Automatic Register Development Device (Sheet-fed) Developer
Due to the sheet-type design, the reproducibility of the process is high, and the amount of chemical solution used is minimal. This is a resist development device that meets the needs for quality improvement and process stability!
This is a sheet-type photoresist developing system. It can accommodate various developing processes such as paddle development and spray development (single fluid, dual fluid). We have numerous achievements with thin wafers and square substrates! Additionally, it can handle a wide range from thick film resist development to fine pattern development. Our product features sheet-type development, baking, and cooling functions (optional: full exposure unit). We offer a lineup tailored to production volume, from manual machines to fully automatic machines, and since we handle everything from design to manufacturing and sales in-house, we achieve low prices. We have a proven track record with a variety of chemicals, including TMAH (tetramethylammonium hydroxide), sodium carbonate, and choline aqueous solution. 【Features】 ■ Stable developing process! ■ Low price ■ Automatic wafer size recognition ■ Proven track record with various chemicals ■ Compact design tailored to specifications! ■ Equipment lineup according to production volume We have a permanent demonstration setup, so please consider a demo.
- Company：エイ・エス・エイ・ピイ
- Price：Other
