List of Electric furnace products
- classification：Electric furnace
1～45 item / All 528 items
We provide comprehensive support from design to manufacturing and maintenance!
- Contract manufacturing
It won't break even after 1 million repetitions! A mat switch with reliable operation, high durability, and low price. Suitable for options in machine tools as well. Please consult us about delivery t...
- Sensors
High-temperature crucible heating heater for vacuum use. A versatile heater unit that can be used as an organic deposition source at 800°C and a metal deposition source at 1500°C.
- Evaporation Equipment
- Heating device
- Electric furnace
◇◆◇ nanoPVD-S10A Magnetron Sputtering Device ◇◆◇
This is an RF/DC magnetron sputtering device for research and development. Despite its high performance and multifunctionality, it fits into the limited space of a laboratory with its compact size and easy operation via a 7-inch front touch panel. ● Achievable pressure: 5x10^-5 Pa (*fastest 30 minutes up to 1x10^-4 Pa!) ● Film uniformity: ±3% ● Various options: up/down rotation, heater, cathode for magnetic materials, and more ● 3-source cathode + 3 MFC systems, with additional RF/DC power supply, allowing for versatile applications such as multilayer films and simultaneous deposition. - Insulating films - Conductive films - Compounds, etc. 【Main Features】 ◉ Compatible substrates: 2" (up to 3 sources) or 1" (1 source) ◉ 2" cathode x up to 3 sources ◉ Easy operation via touch panel with PLC automatic program control ◉ MFC high-precision APC automatic process pressure control ◉ Up to 3 MFC systems ◉ USB port for Windows PC connection, capable of creating and saving recipes for up to 1000 layers and 50 films. Live data logging on PC. ◉ Vacuum system: TMP + RP (*dry pump option) ◉ Substrate rotation, up/down elevation, heating (Max 500℃) ◉ Quartz crystal film thickness monitor/controller
Rent an electric furnace with a wide heat distribution area and a temperature control power supply as a set. Payment is based on usage from a period of one month. Click now for more details!
- Electric furnace
For those struggling with heat radiation and heat conduction from the furnace! Achieve both extended equipment lifespan and energy savings through proper material selection and precise processing base...
- Industrial Furnace
- Electric furnace
- Heating device
Packing used around furnace equipment, high-performance fiber products requiring tensile strength.
- Heating device
- Industrial Furnace
- Electric furnace
An ideal insulation material that can be used from -190℃ to 1100℃ and exhibits excellent performance.
- Heating device
- Industrial Furnace
- Electric furnace
It has become possible to manufacture high-performance insulation materials flexibly to match costs.
- Industrial Furnace
- Heating device
- Electric furnace
Experts in high-temperature insulation materials essential for heat treatment! We handle everything from insulation material selection to precision processing. *Free product catalog available (PDF dow...
- Electric furnace
- Heating device
- Industrial Furnace
It is a flexible heater that can meet various needs.
- Industrial Furnace
- Heating device
- Electric furnace
We process all types of insulation boards.
- Industrial Furnace
- Electric furnace
- Heating device
Maximum operating temperature 2000℃ Semi-automatic control Ultra-high temperature experimental furnace (carbon furnace, tungsten metal furnace) Compact and space-saving experimental furnace
- Heating device
- Annealing furnace
- Electric furnace
【MiniLab-125】 Multi-target sputtering system (compatible with Φ8") equipped with a 1000℃ heater stage (SiC coating)! Compact size!
Multifunctional Multi-Sputtering Device (Compatible with Φ8inch Substrates) - Triple-source simultaneous deposition + Single-source Pulse DC sputtering - Flexible arrangement of RF500W and DC850W power supplies to the three-source cathodes (Source 1, 2, 3) - Equipped with a 5KW Pulse DC power supply → Used with dedicated cathode (4) - Substrate heating stage Max 800℃ (SiC-coated heater can achieve Max 1000℃) - MFC x 3 systems (Ar, O2, N2) for reactive sputtering - Main chamber RIE etching stage RF300W - LL chamber <30W low-power controlled soft etching - Unique "Soft-Etching" technology reduces substrate damage through substrate bias - Touch panel or Windows PC operation: All operations can be performed via touch panel/PC without dispersing control. - Equipment installation dimensions: 1,960(W) x 1,100(D) x 1,700(H) mm - Multi-chamber configurations are also possible. ● Mixed specifications for resistance heating deposition, organic material deposition, EB deposition, PECVD, etc., can also be configured.
