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  5. Other processing machines
  6. Plasma, high-power high-frequency power supply for lasers.

Plasma, high-power high-frequency power supply for lasers.

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last updated:Feb 27, 2008

富士電波工機 第1機器部
富士電波工機 第1機器部
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High-power high-frequency power supply for plasma and laser applications.

Special power supply devices such as plasma and laser excitation Continuous wave   Several kHz 600KW CW   2-5 MHz 100-300 kW CW   13.56 MHz 450 kW CW  Pulse to continuous wave compatible   13.56 MHz 50 kW external excitation   40 MHz 40 kW self-excitation   100 MHz 20 kW self-excitation   Fundamental wave approximately 2 peaks to CW   Two frequency modulation, for example, 10 kHz + 100 kHz

    Other processing machinesCVD EquipmentRare metals
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Plasma, high-power high-frequency power supply for lasers.

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Special power supply devices such as plasma and laser excitation Continuous wave   Several kHz 600 kW CW   2-5 MHz 100-300 kW CW   13.56 MHz 450 kW CW  Pulse to continuous wave compatible   13.56 MHz 50 kW external excitation   40 MHz 40 kW self-excitation   100 MHz 20 kW self-excitation   Fundamental wave approximately 2 peaks to CW   Two frequency modulation, for example, 10 kHz + 100 kHz

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Special power supply devices such as plasma and laser excitation Continuous wave Several kHz 600 kW CW 2-5 MHz 100-300 kW CW 13.56 MHz 450 kW CW Pulse to continuous wave compatible 13.56 MHz 50 kW external excitation 40 MHz 40 kW self-excitation 100 MHz 20 kW self-excitation Fundamental wave approximately 2 peaks to CW Two frequency modulation, for example, 10 kHz + 100 kHz

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富士電波工機

富士電波工機 第1機器部

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Manufacturer of integrated equipment for high-frequency dielectric heating, microwave heating, and high-frequency induction heating.

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