List of Heating device products

  • classification:Heating device

541~585 item / All 1913 items

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Reduce the workload from handling heavy objects! Here are five case studies that solved customer challenges! We are also accepting free consultations and tests tailored to your work!

  • PRエリア.png
  • Other conveying machines

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Presentation of explanatory materials on JIS and ISO standards. We propose suitable safety barriers from a rich product series! Free rental of demo kits.

  • Satech - AdaptaGuard_Ipros_2023_JP_1.jpg
  • Satech - BlueGuard_Ipros_2023_JP_1.jpg
  • Satech - EasyGuard_Ipros_2023_JP_1.jpg
  • Satech - FastGuard_Ipros_2023_JP_2.jpg
  • Satech - ImpactGuard_Ipros_2023_JP_1.jpg
  • Satech - EasyGuard_Ipros_2023_JP_Media-gallery_1.jpg
  • Satech - ImpactGuard_Ipros_2023_JP_Media-gallery_2.jpg
  • Satech - AdaptaGuard_Ipros_2023_JP_Media-gallery_1.jpg
  • Satech - BlueGuard_Ipros_2023_JP_Media-gallery_2.jpg
  • Other safety and hygiene products

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Years of proven results! Ideal for drying processes in precision equipment manufacturing and coating.

  • Heating device

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A ceramic heater created from years of experience! Achieving high emissivity far-infrared radiation.

  • Heating device

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It is a high-performance vacuum deposition source that can be used as a high-temperature heating cell for vacuum applications, with an organic deposition source up to 800°C and a metal deposition sour...

  • Evaporation Equipment
  • Heating device
  • Electric furnace

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iPROS_MiniLab-026_220x220.jpg

★☆★☆【MiniLab-026】Small Thin Film Experimental Device for R&D Development★☆★☆

This is a flexible thin film experimental device for R&D that eliminates waste by integrating the necessary minimum modules and controllers into a 19" compact rack with a Plug & Play feel, achieving compact size, space-saving design, simple operation, and high cost performance. It supports magnetron sputtering (up to 3 sources) or resistance heating evaporation (metal sources up to 2, organic materials x4), and can also be equipped with a substrate heating stage, allowing for the production of annealing devices and RF etching. There is also a glove box storage type available (specifications to be discussed). We offer a wide range of optional components that can be flexibly customized. ◉ Φ2 inch magnetron cathode (up to 3 sources) ◉ Resistance heating evaporation source filament, crucible, boat type (up to 4 poles with automatic switching via controller) ◉ Organic evaporation cell: 1cc or 5cc ◉ Glove box compatible (optional, specifications to be discussed) ◉ Other options: simultaneous film deposition, HiPIMS, automatic film deposition controller, custom substrate holders, load lock, substrate rotation/heating/cooling, and many more options available. *Please first contact us with your required specifications, and we will configure the system to meet your needs.

6 to 8 inch ultra-high temperature wafer annealing equipment, a high-performance machine that widely supports various purposes from research and development to small-scale production.

  • Annealing furnace
  • Heating device
  • Electric furnace

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4-Yen Multi-Sputtering Device 【MiniLab-S060】

4 cathodes with Φ2 inch configuration Simultaneous film deposition: 3-component simultaneous deposition (RF 500W or DC 850W) + HiPIMS (PulseDC 5KW) x 1 Power distribution and configuration settings for 4 cathodes can be freely changed via the HMI screen using the plasma relay switch 3 MFC systems (Ar, O2, N2) for reactive sputtering RIE etching stage RF 300W (main chamber) + <30W soft etching (LL chamber) Substrate heating: Max 500℃, 800℃, or 1000℃ (C/C or SiC coating) Substrate rotation and vertical movement (automatically controlled by stepping motor) APC automatic control: Upstream (MFC flow adjustment) or downstream (automatic valve opening adjustment on the exhaust side) Dimensions: 1,120(W) x 800(D) ● Mixed specifications for resistance heating deposition, organic material deposition, EB deposition, PECVD, etc. are also possible.

High-temperature crucible heating heater for vacuum use. A versatile heater unit that can be used as an organic deposition source at 800°C and a metal deposition source at 1500°C.

