"High-frequency power supply for plasma" can be customized to fit your needs.
NR03N-01/NR05N-01
Lightweight and compact! Development and manufacturing possible from just one unit!
Achieves a lightweight and compact design (half-rack size) while being an air-cooled power supply! High-frequency power supply for plasma (NR03N-01) ■□■Features■□■ ■Rated output NR03N-01: 300W NR05N-01: 500W ■Frequency 13.56MHz ■Output impedance 50-52Ω ■Power supply voltage 200V 3-phase 50/60Hz ■Spurious -40dB or less ■Cooling method Forced air cooling ■For more details, please contact us.
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Achieves a lightweight and compact design (half-rack size) while being an air-cooled power supply! High-frequency power supply for plasma (NR03N-01) ■□■Features■□■ ■Rated output NR03N-01: 300W NR05N-01: 500W ■Frequency 13.56MHz ■Output impedance 50-52Ω ■Power supply voltage 200V 3-phase 50/60Hz ■Spurious -40dB or less ■Cooling method Forced air cooling ■For more details, please contact us.
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RF Technologies has been involved in the development and design of high-frequency technologies since the time high-frequency power supplies began to be used in plasma processes, including "demonstration research," "material development," "surface modification," "semiconductor manufacturing," "FPD manufacturing," and "solar cells." Fortunately, we have had the opportunity for technical collaboration and exchange with academic researchers and major semiconductor manufacturing equipment manufacturers at the forefront of global technology. We have experienced many instances where the alignment of our technologies was essential to solving issues that overlap between areas that equipment manufacturers need to address and areas that power supply manufacturers need to resolve.
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