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Chamber×MSAファクトリー - List of Manufacturers, Suppliers, Companies and Products

Chamber Product List

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Hot Plate Temperature Chamber HB-420

Hot Plate Temperature Chamber HB-420

Ideal for optical devices, electronic components, and device evaluation!

As a small constant temperature chamber, it is ideal for testing and evaluation on a tabletop or under a microscope. Additionally, the top is made of heat-resistant glass with a transparent door, providing good visibility, making it suitable for testing light-emitting devices and microscopic inspections. The door features a free-stop structure, allowing it to be held at any angle. Precise temperature control is also possible with a digital temperature controller. Furthermore, connectors for electrical signal extraction can be customized, such as D-SUB and BNC. ● For more details, please download the catalog or contact us.

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Vacuum Hot Plate Chamber "PH-224 Type"

Vacuum Hot Plate Chamber "PH-224 Type"

It uses a thin heater as the heating source, supporting high-speed temperature profile processes.

The "PH-224 type" vacuum hot plate chamber is a small batch furnace type, ideal for small quantities and research and development. It uses a thin heater as the heating source, enabling it to accommodate high-speed temperature profile processes. The temperature controller, being a dedicated type, can obtain the necessary data for process verification (analog output). 【Features】 - The workpiece condition is visible through the observation window. - Air cooling allows for a maximum temperature of 400℃. For more details, please contact us or download the catalog.

  • Heating device

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Peltier Temperature Chamber "PG-1506"

Peltier Temperature Chamber "PG-1506"

There is no condensation during low-temperature testing due to the introduction of nitrogen gas and dry air into the chamber.

The Peltier temperature chamber "PG-1506" features a transparent door made of heat-resistant glass, providing excellent visibility and making it suitable for testing light-emitting devices, microscopic observation, and evaluation through camera observation. There is no condensation during low-temperature testing due to the nitrogen gas and dry air introduction chamber. 【Features】 ○ Temperature range: -40 to 150°C compatible ○ The door has a free-stop structure, allowing it to be held at any angle ○ Precise temperature control is possible with the MSA digital temperature controller For more details, please contact us or download the catalog.

  • Temperature and Humidity Control

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Hot Plate Chamber "PHH-300 Model"

Hot Plate Chamber "PHH-300 Model"

Ideal for reliability evaluation, characteristic evaluation, and burn-in of electronic components, circuit boards, etc.

The hot plate chamber "PHH-300" is ideal for reliability evaluation, characteristic evaluation, and burn-in of electronic components and circuit boards. 【Specification Customization】 ○ Temperature control range: 25 to 200℃, 0.1℃ increments ○ Temperature distribution: ±1.5% ○ Plate size: 300×200mm ○ Test fixtures: *Custom manufacturing available ○ Control software: Options available for temperature setting, temperature monitoring, power supply equipment, etc. For more details, please contact us or download the catalog.

  • Heating device

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Peltier Temperature Chamber PG-0806

Peltier Temperature Chamber PG-0806

Ideal for optical devices, electronic components, and device evaluation!

As a small constant temperature chamber, it is ideal for testing and evaluation on a tabletop or under a microscope. Additionally, the top features a transparent door made of acrylic (or heat-resistant glass), providing good visibility and making it suitable for testing light-emitting devices and microscopic inspections. The door can be held at any angle due to its free-stop structure. Precise temperature control is also possible with a digital temperature controller. Furthermore, connectors for extracting electrical signals can be customized, such as D-SUB and BNC. ● For more details, please download the catalog or contact us.

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Vacuum Hot Plate Chamber Model PH-224

Vacuum Hot Plate Chamber Model PH-224

High-speed heating process under vacuum atmosphere and low oxygen concentration atmosphere for metals, wafers, etc.!

The "PH-224 type" is a vacuum hot plate chamber that supports a maximum temperature of 400°C. It is a compact batch furnace type, ideal for small quantities and research and development. It employs a thin heater as the heating source, enabling it to accommodate high-speed temperature profile processes. Additionally, an observation window allows for visibility of the workpiece's condition. The temperature controller, designed specifically for this purpose, can obtain the necessary data for process verification (analog output). It supports air cooling and can reach a maximum temperature of 400°C. ● For more details, please download the catalog or contact us.

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Semi-Automatic Vacuum Hot Plate Chamber "PH-224S-200 Model"

Semi-Automatic Vacuum Hot Plate Chamber "PH-224S-200 Model"

Maximum temperature 400℃! It is a small batch furnace type, ideal for small quantities and research and development.

The semi-automatic vacuum hot plate chamber "PH-224S-200" uses a ceramic heater as its heat source, enabling it to accommodate high-speed temperature profile processes. The temperature controller can obtain the necessary data for process verification (analog output) through a dedicated type. 【Features】 ○ Air-cooled, supports a maximum temperature of 400°C ○ Compact batch furnace type, ideal for small quantities and research and development ○ Observation window allows visibility of the workpiece condition ○ Valve operation automatically responds (programmable according to the recipe) For more details, please contact us or download the catalog.

  • Other semiconductor manufacturing equipment
  • Heating device

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Semi-Automatic Vacuum Hot Plate Chamber "PH-224S-42 Model"

Semi-Automatic Vacuum Hot Plate Chamber "PH-224S-42 Model"

It is a small batch furnace type, ideal for small quantities and research and development.

The semi-automatic vacuum hot plate chamber "PH-224S-42" is a small batch furnace type, ideal for small quantities and research and development. It uses thin heaters as the heating source, enabling it to accommodate high-speed temperature profile processes. It has the capacity to process three 6-inch wafers or two 8-inch wafers as a wafer heating batch furnace. 【Features】 ○ Maximum temperature: 300°C ○ The temperature controller, being a dedicated type, can obtain necessary data for process verification (analog output) ○ Valve operation: automatic response (programmable according to the recipe) For more details, please contact us or download the catalog.

  • Heating device

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Vacuum Hot Plate Chamber "PH-224D Model"

Vacuum Hot Plate Chamber "PH-224D Model"

Heating processes and material evaluation under vacuum atmosphere and low oxygen concentration atmosphere for metals, wafers, etc.

The "PH-224D model" vacuum hot plate chamber is ideal for heating processes and material evaluation under vacuum conditions and low oxygen concentration atmospheres for metals, wafers, and more. 【Specifications Customization】 ○ Temperature control range: Room temperature to 200℃ ○ Plate size: 200×200mm ○ Pressure range: -100KPa (vacuum) to 0.02MPa (when filled with N2 gas) For more details, please contact us or download the catalog.

  • Heating device

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Simple Draft Chamber "CBB-1200 Type"

Simple Draft Chamber "CBB-1200 Type"

For experiments and research, for bio-related purposes, and for the storage of pharmaceuticals.

- It is a customizable simple draft chamber. - You can introduce a draft chamber with a low investment. - All items, such as size, material of panels and doors, and the range of door movement, can be customized. - We will create a draft chamber that fits your installation space. ● For more details, please download the catalog or contact us.

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