Technical documents on plasma, including surface changes of various materials (such as gold, resin, glass), surface composition from XPS measurements, and changes over time, are compiled.
Table of Contents 1. What is Plasma!? 2. Principles of Surface Modification 3. Effects of Plasma Treatment 4. Surface Composition 5. Time-dependent Changes 6. Introduction of Applications 7. Vacuum and Atmospheric Pressure Plasma 8. Tube Plasma 9. Powder Plasma Treatment 10. Technical Scope of Correspondence
Inquire About This Product
basic information
Domestic manufacturer of plasma equipment "Sakai Semiconductor" Awarded last year's "Kansai Frontner Award" and "Kyoto Small and Medium Enterprises Excellent Technology Award." Our in-house engineers respond to various needs. This product is offered with specifications optimal for fine processing and laboratory applications.
Price range
P3
Delivery Time
Applications/Examples of results
【Field】 <Electronics> - Semiconductors ... Front-end process, back-end process - Substrates ... Substrate, lead frame, plating - Electronic components ... LED, MEMS, optics, sensors - Displays - Solar cells, fuel cells 【Materials】 - Metals, resins, films, fibers, powders <Automotive/Aerospace> - Car electronics, power devices, interior and exterior materials, lighting 【Applications】 - Cleaning/removal of organic substances/surface modification/improvement of hydrophilicity/improvement of adhesion effects/pre-treatment for printing and painting/cell culture 【Examples】 Electronics, Materials - Cleaning and pre-treatment for adhesion of glass - Cleaning and pre-treatment for adhesion of LSI - Cleaning and pre-treatment for adhesion of resin molded products - Substrate cleaning for solar cells and fuel cells - Terminal cleaning for organic EL, digital signage-related displays, and LCD substrates - Pre-treatment for wire bonding - Cleaning and pre-treatment for adhesion of films - Cleaning of MEMS, etc. - Pre-cleaning before plating - Cleaning of semiconductor plates - Cleaning of silicon wafers, etc.
catalog（3）
Download All Catalogs
News about this product（1）
Company information
KAI Semiconductor was established in September 2002 as a venture company originating from Kyoto Institute of Technology. It sells surface modification devices and deposition equipment using plasma technology. The powder plasma device released in 2010 was recognized for its high technical capabilities and received the "Kansai Front Runner Award" and the "Small and Medium Enterprises Technology Award." There are numerous implementation records at universities nationwide, AIST, major manufacturers, and R&D departments. We propose sales after you have had the opportunity to touch the actual product (demo unit). Additionally, we offer rental and leasing options to reduce the burden on our customers. We also accept various technical consultations beyond semiconductor-related matters. Furthermore, we process and sell quartz and Pyrex in small lots.
![[Part 2] High cleaning power even at low pressure! 'Rehilar's tank cleaning nozzle'](https://image.mono.ipros.com/public/product/image/bdb/2000321003/IPROS43511945133007001992.jpeg?w=280&h=280)
