Semiconductor-oriented | Dry ice blast cleaning
Clean cleaning technology that prevents secondary contamination and does not damage precision parts.
In the semiconductor industry, the removal of minute foreign substances during the manufacturing process is a critical issue that affects product quality and yield. Particularly in the cleaning of precision electronic components and substrates, a clean wash without residues is required. Traditional cleaning methods can lead to problems such as residue from cleaning agents and damage to components. Our dry ice blast cleaning uses dry ice that vaporizes instantly, allowing for cleaning without causing secondary contamination and without damaging precision parts. 【Usage Scenarios】 - Cleaning of semiconductor manufacturing equipment parts - Removal of foreign substances from electronic substrates - Cleaning of precision molds 【Benefits of Implementation】 - Elimination of post-cleaning recovery work, improving work efficiency - Reduction of disassembly and assembly processes for cleaned items - Suppression of harmful substance emissions, reducing environmental impact
- Company:東洋ユニオン
- Price:Other