Tabletop small-sized experimental furnace - space-saving, with a maximum operating temperature of 2000°C! We also manufacture metal furnaces for reducing atmospheres.
- Heating device
- Electric furnace
- Other heaters
◇◆◇ nanoPVD-S10A Magnetron Sputtering Device ◇◆◇
This is an RF/DC magnetron sputtering device for research and development. Despite its high performance and multifunctionality, it fits into the limited space of a laboratory with its compact size and easy operation via a 7-inch front touch panel. ● Achievable pressure: 5x10^-5 Pa (*fastest 30 minutes up to 1x10^-4 Pa!) ● Film uniformity: ±3% ● Various options: up/down rotation, heater, cathode for magnetic materials, and more ● 3-source cathode + 3 MFC systems, with additional RF/DC power supply, allowing for versatile applications such as multilayer films and simultaneous deposition. - Insulating films - Conductive films - Compounds, etc. 【Main Features】 ◉ Compatible substrates: 2" (up to 3 sources) or 1" (1 source) ◉ 2" cathode x up to 3 sources ◉ Easy operation via touch panel with PLC automatic program control ◉ MFC high-precision APC automatic process pressure control ◉ Up to 3 MFC systems ◉ USB port for Windows PC connection, capable of creating and saving recipes for up to 1000 layers and 50 films. Live data logging on PC. ◉ Vacuum system: TMP + RP (*dry pump option) ◉ Substrate rotation, up/down elevation, heating (Max 500℃) ◉ Quartz crystal film thickness monitor/controller
Tabletop small-sized experimental furnace - space-saving with a maximum operating temperature of 2000℃! We also manufacture metal furnaces for reducing atmospheres.
- Heating device
- Electric furnace
- Annealing furnace
【MiniLab-125】 Multi-target sputtering system (compatible with Φ8") equipped with a 1000℃ heater stage (SiC coating)! Compact size!
Multifunctional Multi-Sputtering Device (Compatible with Φ8inch Substrates) - Triple-source simultaneous deposition + Single-source Pulse DC sputtering - Flexible arrangement of RF500W and DC850W power supplies to the three-source cathodes (Source 1, 2, 3) - Equipped with a 5KW Pulse DC power supply → Used with dedicated cathode (4) - Substrate heating stage Max 800℃ (SiC-coated heater can achieve Max 1000℃) - MFC x 3 systems (Ar, O2, N2) for reactive sputtering - Main chamber RIE etching stage RF300W - LL chamber <30W low-power controlled soft etching - Unique "Soft-Etching" technology reduces substrate damage through substrate bias - Touch panel or Windows PC operation: All operations can be performed via touch panel/PC without dispersing control. - Equipment installation dimensions: 1,960(W) x 1,100(D) x 1,700(H) mm - Multi-chamber configurations are also possible. ● Mixed specifications for resistance heating deposition, organic material deposition, EB deposition, PECVD, etc., can also be configured.
Maximum operating temperature 2000℃ Semi-automatic control Ultra-high temperature experimental furnace (carbon furnace, tungsten metal furnace) Compact and space-saving experimental furnace
- Heating device
- Annealing furnace
- Electric furnace
Multi-functional Sputtering System 【MiniLab-S060】
4 cathodes with Φ2 inch mounted Simultaneous film formation: 3-component simultaneous film formation (RF 500W or DC 850W) + HiPIMS (PulseDC 5KW) x 1 Power distribution and configuration settings for 4 cathodes can be freely changed from the HMI screen using the plasma relay switch 3 MFC systems (Ar, O2, N2) for reactive sputtering RIE etching stage RF 300W (main chamber) + <30W soft etching (LL chamber) Substrate heating: Max 500℃, 800℃, or 1000℃ (C/C or SiC coat) Substrate rotation and vertical movement (automatically controlled by stepping motor) APC automatic control: Upstream (MFC flow adjustment) or downstream (automatic valve opening adjustment on the exhaust side) Dimensions: 1,120(W) x 800(D) ● Mixed specifications for resistance heating deposition, organic material deposition, EB deposition, PECVD, etc. are also possible.
6 to 8 inch ultra-high temperature wafer annealing equipment, a high-performance machine that widely supports various purposes from research and development to small-scale production.
- Annealing furnace
- Heating device
- Electric furnace
【MiniLab-125】 Multi-target sputtering system (compatible with Φ8") equipped with a 1000℃ heater stage (SiC coating)! Compact size!
