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target Product List and Ranking from 25 Manufacturers, Suppliers and Companies | IPROS GMS

Last Updated： Aggregation Period:Feb 18, 2026～Mar 17, 2026
This ranking is based on the number of page views on our site.

target Manufacturer, Suppliers and Company Rankings

Last Updated： Aggregation Period:Feb 18, 2026～Mar 17, 2026
This ranking is based on the number of page views on our site.

  1. SPUTTERCORE CO.,LTD. Osaka//Electronic Components and Semiconductors
  2. 蝶理 無機ファイン部 Osaka//Chemical
  3. エドモンド・オプティクス・ジャパン Tokyo//Optical Instruments
  4. 4 ウエキコーポレーション Tokyo//Chemical
  5. 5 MSHシステムズ Tokyo//Optical Instruments
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target Product ranking

Last Updated： Aggregation Period:Feb 18, 2026～Mar 17, 2026
This ranking is based on the number of page views on our site.

  1. Aluminum Silicon (Al-Si) Target [Alloy Target] SPUTTERCORE CO.,LTD.
  2. Tin oxide (SnO) target SPUTTERCORE CO.,LTD.
  3. High purity sputtering target, manufactured by PRAXAIR. ウエキコーポレーション
  4. Nickel-Vanadium (NiV) Target SPUTTERCORE CO.,LTD.
  5. 4 Korean-made sputtering target (oxide-based ITO, IGZO) 蝶理 無機ファイン部

target Product List

61～90 item / All 116 items

Displayed results
Hafnium (Hf) target for measuring instruments

Hafnium (Hf) target for measuring instruments

Support for improving sensor performance with high-purity Hf targets.

In the measurement equipment industry, particularly in the sensor field, high precision measurements and stable performance are required. The performance of sensors is greatly influenced by the quality of the materials used, with the purity and uniformity of the target materials used for thin film formation being especially important. Contamination by impurities and non-uniformity in film thickness can lead to reduced sensitivity and malfunctions in sensors. Our high-purity Hf targets address these challenges and contribute to the improvement of sensor reliability. 【Application Scenarios】 - High-precision sensors - Environmental measurement equipment - Medical sensors 【Benefits of Implementation】 - Improved sensor performance with high-purity materials - Enhanced stability through uniform thin film formation - Elimination of internal defects through UT inspection

  • Other metal materials
  • target

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Hafnium (Hf) target for optical lenses

Hafnium (Hf) target for optical lenses

Support for improving the performance of optical lenses with high-purity Hf targets.

In the optical lens industry, high transmittance and durability are required. Particularly for lenses exposed to ultraviolet light and high-temperature environments, the purity and uniformity of the materials are essential for maintaining lens performance. Inappropriate materials or manufacturing processes can lead to degradation of lens performance and a decrease in lifespan. Our high-purity Hf target contributes to the improvement of optical lens performance due to its high purity and uniformity. 【Application Scenarios】 - Optical lens manufacturing - Coating - Sputtering 【Benefits of Implementation】 - Improved lens transmittance - Enhanced lens durability - Increased stability of film formation

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  • target

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Tungsten (W) target for display applications

Tungsten (W) target for display applications

Tungsten (W) target purity ≧ 5N

In the display industry, thin film formation technology is a crucial factor that influences product performance and quality. In particular, to enhance the display performance, the formation of uniform and high-quality thin films is essential. The use of inappropriate target materials can degrade the quality of the thin films and negatively impact the brightness and contrast of the display. Our tungsten (W) targets enable the formation of high-purity and uniform thin films, contributing to the high performance of displays. 【Application Scenarios】 - Thin film formation in display manufacturing - High-definition displays, organic EL displays, liquid crystal displays - Thin film formation through sputtering 【Benefits of Implementation】 - Improved display performance through high-quality thin film formation - Uniform film thickness and high adhesion - Increased yield and cost reduction

  • Other metal materials
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Aerospace Tungsten (W) Target

Aerospace Tungsten (W) Target

For high-temperature applications in the aerospace field. High-purity tungsten target.

