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  6. ◆OLED◆ Organic vapor deposition - high-temperature metal deposition cell Max 1500℃

◆OLED◆ Organic vapor deposition - high-temperature metal deposition cell Max 1500℃

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◆OLED◆ Organic deposition - high-temperature metal evaporation source Max 1500℃

last updated:Oct 12, 2024

テルモセラ・ジャパン 本社
テルモセラ・ジャパン 本社
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It is a high-performance vacuum deposition source that can be used as a high-temperature heating cell for vacuum applications, with an organic deposition source up to 800°C and a metal deposition source up to 1500°C.

The OLED evaporation source is a high-temperature deposition source for vacuum deposition with a maximum operating temperature of 1500°C. By simply replacing the body without removing the fixed base, you can switch between cells for low-temperature organic deposition (up to 800°C) such as OLEDs and high-temperature heating (up to 1500°C) cells. If used as a source for vacuum film formation, a shutter actuator is also provided. When used as a high-temperature heater above 800°C, it features an internal shield structure designed with insulation and thermal shielding in mind. The shutter adopts a flip type. Even if multiple OLED sources are installed in the chamber, they will not interfere with other components. The crucible can be removed simply by taking off the upper cap, making the material filling and replenishment process hassle-free. The main body is available for 1cc crucibles (maximum filling amount 1.5cc) and 10cc crucibles (maximum filling amount 15cc), and can be exchanged by replacing the main body with the base without removing the fixed base from the chamber. Thermocouples can be specified as either K or C types. Crucibles can be selected from alumina (standard), quartz, PBN, and carbon.

    Evaporation EquipmentHeating deviceElectric furnace
iPROS_550.jpg

◆OLED◆ Organic vapor deposition - high-temperature metal deposition cell Max 1500℃

iPROS_550.jpg
iPROS_550.jpg iPROS_550-1.jpg iPROS_550-2.jpg iPROS_550-3.jpg iPROS_550-4.jpg iPROS_550-5.jpg
  • ThermoCera Japan OLED High-Temperature Evaporation Source Max 1500℃
  • Special site - Product/service details - https://pr.mono.ipros.com/thermocera/product/

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【Main Specifications】 ■ Maximum Control Temperature: 800℃ or 1500℃ ■ Operating Environment: In vacuum or inert gas (*O2 up to 800℃) ■ Heater: Tungsten filament ■ Crucible Volume: 1cc (maximum fill volume 1.5cc) ■ Crucible Material: Alumina (standard) ■ Case Material: SUS304 or Molybdenum ■ Thermocouple: Type K or Type C 【Options】 ⚫︎ Crucible Material: PBN, Graphite, Quartz ⚫︎ Heater: NiCr wire, Kanthal wire (*for O2) ⚫︎ Crucible Volume: 10cc (maximum fill volume 15cc) ⚫︎ Shutter: Pneumatic or motor-driven ⚫︎ Water Cooling Jacket ⚫︎ Controller (Heater and Shutter Control Box)

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Delivery Time

Please contact us for details

※Approximately 6 weeks after the order is received.

Applications/Examples of results

High vacuum crucible heating heater, organic material deposition source for vacuum deposition, high-temperature evaporation metal deposition source, etc.

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MiniLab-LT26A Small Vacuum Deposition Device

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MiniLab-060 Thin Film Experiment Device

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4 cathodes with Φ2 inch mounted Simultaneous film formation: 3-component simultaneous film formation (RF 500W or DC 850W) + HiPIMS (PulseDC 5KW) x 1 Power distribution and configuration settings for 4 cathodes can be freely changed from the HMI screen using the plasma relay switch 3 MFC systems (Ar, O2, N2) for reactive sputtering RIE etching stage RF 300W (main chamber) + <30W soft etching (LL chamber) Substrate heating: Max 500℃, 800℃, or 1000℃ (C/C or SiC coat) Substrate rotation and vertical movement (automatically controlled by stepping motor) APC automatic control: Upstream (MFC flow adjustment) or downstream (automatic valve opening adjustment on the exhaust side) Dimensions: 1,120(W) x 800(D) ● Mixed specifications for resistance heating deposition, organic material deposition, EB deposition, PECVD, etc. are also possible.

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MiniLab-060 Thin Film Experiment Device

★【MiniLab-060】Flexible Thin Film Experimental Device★ Thermosera Japan

  • Product news

Compact/Space-saving, High-spec 60ℓ volume multi-thin film experimental device that can accommodate various applications by integrating thin film modules such as evaporation, sputtering, EB, and annealing. Compact/Space-saving, High-spec thin film experimental device. Combinations possible from the following evaporation sources: - Resistance heating evaporation source x up to 4 - Organic evaporation source x up to 4 - Electron beam evaporation - 2-inch magnetron sputtering cathode x 4 - Plasma etching: can be installed in either the main chamber or the load lock chamber 【Small Footprint/Space-saving】 - Dual rack type (MiniLab-060): 1200(W) x 590(D)mm 【Excellent Operability/Intuitive Operation Screen】 Windows PC or 7” touch panel. Easy operation regardless of skill level, with maximum safety considerations.

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Companynews list (60)

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テルモセラ・ジャパン

テルモセラ・ジャパン 本社

Industrial Electrical Equipment

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【Endless possibility_thermal engineering...】 Our company sells vacuum thin film devices for semiconductor and electronic device fundamental research, ultra-high temperature heaters for CVD substrate heating, experimental furnaces, temperature measurement equipment, and more. To meet the endless demand for "heat," which is indispensable in any era, and to respond to various requests in the field of fundamental technology development, we aim to introduce the latest equipment and contribute to research and development in Japan.

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