Multifunctional Multi-Sputtering Device (Compatible with Φ8inch Substrates) - Triple-source simultaneous deposition + Single-source Pulse DC sputtering - Flexible arrangement of RF500W and DC850W power supplies to the three-source cathodes (Source 1, 2, 3) - Equipped with a 5KW Pulse DC power supply → Used with dedicated cathode (4) - Substrate heating stage Max 800℃ (SiC-coated heater can achieve Max 1000℃) - MFC x 3 systems (Ar, O2, N2) for reactive sputtering - Main chamber RIE etching stage RF300W - LL chamber <30W low-power controlled soft etching - Unique "Soft-Etching" technology reduces substrate damage through substrate bias - Touch panel or Windows PC operation: All operations can be performed via touch panel/PC without dispersing control. - Equipment installation dimensions: 1,960(W) x 1,100(D) x 1,700(H) mm - Multi-chamber configurations are also possible. ● Mixed specifications for resistance heating deposition, organic material deposition, EB deposition, PECVD, etc., can also be configured.
Max 1000℃, MFC maximum 3 systems, APC pressure control, compatible with 4" or 6" substrates, high vacuum annealing equipment (<5 × 10^-7 mbar)
- Annealing furnace
- Heating device
- Electric furnace
【MiniLab-125】 Multi-target sputtering system (compatible with Φ8") equipped with a 1000℃ heater stage (SiC coating)! Compact size!
Multifunctional Multi-Sputtering Device (Compatible with Φ8inch Substrates) - Triple-source simultaneous deposition + Single-source Pulse DC sputtering - Flexible arrangement of RF500W and DC850W power supplies to the three-source cathodes (Source 1, 2, 3) - Equipped with a 5KW Pulse DC power supply → Used with dedicated cathode (4) - Substrate heating stage Max 800℃ (SiC-coated heater can achieve Max 1000℃) - MFC x 3 systems (Ar, O2, N2) for reactive sputtering - Main chamber RIE etching stage RF300W - LL chamber <30W low-power controlled soft etching - Unique "Soft-Etching" technology reduces substrate damage through substrate bias - Touch panel or Windows PC operation: All operations can be performed via touch panel/PC without dispersing control. - Equipment installation dimensions: 1,960(W) x 1,100(D) x 1,700(H) mm - Multi-chamber configurations are also possible. ● Mixed specifications for resistance heating deposition, organic material deposition, EB deposition, PECVD, etc., can also be configured.
It is a high-performance vacuum deposition source that can be used as a high-temperature heating cell for vacuum applications, with an organic deposition source up to 800°C and a metal deposition sour...
- Evaporation Equipment
- Heating device
- Electric furnace
◇◆◇ nanoPVD-S10A Magnetron Sputtering Device ◇◆◇
This is an RF/DC magnetron sputtering device for research and development. Despite its high performance and multifunctionality, it fits into the limited space of a laboratory with its compact size and easy operation via a 7-inch front touch panel. ● Achievable pressure: 5x10^-5 Pa (*fastest 30 minutes up to 1x10^-4 Pa!) ● Film uniformity: ±3% ● Various options: up/down rotation, heater, cathode for magnetic materials, and more ● 3-source cathode + 3 MFC systems, with additional RF/DC power supply, allowing for versatile applications such as multilayer films and simultaneous deposition. - Insulating films - Conductive films - Compounds, etc. 【Main Features】 ◉ Compatible substrates: 2" (up to 3 sources) or 1" (1 source) ◉ 2" cathode x up to 3 sources ◉ Easy operation via touch panel with PLC automatic program control ◉ MFC high-precision APC automatic process pressure control ◉ Up to 3 MFC systems ◉ USB port for Windows PC connection, capable of creating and saving recipes for up to 1000 layers and 50 films. Live data logging on PC. ◉ Vacuum system: TMP + RP (*dry pump option) ◉ Substrate rotation, up/down elevation, heating (Max 500℃) ◉ Quartz crystal film thickness monitor/controller
Rapid heating at approximately 50°C/sec using focused light heating method, with the possibility of rapid cooling when the heating lamp is turned off. Compatible with various atmospheres.
