List of Semiconductor Manufacturing Equipment products

Achieves high collection efficiency through electrostatic methods. Offers a wide range of products from large to small sizes. Also compatible with water-soluble oil mist.

• air conditioning

Demo units available for loan! Wafers are loaded and processed in a dedicated barrel.

• Etching Equipment

Demo units available for loan! After pre-processing with a cassette, automatic etching is performed with a dedicated barrel.

• Etching Equipment

Demo units available for loan! A clean filter is installed at the top to ensure cleanliness within the chamber.

• Other semiconductor manufacturing equipment

Demo units available for loan! We offer a variety of options including batch type and scrub cleaning.

• Other semiconductor manufacturing equipment

Demo units available for loan! We will accommodate according to the shape of the quartz tube, so please consult with us.

• Other semiconductor manufacturing equipment

Possible at 10,000 rpm with a compact small option!

• Coater
• Other semiconductor manufacturing equipment

Target work: Applicable to 2"□ to 5"□ substrates or φ2" to φ5" substrates!

• Coater
• Other semiconductor manufacturing equipment

Technology has been incorporated to achieve a uniform high-precision coating!

• Coater
• Other semiconductor manufacturing equipment

Automatic and manual operation will perform developing, rinsing, washing, and spin drying!

• Coater
• Other semiconductor manufacturing equipment

Install a 3-axis multi-joint clean robot at the center of the device for wafer transport!

• Etching Equipment

Install a 3-axis multi-joint clean robot at the center of the device for substrate transport!

• Other semiconductor manufacturing equipment

Customization is okay! We offer quick responses and after-sales support unique to manufacturers.

• Other semiconductor manufacturing equipment

Coating is possible up to a 3L container! It contributes to reducing logistics costs through lightweight containers.

• CVD Equipment

Achieving a substrate temperature of 900℃! Equipped with a 3-axis mechanism on the substrate stage to realize a uniform film thickness distribution.

• Sputtering Equipment

A simple structure with high versatility! It adopts a unique plasma control method.

• CVD Equipment