Dry etching equipment, reactive ion etching equipment, compact etcher, ashing equipment, cleaner (cleaning equipment)
FA-1
Dry etching equipment, reactive ion etching equipment, compact etcher, ashing equipment, cleaner (cleaning equipment)
● Only one-touch operation is required, with no special procedures needed. ● It has a small installation space and does not require a specific location. ● It can accommodate samples up to φ4 inches. ● Being a dedicated device, it is low-priced.
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basic information
FA-1 is a dry etching device that efficiently and with low damage performs the peeling of passivation films, etching of various silicon thin films, and ashing of photoresists for various defect analyses on IC chips. The operation method is simple; it can be used just by setting the sample and pressing a button. Additionally, it is space-saving and can be used in any location, accommodating both floor-standing and tabletop configurations.
Price information
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Delivery Time
Applications/Examples of results
● Removal of various passivation films ● Ashing of photoresist ● Etching of various silicon thin films ● Surface cleaning of glass substrates and others
Company information
We excel in the technology of thin film formation and processing at the nano to micro level, and we are well-regarded for providing equipment and technology for both research and development applications as well as production purposes. Additionally, we specialize in the optoelectronics field, particularly in light sources (LEDs and semiconductor lasers), which are expected to see market expansion in the future.
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