- Electric furnace
Catalog for Budget Application for High-Temperature Heating Furnaces / For budget applications such as development and research expenses
We have lined up the heating observation devices and IR image furnaces from Yokokura Manufacturing, used by various research institutions around the world. ▼ Product Lineup ▼ High-Temperature Furnaces 1. Heating Observation Type "MHO-300-2" - Observe with your microscope! Optional cooling down to -100°C. 2. Compact "IR-TPS" - On-site observation at high temperatures (1500°C) with your microscope. 3. Ultra-High Temperature Heating Type "IR-18SP" - Heats up to high temperatures (1800°C). 4. Compact "IR-TP" - Designed to enable various analyses. 5. Wide-Range High-Temperature Type "IR-QP" - Offers a wide heating range in the IR series, heating up to high temperatures (1700°C). 6. Wide-Range Type "IR-HP" - Offers a wide heating range in the IR series, suitable for heating plates, wafers, substrates, etc. 7. Wide-Range High-Temperature Type "IR-HQ" - A higher model than IR-QP, heats up to high temperatures (1800°C). 8. Large Area "IR-OP" - For simulating various heating conditions. 9. Long-Length Large Area "IR-HP5" - Utilizes specially designed long-length heating lamps. Please check the individual product pages for more details. We also welcome inquiries for customizations tailored to your testing needs, so feel free to contact us.
We propose a suitable "hot air generator" for your drying equipment. [It can be used for painting drying, food drying, heating furnaces, and various industrial furnaces.]
- Heating device
- Industrial Furnace
- Electric furnace
【Exhibition Information】Coating Japan - High-Performance Materials Week - Paint and Coating Equipment Exhibition
We are pleased to announce that Shoei Seisakusho, a manufacturer of gas burners and industrial furnaces, will be exhibiting at the "Coating and Painting Equipment Exhibition" held at Makuhari Messe. We will showcase a lineup of heat-generating devices for painting drying equipment, as well as deodorization devices (VOC removal devices) in a panel display. We will also introduce examples of energy-saving equipment and decarbonization items using hydrogen gas burners. ---------------------- The Coating and Painting Equipment Exhibition - COATING JAPAN - is a specialized exhibition where functional coatings, painting equipment, and surface treatment technologies are all presented together. ----------------------
A continuous rust prevention treatment drying furnace suitable for processing large quantities of small items such as bolts, nuts, and drill screws!
- Industrial Furnace
- Heat Treatment Drying Equipment
- Electric furnace
【Exhibition Information】Coating Japan - High-Performance Materials Week - Paint and Coating Equipment Exhibition
We are pleased to announce that Shoei Seisakusho, a manufacturer of gas burners and industrial furnaces, will be exhibiting at the "Coating and Painting Equipment Exhibition" held at Makuhari Messe. We will showcase a lineup of heat-generating devices for painting drying equipment, as well as deodorization devices (VOC removal devices) in a panel display. We will also introduce examples of energy-saving equipment and decarbonization items using hydrogen gas burners. ---------------------- The Coating and Painting Equipment Exhibition - COATING JAPAN - is a specialized exhibition where functional coatings, painting equipment, and surface treatment technologies are all presented together. ----------------------
Solving various issues of the aluminum holding furnace! "1. Reduction of oxides" "2. Improved maintainability" "3. Safety" "4. Energy conservation"
- Electric furnace
- Heating device
- Industrial Furnace
![[VOC Exhaust Gas Treatment Device] ...](https://image.mono.ipros.com/public/product/image/854/2001482680/IPROS61321671107423185282.jpeg?w=280&h=280){kind=small}
It is a device that uses a catalyst to oxidize and decompose VOCs with high efficiency. Since it can process at low temperatures, it can reduce the amount of gas used, and an electric heater type is a...
- Industrial Furnace
- Other painting machines
- Electric furnace
【Exhibition Information】Coating Japan - High-Performance Materials Week - Paint and Coating Equipment Exhibition
We are pleased to announce that Shoei Seisakusho, a manufacturer of gas burners and industrial furnaces, will be exhibiting at the "Coating and Painting Equipment Exhibition" held at Makuhari Messe. We will showcase a lineup of heat-generating devices for painting drying equipment, as well as deodorization devices (VOC removal devices) in a panel display. We will also introduce examples of energy-saving equipment and decarbonization items using hydrogen gas burners. ---------------------- The Coating and Painting Equipment Exhibition - COATING JAPAN - is a specialized exhibition where functional coatings, painting equipment, and surface treatment technologies are all presented together. ----------------------
The G I H burner is a high-efficiency immersion heating burner that can be used in non-ferrous metal holding furnaces.
- aluminum
- Industrial Furnace
- Electric furnace
A test furnace based on actual equipment that uses a hydrogen burner for melting and an electric heater for holding. It is possible to conduct thorough tests for decarbonization in aluminum casting si...
