List of Other abrasives products

  • classification:Other abrasives

961~990 item / All 1416 items

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For those who have isolators. Achieving high chemical resistance and workability. Low cost and short delivery times are also possible for glove box and isolator gloves.

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  • TRON 5000 black n white.JPG
  • TRON 5000.JPG
  • CSM.JPG
  • Butyl Smooth.JPG
  • Work gloves

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Notice of participation in 'INTERPHEX Week Tokyo' from May 20 (Wednesday) to May 22 (Friday), 2026.

Ito Corporation will be exhibiting at "INTERPHEX Week Tokyo" held at Makuhari Messe. This exhibition is the largest in Japan, showcasing a wide range of products and services related to the research and manufacturing of pharmaceuticals, cosmetics, and regenerative medicine from 25 countries and regions around the world. Pharmaceutical and cosmetic manufacturers, as well as regenerative medicine companies, will be attending from all over the globe. We will be showcasing "Gloves for Glove Boxes/Isolators" manufactured by Tron Power. We look forward to your visit.

Grinding cloth is composed of three elements: the base material, the abrasive material, and the adhesive. The key is to effectively combine their respective properties! Please feel free to consult us.

  • Other abrasives

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A rich lineup including resin cross belts and grinding wheels for tools is featured!

  • Grinding Machine
  • Other abrasives
  • Grindstone

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A shaft-mounted buff suitable for polishing operations such as mirror finish on various metals!

  • Other abrasives
  • Other machine elements

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You can select a brush that suits the purpose of the task!

  • Other abrasives
  • Other machine elements

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Would you like to automate your grinding process? We can solve various issues such as labor shortages, quality stability, and productivity improvement through automation! Let's start with a consultati...

  • Other abrasives

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Significant reduction in wire damage, dramatically improved workability and safety!

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  • Brush
  • Other abrasives

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We have a variety of grinder shapes available!

  • Power tools
  • Other abrasives

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Reviving sharpness through regrinding and recoating contributes to cost reduction!

  • Wafer processing/polishing equipment
  • Other abrasives
  • others

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Less dust scattering during polishing! Introducing a polishing compound for paper grain masking and skin adjustment.

  • Other abrasives
  • paint
  • Coating Agent

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Easily chamfered with NC lathes and multi-tasking machines. Compatible with various shapes and parts such as gears, hubs, notches, and splines.

  • Other cutting tools
  • Other abrasives

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Maximum operating speed of 2400 rpm! It grinds with a stronger grinding power than conventional products, improving production efficiency through increased line speed.

  • Other abrasives

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Polishing slurry that achieves a high polishing rate and good surface quality.

  • Other abrasives

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【Technical Information】Components of CMP Slurry

I will explain the components of CMP slurry. Currently, many slurries used in the CMP process have the following composition: 1) Abrasives: They enhance processing efficiency through mechanical action. Some also exhibit chemical action. 2) Chemicals and additives: They enhance processing efficiency through chemical action and provide special functions or performance. They have various functions such as surface modification of the workpiece, prevention of re-adhesion of impurities, and improvement of cleaning properties. 3) Dispersion medium: It evenly disperses the abrasive components and mediates mechanical and chemical actions. Currently, almost pure water is used. It serves roles such as cooling, transporting abrasives, discharging residues, and lubrication. We optimally select abrasives and additives according to each application, ensuring the stability of the slurry itself and maximizing performance up to the customer. Next time, I will explain "abrasives," one of the components.

Polishing slurry that achieves nano-level surface quality.

  • Other abrasives

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Slurry.jpg

【Technical Information】Components of CMP Slurry

I will explain the components of CMP slurry. Currently, many slurries used in the CMP process have the following composition: 1) Abrasives: They enhance processing efficiency through mechanical action. Some also exhibit chemical action. 2) Chemicals and additives: They enhance processing efficiency through chemical action and provide special functions or performance. They have various functions such as surface modification of the workpiece, prevention of re-adhesion of impurities, and improvement of cleaning properties. 3) Dispersion medium: It evenly disperses the abrasive components and mediates mechanical and chemical actions. Currently, almost pure water is used. It serves roles such as cooling, transporting abrasives, discharging residues, and lubrication. We optimally select abrasives and additives according to each application, ensuring the stability of the slurry itself and maximizing performance up to the customer. Next time, I will explain "abrasives," one of the components.

