We have compiled a list of manufacturers, distributors, product information, reference prices, and rankings for Plasma Equipment.
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Plasma Equipment Product List and Ranking from 45 Manufacturers, Suppliers and Companies

Last Updated： Aggregation Period:Sep 17, 2025～Oct 14, 2025
This ranking is based on the number of page views on our site.

Plasma Equipment Manufacturer, Suppliers and Company Rankings

Last Updated： Aggregation Period:Sep 17, 2025～Oct 14, 2025
This ranking is based on the number of page views on our site.

  1. イー・スクエア Kyoto//Electronic Components and Semiconductors
  2. 魁半導体 Kyoto//Educational and Research Institutions
  3. JFEプラントエンジ Tokyo//others
  4. 4 ジャパンクリエイト Saitama//Testing, Analysis and Measurement
  5. 5 null/null
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Plasma Equipment Product ranking

Last Updated： Aggregation Period:Sep 17, 2025～Oct 14, 2025
This ranking is based on the number of page views on our site.

  1. Digital Oil Checker "Wendy" JFEプラントエンジ
  2. Handheld Atmospheric Pressure Plasma Treatment Device "Piezo Brush PZ3"
  3. How to Choose an Atmospheric Pressure Plasma Device That You Can't Ask About Now *Explanatory Materials Provided イー・スクエア
  4. 4 Small Vacuum Plasma Device NMR-Gts 魁半導体
  5. 4 Single Leaf Spin Spray Cleaning Device SRC-15001 ジャパンクリエイト

Plasma Equipment Product List

31～45 item / All 200 items

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Simple Atmospheric Pressure Plasma Device A1000

Simple Atmospheric Pressure Plasma Device A1000

[Domestic] Low temperature, no charge damage! Simple atmospheric pressure plasma device with high processing performance for cleaning, surface modification, hydrophilization, and adhesion enhancement! Suitable for small batch laboratory applications.

We offer sales, rentals, and contract services for a simple atmospheric pressure plasma device that excels in cleaning, surface modification, hydrophilization, and adhesion enhancement. This device is affordably priced and easy to introduce for labs and small batches. It is widely used in universities, major research institutions, R&D departments, and production departments across the country, providing high processing effectiveness. Additionally, we handle everything from design to manufacturing in-house, and our dedicated technicians provide attentive support for all specifications. 【Features】 ■ There is almost no damage from heat. → It can process samples that are sensitive to heat. (Under certain conditions, the sample surface can be kept around 40°C.) ■ It does not operate in a concentrated arc state like corona discharge. → It does not cause charge damage to the items being processed. ■ Only nitrogen is plasma-activated. → Expensive gases like Ar or He are not required. ■ It operates on a standard AC100V outlet, making it usable in various situations. ■ Supports slit-type torch (φ20mm) spray width. *Demo processing and equipment rental are also available. Please check the details from the 'Download' section.

  • Other semiconductor manufacturing equipment

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Tabletop Vacuum Plasma Device YHS-G (Gas Introduction Type)

Tabletop Vacuum Plasma Device YHS-G (Gas Introduction Type)

A tabletop vacuum plasma device that can introduce various gases such as air, oxygen, nitrogen, and argon! It can be used for surface modification and cleaning of materials♪

Utilizing the high reactivity of plasma to solve various issues such as adhesion and bonding enhancement to materials like resin, metal, glass, and fiber, improvement of hydrophilicity, and removal of organic substances! This model can introduce various gases such as oxygen, nitrogen, argon, and helium. Additionally, it is equipped with a front panel for power adjustment, gas flow measurement, and a pressure gauge, allowing irradiation under various conditions♪ The chamber size is φ250mm × height 150mm.

  • Other semiconductor manufacturing equipment

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Direct-type atmospheric pressure plasma device D300-TB *Inline processing capable

Direct-type atmospheric pressure plasma device D300-TB *Inline processing capable

A direct-type atmospheric pressure plasma device allows for continuous surface treatment of both sides of a film. It can plasma-activate air and enable large area processing (up to 1000mm)!

Direct atmospheric pressure plasma device! By plasma-activating air with high processing capability, the running costs are low. As shown in the diagram, continuous processing of films in a roll-to-roll manner is possible. Additionally, by combining it with conveyors and other equipment, it can be used for various materials such as glass and resin molded products. It is capable of processing large areas, with a processing width of up to 1 meter. Please try the effects with a free demonstration processing first. *For more details, please download the catalog or contact us directly.*

  • Other semiconductor manufacturing equipment
  • Other surface treatment equipment

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Ideal for research and development! Tabletop vacuum, atmospheric pressure, and powder plasma device.

Ideal for research and development! Tabletop vacuum, atmospheric pressure, and powder plasma device.

