Last Updated： Aggregation Period:Sep 17, 2025～Oct 14, 2025
This ranking is based on the number of page views on our site.
Last Updated： Aggregation Period:Sep 17, 2025～Oct 14, 2025
This ranking is based on the number of page views on our site.
Last Updated： Aggregation Period:Sep 17, 2025～Oct 14, 2025
This ranking is based on the number of page views on our site.
16～30 item / All 200 items
Demo units available for loan! You can process several sheets at once.
This machine is a spin-type spray developing device that performs developing, rinsing, washing, and drying through automatic and manual operation. It can process several workpieces at once. For more details, please contact us or refer to the catalog.
The substrate size is up to φ12 inches! Using our unique CO2 rubber jet nozzle.
The "CO2 Spray Cleaning Device" allows for CO2 cleaning in a low dew point environment for cleaning in a vacuum environment. It uses our proprietary nozzle, the CO2 Rubber Jet Nozzle. The speed and density of solid CO2 particles can be varied, enabling us to propose optimal cleaning conditions. It can be used for particle removal on micro lenses, removal of sputter residues, and improvement of wettability. 【Features】 ■ Our proprietary nozzle: CO2 Rubber Jet Nozzle ■ Cleaning in a vacuum environment ■ Damage-free dry cleaning is possible ■ Maximum substrate size is φ12 inches ■ Handheld spray unit available for sale *For more details, please refer to the PDF document or feel free to contact us.
We have a track record of devices such as "XeF2 etching equipment" and "batch-type ashing equipment."
We would like to introduce the custom manufacturing achievements of Japan Create Co., Ltd. regarding "Dry Etching Equipment." We have a track record of "ICP Etching Equipment for Research and Development," "ICP Plasma Etching Equipment," "XeF2 Etching Equipment," and "Batch-type Ashing Equipment." Sample processing is being conducted using demo units. Please feel free to contact us when needed. 【Manufacturing Achievements】 ■ ICP Etching Equipment for Research and Development ■ ICP Plasma Etching Equipment ■ XeF2 Etching Equipment ■ Batch-type Ashing Equipment *For more details, please refer to the PDF materials or feel free to contact us.
Reduction of particles through suitable surface treatment! Compatible with high vacuum processes using a load-lock system.
The "Load Lock Type EB Evaporation Device" achieves excellent film thickness distribution and reproducibility through substrate rotation. It supports high vacuum processes using a load lock system, as well as lift-off processes and tray transport. It is capable of high-temperature processes up to 900°C, and maintenance of the chamber is easy. Please feel free to contact us when needed. 【Features】 ■ Capable of high-temperature processes up to 900°C ■ Achieves excellent film thickness distribution and reproducibility through substrate rotation ■ Supports high vacuum processes with a load lock system ■ Reduces particles through suitable surface treatment ■ Easy maintenance of the chamber *For more details, please refer to the PDF materials or feel free to contact us.
High-density plasma is generated over a large area by the unique reactor head!
Facilitates the construction of mass production inline systems for large workpieces (such as glass substrates) from semiconductor IC pad cleaning to FPC substrates and LCD glass substrates, achieving reductions in capital investment and running costs! Simple plasma unit equipped with a manual stage Compatible with build-in for various devices.
On-site oil management! Instant measurement of oil contamination (dirt and moisture) on the spot.
"Wendy" is a simple diagnostic tool that instantly performs primary assessments of the contamination level (pollution including foreign substances and moisture) of general hydraulic fluids, bearing oils, gear oils, and other mineral oil-based products by immersing a probe into the sample oil. It employs a method that measures the attenuation rate based on light scattering and absorption. Additionally, it is lightweight (200g for the main unit) and compact for portability. 【Features】 ■ Instantly measures oil contamination (debris and moisture) on-site ■ Compact and portable ■ Displays assessment of contamination level *For more details, please refer to the PDF materials or feel free to contact us.
![Wire Surface Cleaning System [GEO Corporation]](https://image.mono.ipros.com/public/product/image/e43/2000466634/IPROS33445149956181771246.jpeg?w=280&h=280)
A specialized manufacturer of wire cleaning equipment in Germany. We propose the optimal system tailored to your applications and purposes.
