Cleaning equipment, UV/O3 cleaning equipment, dry cleaning equipment, cleaner (cleaning device), stripper (stripping device)
UV-1
Cleaning equipment, UV/O3 cleaning equipment, dry cleaning equipment, cleaner (cleaning device), stripper (stripping device)
● No vacuum system is required due to atmospheric pressure operation ● Compact design ● Easy to operate and maintain ● Low cost
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basic information
UV-1 is a research and development cleaning device designed to efficiently perform complete dry processing of various semiconductor processes, such as photoresist ashing, silicon wafer cleaning, and chrome mask cleaning, through the interaction of high-concentration ozone and ultraviolet irradiation.
Price information
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Delivery Time
Applications/Examples of results
● Photoresist Ashing ● Incrim-Bal ● Removal of Solvent Residue ● Cleaning of Chrome Masks ● Cleaning of Silicon, Compound Semiconductors, Quartz, Liquid Crystal Displays, Lenses, Various Disks, etc.
Company information
We excel in the technology of thin film formation and processing at the nano to micro level, and we are well-regarded for providing equipment and technology for both research and development applications as well as production purposes. Additionally, we specialize in the optoelectronics field, particularly in light sources (LEDs and semiconductor lasers), which are expected to see market expansion in the future.
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