Surface modification: Improved wettability, enhanced adhesion, nano cleaning! Cutting-edge plasma treatment makes it easy to conduct experimental development of new technologies! Free demonstrations are currently available!!

Utilizing the high reactivity of plasma for various materials such as resin, metal, glass, substrates, tubes, fibers, and powders, you can enhance wettability, strengthen adhesion, and perform cleaning for a wide range of surface treatment applications! With a one-touch function, even beginners in vacuum equipment can easily handle it, and it is available at an affordable price suitable for testing effects at the lab level. 【R&D Practical Examples】 - Strengthening adhesion of dissimilar materials, removing organic thin films, cleaning glass - Enhancing adhesion of films, cleaning electronic components, improving adhesion of thin films - Increasing wettability of various coatings, etc... 【University and Research Institution Practical Examples】 - Bonding PDMS and glass, strengthening adhesion in MEMS, dental medicine - Cleaning medical tubes, improving wettability of fibers, pre-treatment for cell culture, etc... 【Surface Modification of Powders】 - Carbon nanotubes, carbon powders, ceramics, silica, etc. Improving hydrophilicity from μ to nm particle sizes!

  • Plasma surface treatment equipment

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[Domestic] Vacuum Plasma Device (490,000) Atmospheric Pressure Plasma Device (340,000)

[Domestic] Vacuum Plasma Device (490,000) Atmospheric Pressure Plasma Device (340,000)

Excellent low-temperature charge damage-free surface modification and cleaning! Affordable vacuum and atmospheric pressure plasma available!

For more details, please download the catalog. Utilizing the high reactivity of plasma for various materials such as "resin," "metal," "glass," "substrates," "tubes," "fibers," and "powders," you can apply it to a wide range of surface treatment applications, including "wetting property enhancement," "adhesion strengthening," and "cleaning"! 【Practical Examples】 - Strengthening adhesion of dissimilar materials, removing organic thin films, cleaning glass - Strengthening adhesion of films, cleaning electronic components, enhancing adhesion of thin films - Improving wettability of various coatings, etc... 【Practical Examples in Universities and Research Institutions】 - Bonding PDMS and glass, strengthening adhesion in MEMS, dental applications - Cleaning medical tubes, pre-treatment for cell culture, etc... 【Surface Modification of Powders】 - Carbon nanotubes, carbon powders, ceramics, silica, etc. Enhancing hydrophilicity from μm to nm particle sizes! Free demonstration processing is currently being conducted!

  • Etching Equipment

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Small Rotary Vacuum Plasma Device "MUG-80"

Small Rotary Vacuum Plasma Device "MUG-80"

Time reduction and cost savings with batch processing! For surface modification of small amounts of powder and tiny components!

The long-awaited compact version of the rotary tabletop plasma device is finally here! Utilizing the high reactivity of plasma for various materials such as "powders and solid surfaces," it can be used for a wide range of surface treatment applications including "hydrophilization," "cleaning," and "adhesion enhancement." Unlike conventional plasma devices that require flipping the sample due to untreated contact areas where the sample does not touch the plasma, this product allows for uniform plasma treatment across the entire sample surface by rotating the chamber. 【Features】 - Equipped with a compact chamber of φ80 - Capable of simultaneous treatment of the entire surface with a rotating chamber - Reduced processing time and cost through simultaneous treatment! - Uniform treatment of contact areas between samples - Easy sample retrieval with a detachable chamber - Mechanism for adjusting rotation speed and applied power 【Applications】 - Enhancing adhesion strength for various resin molded products like O-rings - Uniform surface modification on medical needles and tubes - General applications for improving hydrophilicity and dispersibility of various powders - Enhancing coating adhesion strength on fine particles like capacitors Currently accepting free demo treatments!

  • Other powder equipment
  • Other semiconductor manufacturing equipment

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Brush Plasma Device S5000-FS2

Brush Plasma Device S5000-FS2

By guiding plasma through numerous flexible ultra-thin tubes, plasma treatment of the bottom surfaces of uneven objects is possible.

Efficient, thin film thickness, and uniform coating!

  • Plasma surface treatment equipment

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Gas-free pen-type atmospheric pressure plasma device NRSR-P10

Gas-free pen-type atmospheric pressure plasma device NRSR-P10

Plasma treatment can be performed without supplying gas from the outside. It is applicable for surface treatment (pre-treatment for painting, adhesion, printing, etc.) and in the bio-medical field as well.

Product Features - Easy to handle pen type - No gas supply required, can be used with only AC100V power connection - Simple operation - Compact control box - Unlike corona discharge types, no opposing electrode is needed - No charge damage to the treatment target

  • Other semiconductor manufacturing equipment

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No gas required! A compact plasma treatment device capable of removing organic substances.

No gas required! A compact plasma treatment device capable of removing organic substances.