Geo Corporation is a specialized manufacturer of wire cleaning equipment in Germany. We offer a lineup that includes the easy-to-maintain and economical "Surface Wiping System," as well as "Ultrasonic Cleaning Systems" and "High-Pressure Cleaning Systems." We can propose the optimal cleaning system tailored to the condition, use, and purpose of the wire. If you are having trouble with wire cleaning, please feel free to contact us. 【Products Offered】 ■ Surface Wiping System ■ Cylindrical Ultrasonic Cleaning System ■ High-Pressure Cleaning System ■ Spiral Brush *For more details, please refer to the PDF materials or feel free to contact us.
We sell various plasma devices, including low-pressure types that can accommodate a wide range of materials and atmospheric pressure types that can be installed inline.
We sell the "Low Pressure and Atmospheric Pressure Plasma Equipment" manufactured by Diener Electronic, which has a wealth of implementation experience in various fields, including semiconductors. Our lineup ranges from easy-to-handle, low-cost small experimental products to large machines with powerful processing capabilities. We offer a wide variety of models for both low pressure and atmospheric pressure types, allowing customers to choose according to their needs for research and development or small-scale production. 【Features】 ◎ Low Pressure Plasma Equipment ■ Capable of plasma treatment for glass, metal, plastic, textiles, powders, and more ■ Numerous implementations in research and development, as well as in mass production lines ■ Various sizes of plasma chambers available to meet customer requirements ◎ Atmospheric Pressure Plasma Equipment ■ Can be installed inline or mounted on robots ■ Contributes to the removal of organic substances from work surfaces and improves adhesion through enhanced hydrophilicity ■ Plasma can be generated using a 100V power supply and high-pressure air of 0.5MPa to 0.8MPa *For more details, please refer to the materials. Feel free to contact us with any inquiries.
Atmospheric pressure plasma device using compressed air - Low running costs - High surface modification effect through spot treatment
Diener Electronic GmbH, established in 1993, offers a wide range of plasma cleaners, from small models for research and development and low-volume processing to large processing machines. Diener's atmospheric pressure plasma devices create a high-voltage field at the electrode part of the plasma nozzle, which ionizes the gas passing through it. This plasma is then projected into the atmosphere using an air stream to clean the target products and improve their hydrophilicity. By using compressed air instead of argon or helium gas as the gas source, it is also possible to reduce running costs. *For more details about the products, please download the catalog or feel free to contact us.*
プログラム番号を選択後、ボタン1つでプラズマ処理完了。操作性がよく、どなたでも利用できて非常に便利です。
Diener GmbH + Co. KGは、低圧プラズマ粉体システムを開発し、疎水性の機能性添加剤を恒久的に親水性にすることで、多くの先駆的な用途に向けた製品特性を改善することができるようになり、新製品開発に数多く携わってきた実績のある製品です。 例えば、親水化したPEパウダーは、金属とプラスチックの接合強度を高めることができます。この親水化は、低圧プラズマ処理によって実現され、処理条件はパウダーの粒子径に強く依存します。 プラズマ処理の時間は5分から数時間です。 処理時間中、処理温度が低く保たれるため、粉体への熱的なダメージはありません。同様に、融点、結晶化度、モル重量などの基本的な特性も影響を受けません。 幅広い可変プロセスパラメーターにより、さまざまなコーティング特性を実現することができます。 処理中は、ドラム型の真空チャンバー内で粉体を連続的に攪拌し、均一な処理を実現します。処理温度は約30℃と低く、粉体への熱ダメージや基本特性の変化はありません。 FEMTO、PICO、NANOはそれぞれボトル容量が異なり、処理量に合わせて装置モデルを選択することができます。
"Introduction of plasma at low cost" is an atmospheric pressure plasma device ideal for testing, research, and small-scale production.
The atmospheric pressure plasma device from Germany's Diener (Diener) company forms a high-voltage field at the electrode part of the plasma nozzle, which ionizes the gas passing through it. This plasma is then irradiated into the atmosphere using an air stream, allowing for cleaning and hydrophilicity improvement of the target products. Since it uses compressed air instead of argon or helium gas as the gas source, it also enables a reduction in running costs. The Plasma Beam Mini is an ideal device for testing, research, and small-scale production, widely used not only by universities and research institutions but also by general companies for product development, receiving high praise. For customers considering the introduction of the device, many have started with the Mini as a test unit, taking the first step in solving challenges through plasma surface modification. The irradiation width is 3 to 5 mm, making it a product perfect for localized surface pretreatment.