  • Evaporation Equipment
  • Heating device
  • Electric furnace

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iPROS_MiniLab-026_220x220.jpg

★☆★☆【MiniLab-026】Small Thin Film Experimental Device for R&D Development★☆★☆

This is a flexible thin film experimental device for R&D that eliminates waste by integrating the necessary minimum modules and controllers into a 19" compact rack with a Plug & Play feel, achieving compact size, space-saving design, simple operation, and high cost performance. It supports magnetron sputtering (up to 3 sources) or resistance heating evaporation (metal sources up to 2, organic materials x4), and can also be equipped with a substrate heating stage, allowing for the production of annealing devices and RF etching. There is also a glove box storage type available (specifications to be discussed). We offer a wide range of optional components that can be flexibly customized. ◉ Φ2 inch magnetron cathode (up to 3 sources) ◉ Resistance heating evaporation source filament, crucible, boat type (up to 4 poles with automatic switching via controller) ◉ Organic evaporation cell: 1cc or 5cc ◉ Glove box compatible (optional, specifications to be discussed) ◉ Other options: simultaneous film deposition, HiPIMS, automatic film deposition controller, custom substrate holders, load lock, substrate rotation/heating/cooling, and many more options available. *Please first contact us with your required specifications, and we will configure the system to meet your needs.

This is a heater for thin film experiments such as PVD and CVD, featuring excellent uniformity, heating characteristics, and controllability. RF/DC bias specifications are also available.

  • Heating device

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4-Yen Multi-Sputtering Device 【MiniLab-S060】

4 cathodes with Φ2 inch configuration Simultaneous film deposition: 3-component simultaneous deposition (RF 500W or DC 850W) + HiPIMS (PulseDC 5KW) x 1 Power distribution and configuration settings for 4 cathodes can be freely changed via the HMI screen using the plasma relay switch 3 MFC systems (Ar, O2, N2) for reactive sputtering RIE etching stage RF 300W (main chamber) + <30W soft etching (LL chamber) Substrate heating: Max 500℃, 800℃, or 1000℃ (C/C or SiC coating) Substrate rotation and vertical movement (automatically controlled by stepping motor) APC automatic control: Upstream (MFC flow adjustment) or downstream (automatic valve opening adjustment on the exhaust side) Dimensions: 1,120(W) x 800(D) ● Mixed specifications for resistance heating deposition, organic material deposition, EB deposition, PECVD, etc. are also possible.

Hot Wall Type Thermal CVD Equipment: A compact, high-performance CVD device ideal for fundamental research.

  • CVD Equipment
  • Annealing furnace
  • Heating device

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1.jpg

4-Yen Multi-Sputtering Device 【MiniLab-S060】

4 cathodes with Φ2 inch configuration Simultaneous film deposition: 3-component simultaneous deposition (RF 500W or DC 850W) + HiPIMS (PulseDC 5KW) x 1 Power distribution and configuration settings for 4 cathodes can be freely changed via the HMI screen using the plasma relay switch 3 MFC systems (Ar, O2, N2) for reactive sputtering RIE etching stage RF 300W (main chamber) + <30W soft etching (LL chamber) Substrate heating: Max 500℃, 800℃, or 1000℃ (C/C or SiC coating) Substrate rotation and vertical movement (automatically controlled by stepping motor) APC automatic control: Upstream (MFC flow adjustment) or downstream (automatic valve opening adjustment on the exhaust side) Dimensions: 1,120(W) x 800(D) ● Mixed specifications for resistance heating deposition, organic material deposition, EB deposition, PECVD, etc. are also possible.

Efficient direct heating through radiative heat transfer with wavelengths from 3μm to 1000μm.

  • Heating device

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Efficiently heats almost all substances except metals! Also for the drying process in semiconductor and liquid crystal panel manufacturing!

  • Heating device

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Adopts a titanium case with excellent corrosion resistance!

  • Heating device

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We support the drying of electronic devices and various types of printing and painting inks!

  • Heating device

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Cleanroom-compatible type! Made with special materials that do not generate dust, ensuring safety even in precision equipment manufacturing environments.

