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sauce×フォンアルデンヌジャパン - List of Manufacturers, Suppliers, Companies and Products

sauce Product List

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Hot Wire Source "HWCV/DCAT-CVD/ICVD"

For catalytic CVD and iCVD applications! Integrated gas distribution system.

We provide hot wire sources for catalytic CVD and iCVD applications. Special linear energy sources are available for inline and dynamic film deposition processes. They consist of specially designed source flanges and quickly attachable wire components, which can reduce downtime of the wire components simply by replacing them on a unit-by-unit basis as needed. 【Features】 ■ Inorganic (e.g., SiH4) and organic (e.g., CxHy, plastic monomer precursors) materials can be used ■ Integrated gas distribution system ■ Continuous sheet, carrier, or roll-to-roll processes ■ Flexible operating positions: upward (limited), downward (limited), vertical ■ Adjustable wire spacing according to process requirements *For more details, please refer to the PDF document or feel free to contact us.

  • Plasma Generator
  • Ventilation and Exhaust

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Linear Ion Source "LION"

Robust and scalable design! High-energy, strongly focused beam.

"LION" is a component suitable for pre-treatment and surface modification. It removes hydrocarbons through argon processing and can add oxygen if necessary. The ion beam is strongly focused and has high energy. It is an ideal device for inline film deposition systems that require physical etching, and due to its simple and robust design, the ion source can be easily scaled up. The main applications are large-area glass film deposition and metal foil deposition. 【Features】 ■ Removes hydrocarbons through argon processing and can add oxygen if necessary ■ Available in an external version with adjustable angle and a flange-mounted version ■ Robust and scalable design ■ High-energy, strongly focused beam ■ Pre-treatment of various types of substrate materials *For more details, please refer to the PDF materials or feel free to contact us.

  • Electron beam lithography equipment

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Holocathode Source "HCS"

Electrode spacing can be freely adjusted for process compatibility! Achieving gentle processing with low discharge voltage.

The "HCS" is a surface treatment component characterized by the integration of a hollow cathode and an anode. Electrons are confined between the potential drops of the deep groove walls of the cathode. This promotes gas ionization and increases plasma density. When plasma is pushed into the grooves, a very powerful and bright plasma is generated beneath the electrode plate. With a simple and scalable design, it achieves robust behavior and easy customization. In terms of high-density plasma processing, it is comparable to CCP and ICP, but at a lower cost than ICP. 【Features】 ■ Hollow cathode design, substrate-independent ■ High electron density and ionization efficiency promote high-density radicals ■ Scalable ion source for surface cleaning, activation, and etching purposes ■ Applicable to thin film coating due to specific component design ■ Usable for dynamic and static substrate transport *For more details, please refer to the PDF document or feel free to contact us.

  • Ventilation and Exhaust
  • Plasma Generator

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