Low-temperature and low-flow atmospheric pressure plasma treatment is possible! Surface modification: Stable generation of plasma without charge damage in an atmospheric pressure environment!
- There is almost no damage from heat. - It can be used with various gases such as air, nitrogen, argon, and helium. - It operates on an AC100V outlet, making it usable in various situations. - It can also be used as a laboratory device. - Dimensions (excluding protrusions) (mm) 260(W) × 280(D) × 139(H) - Maintenance is also easy.
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basic information
External dimensions (Control unit: excluding protrusions) 260mm (W) × 280mm (D) × 139mm (H) (Plasma pen part) φ25mm × 122mm Irradiation range Output adjustment available Gas used N2, Ar, He, air (modifications may be required depending on the gas) Flow adjustment none Power supply 100V, 5A (50Hz/60Hz) Function processing time timer
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Applications/Examples of results
- Wetting property improvement (pre-treatment before coating and adhesion) - Surface cleaning for metals, glass, resins, films, fibers, etc. (removal of organic substances)
Company information
KAI Semiconductor was established in September 2002 as a venture company originating from Kyoto Institute of Technology. It sells surface modification devices and deposition equipment using plasma technology. The powder plasma device released in 2010 was recognized for its high technical capabilities and received the "Kansai Front Runner Award" and the "Small and Medium Enterprises Technology Award." There are numerous implementation records at universities nationwide, AIST, major manufacturers, and R&D departments. We propose sales after you have had the opportunity to touch the actual product (demo unit). Additionally, we offer rental and leasing options to reduce the burden on our customers. We also accept various technical consultations beyond semiconductor-related matters. Furthermore, we process and sell quartz and Pyrex in small lots.