The de facto standard for polishing pads in the CMP process. World market share No. 1!

  • Other abrasives

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[Technical Information] Groove Processing of CMP Polishing Pads 2

Last time, we explained how the groove processing on the surface of polishing pads affects the diffusion of slurry. Here, we will introduce examples that visually verify the diffusion effect of slurry due to grooves. We prepared six different types of groove processing as samples on the polishing pad "IC1000," which has become the de facto standard for semiconductor use. - Circular Groove - Perforated Groove - Radial Groove - Spiral Groove - XY Groove - Arc Groove When a blue-colored liquid is dripped under the same conditions, it becomes clear that the diffusion of the liquid varies depending on the groove processing. It can be confirmed that the circular grooves and spiral grooves have high slurry retention, while the radial grooves and arc grooves excel in slurry discharge. Thus, even with the same polishing pad, the diffusion of slurry differs due to groove processing, which affects the action of slurry intervening with the workpieces such as wafers. Therefore, the selection of groove processing is very important. Our company can assist you in selecting groove processing while considering your process conditions and targets, so please feel free to consult with us.

Polishing pads optimal for primary polishing in mirror surface finishing.

  • Other abrasives

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パッド溝加工によるスラリー拡散.JPG

[Technical Information] Groove Processing of CMP Polishing Pads 2

Last time, we explained how the groove processing on the surface of polishing pads affects the diffusion of slurry. Here, we will introduce examples that visually verify the diffusion effect of slurry due to grooves. We prepared six different types of groove processing as samples on the polishing pad "IC1000," which has become the de facto standard for semiconductor use. - Circular Groove - Perforated Groove - Radial Groove - Spiral Groove - XY Groove - Arc Groove When a blue-colored liquid is dripped under the same conditions, it becomes clear that the diffusion of the liquid varies depending on the groove processing. It can be confirmed that the circular grooves and spiral grooves have high slurry retention, while the radial grooves and arc grooves excel in slurry discharge. Thus, even with the same polishing pad, the diffusion of slurry differs due to groove processing, which affects the action of slurry intervening with the workpieces such as wafers. Therefore, the selection of groove processing is very important. Our company can assist you in selecting groove processing while considering your process conditions and targets, so please feel free to consult with us.

A good metallic luster can be obtained on the processed surface! It is used in industries such as chemical and electronics.

  • Chemicals
  • Other abrasives

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It is possible to extend the liquid lifespan by adding additives! It is used in the electronics industry.

  • Chemicals
  • Other abrasives

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With 124 times the wear resistance of super hard materials, durability is increased by 30 times! Sintered diamond is extremely effective in preventing plating adhesion.

  • Other abrasives

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Helping you create products with shine and charm! We will introduce a wide range of lineups.

  • Other abrasives

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Reproduction of shape close to new products and restoration of cutting ability are possible!

  • Other abrasives
  • Other contract services

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Highly versatile steam polishing blast device capable of handling multiple applications.

  • Wafer processing/polishing equipment
  • Other abrasives

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FS18 ON/OFF Foot Switch Urawa Industrial

  • Other abrasives
  • Power tools
  • Other work tools

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M6A-SET Electrodeposited Diamond Bar 6-Piece Set Urawa Industrial

  • Other abrasives

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Introducing our four "commitments"! Leave the sharpening of machine tools to us.

  • Wafer processing/polishing equipment
  • Other abrasives
  • Surface treatment contract service

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Basic strength creates the brilliance and functionality of the material.

  • Other abrasives

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We offer nine different sizes of welded structures with electrolytic polishing finishes.

  • Other abrasives

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By using 0.2μm magnetite powder and leaving it on the surface of the iron plate, we can delay rust on the iron plate!

  • Grinding Machine
  • Other abrasives
  • Other polymer materials

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Low-salinity blast material used in ships around the world.

  • Grinding Machine
  • Other abrasives
  • Other polymer materials

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Made of carbon-reinforced plastic! A non-metal scraper that combines strength and durability.

  • Other cutting tools
  • Other abrasives
  • Other cleaning tools

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