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  6. Direct-type atmospheric pressure plasma device D300-TB *Inline processing capable

Direct-type atmospheric pressure plasma device D300-TB *Inline processing capable

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D300-TB

last updated:Nov 20, 2014

魁半導体
魁半導体
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A direct-type atmospheric pressure plasma device allows for continuous surface treatment of both sides of a film. It can plasma-activate air and enable large area processing (up to 1000mm)!

Direct atmospheric pressure plasma device! By plasma-activating air with high processing capability, the running costs are low. As shown in the diagram, continuous processing of films in a roll-to-roll manner is possible. Additionally, by combining it with conveyors and other equipment, it can be used for various materials such as glass and resin molded products. It is capable of processing large areas, with a processing width of up to 1 meter. Please try the effects with a free demonstration processing first. *For more details, please download the catalog or contact us directly.*

    Other semiconductor manufacturing equipmentOther surface treatment equipment
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Direct-type atmospheric pressure plasma device D300-TB *Inline processing capable

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  • Related Link - http://www.sakigakes.co.jp/plasma_D300-TB.html

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basic information

Domestic manufacturer of plasma equipment "Sakai Semiconductor" Established in 2002 as a venture company originating from Kyoto Institute of Technology. Received the "Kansai Front Runner Award" and "Kyoto Small and Medium Enterprise Excellent Technology Award" last year. Our in-house engineers respond to various needs. This product was developed in cooperation with the Ministry of Education, Culture, Sports, Science and Technology's support project "Kyoto Environmental Nanocluster."

Price information

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Price range

P5

Delivery Time

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※About two months.

Applications/Examples of results

【Applications】 - LCD CF line: processes before and after cleaning, before coating and application - Adhesion enhancement for FPC, improvement of PI adhesion wettability - Surface modification and cleaning of various films (coating, adhesion enhancement, etc.) - Surface modification of rubber materials, etc... *For more details, please contact us.

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Direct-type atmospheric pressure plasma device D300-TB

Direct-type atmospheric pressure plasma device D300-TB

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魁半導体

魁半導体

Educational and Research Institutions

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KAI Semiconductor was established in September 2002 as a venture company originating from Kyoto Institute of Technology. It sells surface modification devices and deposition equipment using plasma technology. The powder plasma device released in 2010 was recognized for its high technical capabilities and received the "Kansai Front Runner Award" and the "Small and Medium Enterprises Technology Award." There are numerous implementation records at universities nationwide, AIST, major manufacturers, and R&D departments. We propose sales after you have had the opportunity to touch the actual product (demo unit). Additionally, we offer rental and leasing options to reduce the burden on our customers. We also accept various technical consultations beyond semiconductor-related matters. Furthermore, we process and sell quartz and Pyrex in small lots.

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