![Handheld Atmospheric Pressure Plasma Device S5000-BM [Domestic Product]](https://image.mono.ipros.com/public/product/image/830/225345024/IPROS8733544134742778432.jpg?w=280&h=280)
[No Solvent Required] Handy-type atmospheric pressure plasma device, low temperature, no charge damage! High processing performance for cleaning, surface modification, hydrophilization, and adhesion enhancement!
We offer sales, rentals, and contract services for a handy atmospheric pressure plasma device that excels in cleaning, surface modification, hydrophilization, and adhesion enhancement. It is widely used in universities, major research institutions, R&D departments, and production departments across the country, demonstrating high processing effectiveness. Additionally, we handle everything from design to manufacturing in-house, and our dedicated engineers provide attentive support for all specifications. 【Features】 ■ There is almost no damage from heat. → It is possible to process samples that are sensitive to heat. (Under certain conditions, the sample surface can be kept around 40°C.) ■ It does not operate in a concentrated arc state like corona discharge. → It does not cause charge damage to the objects being processed. ■ Only nitrogen is plasma-activated. → Expensive gases like Ar and He are not required. ■ It operates on a standard AC100V outlet, making it usable in various situations. ■ Supports slit-type torch (5mm to 100mm) spray width. *Demo processing and equipment rentals are also available. Please check the details in the 'Download' section.
Domestic ultra-compact pen-type atmospheric plasma device suitable for fine processing and laboratory applications! It can be easily used at an affordable price.
We offer sales, rentals, and contract services for a pen-type atmospheric pressure plasma device that excels in cleaning, surface modification, hydrophilization, and adhesion enhancement. 【Features】 ■ There is almost no damage from heat. → It can process samples that are sensitive to heat. (Under certain conditions, the sample surface can be kept around 40°C.) ■ It does not operate in a concentrated arc state like corona discharge. → It does not damage the charge of the treated object. ■ Only nitrogen is used for plasma generation. → Expensive gases like Ar and He are not required. ■ It operates with an AC100V outlet, making it usable in various situations. *Demo processing and equipment rentals are also available. Please check the details from the 'Download' section.
Next, it enhances adhesion, improves wettability, and has cleaning effects. It is ideal for surface treatments such as thin film formation, various bonding, painting, and plating pre-treatments, as well as in the fields of biotechnology and medicine.
Domestic plasma device manufacturer "Sakai Semiconductor." Plasma is ideal for surface treatments such as thin film formation, various bonding, painting, and plating pretreatments, as well as in the fields of bio and medical applications. We offer a lineup that includes PEN-type atmospheric pressure plasma, atmospheric pressure plasma series, tabletop vacuum plasma devices, and powder plasma. Sakai Semiconductor Co., Ltd. is one of the few domestic plasma device manufacturers in Japan, and we strive day and night with the philosophy of "providing seeds by uncovering needs." If you have difficult requests, we will respond with sincerity. We develop various semiconductor manufacturing devices using plasma, including deposition devices and surface modification devices with liquid sources, and we respond to customer needs through the development and sales of semiconductor manufacturing devices via contract research. We are currently offering a comprehensive catalog for free! For more details, please download the catalog or contact us.
![Atmospheric Pressure Liquid Surface Powder Plasma Device [ASS-400]](https://image.mono.ipros.com/public/product/image/e23/2000088751/IPROS4890382953504087303.png?w=280&h=280)
Surface modification of powders with plasma! Improve surface wettability and mix powders and liquids that did not blend without the need for dispersants! (Video below)
This is a technology that can promote the industrialization of processes that have been difficult to commercialize due to challenges in processing time and cost in industries requiring powder treatment. KAI Semiconductor's unique atmospheric pressure powder plasma treatment offers: - Elimination of the need for surfactants, removing factors that lead to performance degradation, resulting in higher purity and higher quality materials. - Development of environmentally friendly materials by eliminating surfactants. - Significant reduction in processing time and realization of lower costs by simultaneously performing surface treatment and dispersion. - No degradation of the powder itself. - Easy re-dispersion of powders that have been treated once due to surface modification effects. These are some of its excellent features. We also accept contract processing of powders. We handle contract processing of powders below several tens of micrometers, including graphite carbon, carbon nanotubes, and fullerenes, as well as Ti, W, and SiO2. Right now!! We are holding a limited-time campaign on Ipros! We are offering free demo processing for the first 10 applicants. This is a rare opportunity to try it out! Don't miss it!