  • Heating device

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Ideal for drying processes of electronic devices such as semiconductors and LCD glass!

  • Heating device

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The power supply voltage is 100V/200V/220V/240V! It can be manufactured in various shapes such as convex and concave.

  • Other heaters
  • Heating device

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He supports various specifications of flanges! Can be manufactured according to applications, from small to large capacities.

  • Heating device

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High efficiency and clean heat source! Short delivery time from lamp design to prototype.

  • Heating device

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No need for temperature adjustment since the day before, improved yield even with thawing on the day!

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  • ダイスカット.jpg
  • FRT-10 ドアー閉(S190073・沖縄食鶏加工).jpg
  • Heating device

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By using internal heating with radio waves, we achieve high-quality heating and drying without compromising the flavor of the breadcrumbs.

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  • Heating device

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Even poorly formed candies can be melted down without compromising quality. Achieve zero waste!

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  • Heating device

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High-frequency waves allow for the defrosting of food while still in cardboard. Add value with delivery after defrosting!

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  • FRT-60(ニチレイロジ東扇島).jpg
  • Heating device

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By introducing a high-frequency thawing device, we can achieve a reduction in the processes of "breaking down raw materials and loosening in running water"! Here are examples of frozen raw materials (...

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  • FRT-40BS(マルキユー).jpg
  • Heating device

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A compact and time-efficient sterilization device. It contributes to food waste reduction.

  • Heating device

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Quality preservation of frozen food ingredients! Continuous and high-speed processing of large quantities of frozen products. Automation of the entire process from thawing to processing has been achie...

  • Heating device

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A heating device that is compact and heats quickly.

  • Heating device

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A drying device that is compact and dries in a short time. It does not compromise flavor or quality after drying.

  • Heating device

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Mixing under vacuum, pumping, and temperature control all in one machine! It can be used for applications such as heated mixing, vacuum degassing, and heating. If you use a mantle heater, it can be ut...

  • Heating device

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Just stick it on for fire prevention! A new type of fire extinguisher that can effectively extinguish fires while saving space!

  • Heating device

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Just stick it on for fire prevention! A new type of fire extinguisher that can effectively extinguish fires while saving space!

  • Heating device

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The design of the bottom of the furnace with a thin steel plate allows for easy loading and unloading of the cart. 【Drying furnace, industrial furnace, annealing furnace, industrial drying furnace】

  • Heating device

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Compact body and excellent drying power! Conveyor-type drying furnace suitable for various printing drying applications [Drying furnace, industrial furnace, annealing furnace, industrial drying furnac...

  • Heating device

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We will select a suitable heat source from the heating tests of the work and propose the equipment!

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  • Heating device

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Red silicone blended with iron oxide has improved heat resistance. We also accept orders for heat-resistant sponge adhesive processing for square and round cords.

  • Heating device

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Contributing to the enhancement of high strength and wear resistance of metal products! We respond to the diversifying needs within the industry, such as high functionality and shorter delivery times!

  • Heating device

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Can be used in three phases independently! Reduces the number of heaters and makes wiring work easier.

  • Heating device

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We propose suitable products tailored to our customers! Based on experience and achievements, we provide various support.

  • Heating device

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For those facing challenges in the plating industry and poor drying efficiency! It's okay even if the furnace pressure is high.

  • Heating device

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Excellent durability due to being gas-powered! Indirect hot air generation unit burner.

  • Heating device

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Rubber products (balloons) drying and heating furnace generating volatile gas dilution, and other related topics!

  • Heating device

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Suitable for customers with challenges in drying capabilities such as plating, painting, food, and manufacturing lines!

  • Heating device

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Typically, it has a heat exchange rate of 60-70%, but it can achieve maximum efficiency without any drainage!

  • Heating device

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Top-class level in the industry! It is kept to the minimum necessary energy.

  • Heating device

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For those who want to remove 20% of the moisture contained in combustion gas and improve efficiency!

  • Heating device

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As a clean level when handling food-related items! For the drying of food containers themselves, etc.

  • Heating device

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A lineup of heaters for fryers, convection steam ovens, and steamers!

  • Heating device

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