Heat-resistant label type No. 101 temperature dependence of discoloration
In Ar plasma treatment, the color difference ΔE*ab tends to decrease under higher temperature conditions!
We would like to introduce the technical data regarding the temperature dependence of discoloration for the heat-resistant label No. 101 (high sensitivity type). In Ar plasma treatment, the color difference ΔE*ab tends to decrease at higher temperature conditions, while in O2 plasma treatment, the color difference ΔE*ab tends to increase at higher temperature conditions, showing the opposite temperature dependence compared to Ar plasma treatment. Additionally, the "PLAZMARK heat-resistant label" has flexibility and adhesion, allowing for easy application and evaluation on substrate surfaces and within devices. 【Overview of Ar Plasma Treatment】 - RF Plasma Device (manufactured by Arios Co., Ltd.) - RF Power: 60W - Ar Gas Flow Rate: 40 sccm - Achieved Vacuum Level: 5×10^-4 Pa - Treatment Pressure: 10 Pa - Stage Temperature: 25 to 200℃ 【Overview of O2 Plasma Treatment】 - RF Plasma Device (manufactured by Arios Co., Ltd.) - RF Power: 60W - O2 Gas Flow Rate: 40 sccm - Achieved Vacuum Level: 5×10^-4 Pa - Treatment Pressure: 10 Pa - Stage Temperature: 25 to 200℃ *For more details, please refer to the related links or feel free to contact us.
- Company:サクラクレパス PI事業部
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