List of Scientific and Physics Equipment products
- classification：Scientific and Physics Equipment
706～720 item / All 35973 items
Reduce the workload from handling heavy objects! Here are five case studies that solved customer challenges! We are also accepting free consultations and tests tailored to your work!
- Other conveying machines
Strong cold wind from room temperature to -13°C! Depending on the usage environment, you can choose between the combo type or the separate type!
- Cooling system
April 10, 2024 (Wednesday) to April 12, 2024 (Friday) Notice of Participation in Nagoya Manufacturing World 2024
Sanwa Shiki Ventilator Co., Ltd. will be exhibiting at the 2024 Monozukuri World (Nagoya) held at Port Messe Nagoya. We will also be showcasing our large cooling fans and cool/warm ambient products. Date: April 10, 2024 - April 12, 2024 Opening: 10:00 AM Location: Nagoya Port Messe (Exhibition Hall 1) *Our booth: 19-1 We would be grateful if you could visit us if you have the time.
Recycling used thinner for reuse to reduce solvent costs and waste liquid costs.
- Other processing machines
- Distillation Apparatus
Next-generation magnetic heat pump system achieving high-efficiency magnetic refrigeration
- Refrigerators and freezers
Reduce the task of wiping each piece individually and stabilize the cleaning quality of rod-shaped workpieces.
- Other cleaning machines
We can supply low-temperature gas ranging from room temperature to minus 160°C. The gases that can be cooled include not only nitrogen gas but also various other gases.
- Gas Generator
Tabletop small-sized experimental furnace - space-saving with a maximum operating temperature of 2000℃! We also manufacture metal furnaces for reducing atmospheres.
- Heating device
- Electric furnace
- Annealing furnace
Multi-Target Sputtering Device [MiniLab-125] Compatible with Φ8" SiC Coating Equipped with 1000℃ Heater Stage! Compact Size!
Multifunctional Multi-Sputtering Device (Compatible with Φ8inch Substrates) - Simultaneous deposition of three components + one component Pulse DC sputtering - Flexible arrangement of RF500W and DC850W power supplies to three cathodes (Source 1, 2, 3) - Equipped with a 5KW Pulse DC power supply → used with dedicated cathode (4) - Substrate heating stage Max 800℃ (SiC coated heater can achieve Max 1000℃) - MFC x 3 systems (Ar, O2, N2) for reactive sputtering - Main chamber RIE etching stage RF300W - LL chamber <30W low power controlled soft etching - Unique "Soft-Etching" technology reduces substrate damage through substrate bias - Touch panel or Windows PC operation: All operations can be performed on the touch panel/PC without dispersing control. - Equipment installation dimensions: 1,960(W) x 1,100(D) x 1,700(H) mm - Multi-chamber type can also be manufactured. ● Mixed specifications for resistance heating deposition, organic material deposition, EB deposition, PECVD, etc. are also possible.
Tabletop small-sized experimental furnace - space-saving, with a maximum operating temperature of 2000°C! We also manufacture metal furnaces for reducing atmospheres.
- Heating device
- Electric furnace
- Other heaters
BH Series [UHV Compatible Ultra-High Temperature Vacuum Thin Film Experiment Substrate Heater] Max 1800℃
It can be applied to various vacuum thin film experiments such as PVD (sputtering, evaporation, EB, etc.), CVD, high-temperature vacuum annealing, and high-temperature sample analysis substrate stages. We offer custom-made solutions to meet various specifications. 【Features】 ● Semi-custom product. Designed and manufactured according to your requests. ● Easy replacement of the auxiliary heater wire. ● Easy installation and maintenance (M6 stud bolts, supports). ● Compatible with RF/DC bias and substrate rotation. 【Standard Accessories】 ● Thermocouple: wire type with alumina insulating sleeve. ● Mounting stud bolts. 【Options】 ● RF (150W)/DC (1KW) bias application. ● Non-standard heater wires (Nb, Mo, Pt/Re, WRe, etc.). ● Substrate holding clips. ● Mounting brackets. ● Substrate holders. ● Tapped holes for holder installation. ● Change of top plate material (PBN, quartz, carbon, Inconel, etc.). ● Additional thermocouples for overheating. ● Base flange and vacuum feedthrough.
Just by pressing a button, you can complete 20L of cutting fluid with a specified concentration of ±0.5% in about 2 minutes, successfully achieving a 50% reduction in the desired concentrate!
- Other physicochemical equipment
Dismantling of Solar Panels - Innovative Solutions
- Separation device
- Solar power generator
- Other Recycling
Contributing to the reduction of environmental impact! Achieving a reduction in cutting fluid concentrate and stable concentration management.
- Other physicochemical equipment
Contributing to the improvement of corrosion resistance in shipbuilding, accurately diluting cutting fluids.
- Other physicochemical equipment
Generates cutting fluid with a specified concentration of ±0.5% in about 2 minutes with the push of a button. Contributes to the reduction of concentrated liquid.
- Other physicochemical equipment
Thorough hygiene management. Cutting fluid with a specified concentration of ±0.5% is generated in about 2 minutes.
- Other physicochemical equipment
Stable concentration management of cutting fluid to maintain surface finish accuracy.
- Other physicochemical equipment
Generate cutting fluid with a specified concentration of ±0.5% in about 2 minutes with the push of a button.
- Other physicochemical equipment
Generate cutting fluid with a specified concentration of ±0.5% in about 2 minutes with the push of a button.
- Other physicochemical equipment