No need for introduction gas; surface modification is possible with air.
- No introduction gas required, surface modification possible with air - Wide slit irradiation possible (up to 1000mm) - High treatment effectiveness
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basic information
Dimensions (Control Unit) 320mm(W) × 430mm(D) × 177mm(H) (Torch Unit) 430mm(W) × 100mm(D) × 125mm(H) Irradiation Width 300mm Output Adjustment None Gas Introduction Not Required Power Supply 100V, 5A (50Hz/60Hz)
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Applications/Examples of results
- Removal of organic substances from FPD glass substrates (cleaning) - Improvement of wettability (coating and adhesive pretreatment) - Surface modification of films * Compared to remote types, there is a burden on the samples.
Company information
KAI Semiconductor was established in September 2002 as a venture company originating from Kyoto Institute of Technology. It sells surface modification devices and deposition equipment using plasma technology. The powder plasma device released in 2010 was recognized for its high technical capabilities and received the "Kansai Front Runner Award" and the "Small and Medium Enterprises Technology Award." There are numerous implementation records at universities nationwide, AIST, major manufacturers, and R&D departments. We propose sales after you have had the opportunity to touch the actual product (demo unit). Additionally, we offer rental and leasing options to reduce the burden on our customers. We also accept various technical consultations beyond semiconductor-related matters. Furthermore, we process and sell quartz and Pyrex in small lots.
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