Surface cleaning with planar atmospheric pressure plasma! Uniform treatment possible on a flat surface within a diameter of 50mm!

The tabletop atmospheric pressure asher is a compact plasma treatment device that can remove organic substances using atmospheric pressure plasma without the need for water or detergents. It can uniformly process surfaces within a diameter of 50mm without moving it with a conveyor. It is suitable for organic substance removal and cleaning applications on planar workpieces. **Features** - Capable of processing a 'surface' all at once, rather than points or lines. - Small tabletop size suitable for experiments. - No need for gas supply or vacuum exhaust equipment. **Applications** - Pre-treatment for adhesion and coating. - Cleaning of mechanical parts. - Cleaning of optical components (lenses and mirrors). - Pre-treatment of cell culture containers, etc. *For more details, please download the catalog or feel free to contact us.*

  • Other machine elements

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Small Vacuum Plasma Device NMR-Gts

Small Vacuum Plasma Device NMR-Gts

Destroying the market for vacuum plasma devices!

The industry's first high-quality, low-cost compact vacuum plasma device "NMR-Gts" has been newly launched. Uniform plasma treatment for fibers and films!

  • Surface treatment contract service
  • others

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Direct-type atmospheric pressure plasma device D300-TB

Direct-type atmospheric pressure plasma device D300-TB

No need for introduction gas; surface modification is possible with air.

- No introduction gas required, surface modification possible with air - Wide slit irradiation possible (up to 1000mm) - High treatment effectiveness

  • Plasma Generator

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Organic solvent-based spray developing device WSD-150

Organic solvent-based spray developing device WSD-150

Device dimensions: 560W × 850D × 1300H

Set the substrate in the chuck manually, then perform spray development, rinsing, and spin drying.

  • Other semiconductor manufacturing equipment

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Barrel-type plasma treatment device PB series

Barrel-type plasma treatment device PB series

Utilizing isotropic plasma, ideal for cleaning and modifying fine patterns and the inner surfaces of tube shapes!

The barrel-type plasma treatment device "PB Series" utilizes isotropic vacuum plasma for the removal of organic materials (Ashing), removal of oils (Cleaning), etching of silicon compounds (SiO2, SiN), and improvement of wettability, all without the use of solutions (Wet). It achieves a good environmental performance (clean working environment, no waste liquid) and low running costs. Treatment progresses from all directions, demonstrating the effects of nano-level processing, cleaning, and modification regardless of the shape of the target object. 【Device Features】 ■ Free processing that does not select sample shapes (cylindrical treatment chamber / isotropic plasma) ■ Diverse processes: Ashing (cleaning), Etching, surface modification, etc. ■ All parts are compatible with clean room standards (can be used as semiconductor manufacturing equipment) ■ Cost-effective, small footprint design ■ Safety specifications suitable for use as a mass production device For more details, please contact us or download the catalog.

  • Plasma surface treatment equipment

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Parallel plate type vacuum plasma treatment device

Parallel plate type vacuum plasma treatment device

Various functional groups (hydrophilic, lipophilic, adhesion improvement, etc.) can be chemically bonded to various substrates and films according to their applications.

The "PC-RIE series" is capable of providing various surface modification effects on different substrates and films. Of course, it can also perform treatments such as ashing, etching, and descumming as a general plasma treatment device. You can choose a version that suits your needs, ranging from a manually operated research and development type chamber to a fully automated system with an atmospheric gate, transport mechanism, and cassette station. 【Features】 ○ Functional group modification treatment ○ Reactive Ion Etching (RIE) For more details, please download the PDF or contact us.

  • Plasma surface treatment equipment
  • Vacuum Equipment
  • Other surface treatment equipment

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Roll-to-roll type vacuum plasma treatment device 'PR Series'

Roll-to-roll type vacuum plasma treatment device 'PR Series'

Compatible with the processing of roll-type film substrates. Through vacuum plasma treatment, in addition to ashing and etching, surface modification treatment (functional group addition) is possible.

The "PR Series" is a roll-to-roll processing device capable of plasma treatment under reduced pressure. It can firmly impart various functional groups (such as hydrophilic, lipophilic, adhesion improvement, etc.) to the surface of substrates, starting with resist ashing and insulating film etching, depending on the application. We have a demo unit at our headquarters and are accepting process evaluation treatments at any time. Please contact us for more details. 【Features】 ■ Roll-to-roll type ■ Plasma treatment under reduced pressure - Higher organic removal and surface modification effects compared to atmospheric pressure devices - Capable of processes that were not possible with atmospheric pressure devices (such as various functional group modifications) *For more details, please refer to the PDF materials or feel free to contact us.

  • Plasma surface treatment equipment
  • Vacuum Equipment
  • Other surface treatment equipment

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