- Electric furnace
[Exhibition Participation] AXIA EXPO 2026 Hydrogen and Ammonia Next-Generation Energy Exhibition
The ultimate energy that does not emit carbon dioxide, "hydrogen and ammonia." The AXIA EXPO 2026 - Hydrogen and Ammonia Next-Generation Energy Exhibition, which is attracting global attention towards the realization of a carbon-free society, will be held. Seihei Seisakusho, a manufacturer of gas burners and industrial furnaces, will showcase hydrogen and ammonia-related products in a panel display at the booth of the Kansai Bureau of Economy, Trade and Industry. We will provide a wealth of information, including the latest updates on hydrogen and ammonia burners and an introduction to decarbonized thermal equipment.
![Electric Hot Air Generator [AH-E]](https://image.mono.ipros.com/public/product/image/e72/2000849252/IPROS83996560503254651282.png?w=280&h=280){kind=small}
Electric hot air generator compatible with hot air temperatures up to 250°C (hot air circulation possible). It can be replaced from gas combustion type, contributing to decarbonization and low carboni...
- Heating device
- Drying Equipment
- Electric furnace
The EOG gas emitted from the EOG sterilization equipment can be rendered harmless to a concentration of 1 ppm or less. It is an exhaust gas treatment device that achieves both high removal efficiency ...
- Sterilizer
- Industrial Furnace
- Electric furnace
Leveraging our expertise in thermal utilization technology, we cater to various industrial furnaces.
- Industrial Furnace
- Electric furnace
- Heating device
Improved temperature distribution, increased production, and energy savings. This electric curing furnace achieves stable temperature distribution through the optimization of heater arrangement and ef...
- Heating device
- Electric furnace
- Industrial Furnace
EOG gas emitted from EOG sterilization equipment can be neutralized to a concentration of 1 ppm or less. It is an exhaust gas treatment device that achieves both high removal efficiency and energy sav...
- Sterilizer
- Industrial Furnace
- Electric furnace
Heat treatment equipment for thermosetting and thermoplastic resins. We propose suitable heating control and conveying control based on the characteristics, production capacity, and installation space...
- Heating device
- Electric furnace
- Industrial Furnace
The EOG gas emitted from the EOG sterilization equipment can be rendered harmless to a concentration of 1 ppm or less. It is an exhaust gas treatment device that achieves both high removal efficiency ...
- Sterilizer
- Industrial Furnace
- Electric furnace
AGV + hot air circulation batch furnace
- Electric furnace
Please leave the initial consultation for organizing the appropriate electric furnace based on the application, temperature, atmosphere, processing volume, and sample shape to us!
- Electric furnace
- Electric furnace/muffle furnace
Is that heating method really the best? A comprehensive guide on how to choose infrared heaters.
- Heating device
- Electric furnace
- Industrial Furnace
Up to 75% Energy Savings: High-Efficiency Rotary Hearth Furnaces with Fixture-Free & Space-Saving Design
- Heating device
- Industrial Furnace
- Electric furnace
Adopting electric dissolution to solve various environmental challenges! Carbon neutrality through all-electric systems.
- Electric furnace
Achieving automation of material input and melting of return materials! Automation of ingot input through a specially designed material input device.
- Electric furnace
The slim design of the main unit due to reduced capacity makes it easy to replace with a gas stove!
- Electric furnace
Achieving continuous melting with direct radiation heating method! Minimizing energy loss to the extreme.
- Electric furnace
Significant reduction of CO2 and noise with all-electric systems! Achieving both reduced environmental impact and energy conservation.
- Electric furnace
Minimize work inside the glove box ◎ Screening of solid electrolyte materials / Impedance evaluation by temperature characteristics ◎ Multiple uniform, short time, and accurate test evaluation
- Lithium-ion battery
- Secondary Cells/Batteries
- Electric furnace
"OCT-equipped heating observation imaging furnace" contributes to global research! Direct observation of internal structural changes at high temperatures.
The "OCT-equipped heating observation furnace" is a compact design that utilizes a focused heating method and is an internal observation device equipped with OCT (Optical Coherence Tomography). Using this device, a research group from Yokohama National University and the Kanagawa Institute of Industrial Science and Technology successfully observed the internal structural changes of ceramics during sintering at high temperatures for the first time in the world. For more details, please refer to the catalog. If you have any questions or inquiries, please feel free to contact us.
Suppressing concerns about degradation and leaks of furnace materials due to corrosive gases, safely examining halogen atmosphere testing.
- Electric furnace
We have reduced waiting time through direct heating with near-infrared radiation, achieving improved productivity in the testing process.
- Heating device
- Electric furnace
- Other heaters