List of Heating device products
- classification：Heating device
256～270 item / All 1960 items
Achieves high collection efficiency through electrostatic methods. Offers a wide range of products from large to small sizes. Also compatible with water-soluble oil mist.
- air conditioning
Significant reduction in bolt working time and labor hours through high-frequency induction heating! Bolt heater.
- Heating device
Born from the voices on site! The heating time is about 9 seconds (at AC100V), allowing for efficient work.
- Heating device
Using the IR series high-temperature observation furnace for demonstrations: <<Heating/Atmosphere Control/Oxidation Experiments>> Metals/Solders/Ceramics/Solder/Glass, etc.
- Testing Equipment and Devices
- Other inspection equipment and devices
- Heating device
Experience high-temperature measurements up to 1700℃ and experiments under controlled atmospheric conditions! We invite you to try high-temperature observations using the demo unit of the IR series, which represents Yonezawa Manufacturing, including heating, atmospheric control, and oxidation experiments.
- Metals / Filler materials / Ceramics / Solder / Glass, etc. - This measurement allows you to experience high-temperature observation using a demonstration unit of the "IR Series" concentrated heating furnace, which represents the test equipment manufacturer, Yokokura Seisakusho. Due to its sealed structure, the IR Series furnace can achieve a maximum temperature of 1700°C under controlled atmospheric conditions, as in the case of the IR-18SP. You can capture real-time changes in the test subject by checking videos of actual experiments and the test program. *Please note that the equipment used is a demonstration unit, and we may not be able to accommodate requests depending on the circumstances, so please contact us for details. *There may be variations depending on the thermal capacity of the test specimen. ▼Features of the IR Series▼ The rapid heating performance and superiority in temperature control, along with information from the observation port, significantly shorten heating experiment times and facilitate the screening of optimal heating conditions, contributing to improved efficiency in material development tasks.
We handle hot plates from various manufacturers.
- Heating device
This is a research filter dryer that produces powdered dry crystals. It eliminates product solidification and loss, reducing the process, similar to a pressurized filter and shelf dryer.
- Other powder equipment
- Heating device
The best proposal for the core process of magnetic devices. Annealing equipment provided by a magnetic specialty manufacturer.
- Heating device
- Electric furnace
- Industrial Furnace
We will organize the differences in heating methods between microwave and high-frequency dielectric heating, and introduce specific practical examples of processes where these technologies are applied...
- High frequency/microwave parts
- Heating device
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Introducing a microwave heating device systematized to accommodate various forms, particularly a mass production system powered by high power!
- Heating device
Tabletop small-sized experimental furnace - space-saving with a maximum operating temperature of 2000℃! We also manufacture metal furnaces for reducing atmospheres.
- Heating device
- Electric furnace
- Annealing furnace
4-Yen Multi-Sputtering Device 【MiniLab-S060】
4 cathodes with Φ2 inch configuration Simultaneous film deposition: 3-component simultaneous deposition (RF 500W or DC 850W) + HiPIMS (PulseDC 5KW) x 1 Power distribution and configuration settings for 4 cathodes can be freely changed via the HMI screen using the plasma relay switch 3 MFC systems (Ar, O2, N2) for reactive sputtering RIE etching stage RF 300W (main chamber) + <30W soft etching (LL chamber) Substrate heating: Max 500℃, 800℃, or 1000℃ (C/C or SiC coating) Substrate rotation and vertical movement (automatically controlled by stepping motor) APC automatic control: Upstream (MFC flow adjustment) or downstream (automatic valve opening adjustment on the exhaust side) Dimensions: 1,120(W) x 800(D) ● Mixed specifications for resistance heating deposition, organic material deposition, EB deposition, PECVD, etc. are also possible.
Maximum operating temperature 2000℃ Semi-automatic control Ultra-high temperature experimental furnace (carbon furnace, tungsten metal furnace) Compact and space-saving experimental furnace
- Heating device
- Annealing furnace
- Electric furnace
4-Yen Multi-Sputtering Device 【MiniLab-S060】
4 cathodes with Φ2 inch configuration Simultaneous film deposition: 3-component simultaneous deposition (RF 500W or DC 850W) + HiPIMS (PulseDC 5KW) x 1 Power distribution and configuration settings for 4 cathodes can be freely changed via the HMI screen using the plasma relay switch 3 MFC systems (Ar, O2, N2) for reactive sputtering RIE etching stage RF 300W (main chamber) + <30W soft etching (LL chamber) Substrate heating: Max 500℃, 800℃, or 1000℃ (C/C or SiC coating) Substrate rotation and vertical movement (automatically controlled by stepping motor) APC automatic control: Upstream (MFC flow adjustment) or downstream (automatic valve opening adjustment on the exhaust side) Dimensions: 1,120(W) x 800(D) ● Mixed specifications for resistance heating deposition, organic material deposition, EB deposition, PECVD, etc. are also possible.