, we have been dedicated to technology development and research. Initially, we were involved in the development of devices such as the Polack counter for the Meteorological Research Institute, starting our work in the field of atmospheric science. Subsequently, we expanded our work into the vacuum world by starting maintenance services for leak detectors. Around the 10th anniversary of our founding, work in ultra-high vacuum began to increase, and by the 15th anniversary, we were able to manufacture small devices. Currently, our scope of work has significantly expanded, not only covering ultra-high vacuum, MBE, CVD, ECR, and RF radical sources, but also advancing the development of functional components utilizing various plasmas, ions, or electrons. In the future, we aim to become a small enterprise that can truly compete in the world of cutting-edge technology.

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