In the aerospace industry, the durability of components under high-temperature conditions is essential. Particularly for heat-resistant components such as rocket engines and aircraft turbine blades, it is crucial to prevent material degradation and maintain performance over extended periods. Improper material selection can lead to component failure or performance deterioration. Our tungsten (W) targets are of high purity and possess excellent heat resistance. The sputtering technology enables uniform film formation, contributing to the manufacturing of heat-resistant components in the aerospace field. 【Application Scenarios】 - Rocket engine nozzles - Coatings for aircraft turbine blades - Heat shields for space exploration vehicles 【Benefits of Implementation】 - Increased lifespan of components in high-temperature environments - Achievement of high heat resistance and durability - Uniform film formation through sputtering

  • Other metal materials
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Tungsten (W) Target for the Energy Industry

Tungsten (W) Target for the Energy Industry

Tungsten (W) target purity ≧ 5N

In the energy industry, especially in applications that require corrosion resistance, the durability of materials is extremely important. Selecting materials that can withstand harsh environments is essential for ensuring the long-term reliability and safety of products. Tungsten (W) targets provide excellent corrosion resistance and contribute to the stable operation of energy-related equipment. 【Application Scenarios】 - Use in corrosive environments - Use in high-temperature environments - Applications requiring high durability 【Benefits of Implementation】 - Prolonged equipment lifespan - Reduced maintenance costs - Stable performance maintenance

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[Tungsten (W) Target for Research Institutions]

[Tungsten (W) Target for Research Institutions]

Improving the reliability of experiments with high-purity tungsten (W) targets.

In experiments conducted at research institutions, obtaining high-precision data is crucial. Particularly in sputtering experiments, the quality of the target material significantly affects the experimental results. Contamination and lack of uniformity can compromise the reliability of the experimental data. Our tungsten (W) targets are of high purity (≧5N), contributing to enhanced reproducibility of experiments. 【Application Scenarios】 - Sputtering experiments - Thin film formation experiments - Material property evaluation 【Benefits of Implementation】 - Acquisition of reliable experimental data with high-purity materials - Improvement of experimental accuracy through uniform film thickness formation - Adaptability to various experiments with W alloy targets

  • Other metal materials
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Tungsten (W) target for electronic components

Tungsten (W) target for electronic components

Tungsten (W) target purity ≧ 5N

In the electronic components industry, the bonding process is a crucial factor that affects product reliability. Particularly for electronic components exposed to high temperatures and vibrations, the quality of the joints significantly influences product lifespan. Poor bonding can lead to decreased performance and early failure of the product. Our tungsten (W) targets achieve high-quality bonding and contribute to the improvement of electronic component reliability. 【Application Scenarios】 - Bonding of semiconductor devices - Bonding of electronic circuit boards - Electrode formation for electronic components 【Benefits of Implementation】 - High-quality bonding with high-purity tungsten - Improved reliability of joints through uniform film formation - Ability to meet diverse bonding needs with W alloy targets

  • Other metal materials
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Tungsten (W) target for precision instruments

Tungsten (W) target for precision instruments

For thin film formation of precision machinery. High purity tungsten (W) target.

In the precision machinery industry, the accuracy of thin film technology is becoming increasingly important due to the demand for higher performance and miniaturization of products. Particularly for precision components that require durability and reliability, the formation of high-quality thin films is essential. Low-quality thin films can lead to decreased product performance and shortened lifespan. Our tungsten (W) targets enable high-quality sputtering deposition, providing optimal materials for thin film formation in precision machinery. 【Application Scenarios】 - Sensors - MEMS devices - Optical components - Electronic components 【Benefits of Implementation】 - High-precision thin film formation - High durability - Uniform film thickness - Compatibility with various materials

  • Other metal materials
  • target

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Aerospace Tantalum (Ta) Target

Aerospace Tantalum (Ta) Target

Tantalum (Ta) target purity ≧ 5N

In the aerospace industry, the durability of components in high-temperature environments is crucial. Particularly for rocket and aircraft engine parts, materials with excellent heat resistance and corrosion resistance are required. Traditional materials have faced issues with degradation and corrosion in high-temperature environments. Our tantalum (Ta) target offers high heat resistance and excellent corrosion resistance, enhancing reliability in aerospace applications. 【Application Scenarios】 - Rocket engine parts - Aircraft engine parts - Components used in high-temperature environments 【Benefits of Implementation】 - Improved heat resistance - Enhanced corrosion resistance - Increased lifespan of components

  • Other metal materials
  • target

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Tantalum (Ta) target for automotive sensors

Tantalum (Ta) target for automotive sensors

Tantalum (Ta) target purity ≧ 5N

In the automotive industry, sensor technology requires high precision and durability. Especially for sensors used in harsh environments, the reliability of materials significantly affects performance. Tantalum (Ta) targets have been developed to meet these demands. 【Application Scenarios】 - In-vehicle sensors - Autonomous driving systems - Safe driving assistance systems 【Benefits of Implementation】 - Realization of high-sensitivity sensors - Extension of sensor lifespan - Assurance of stable performance

  • Other metal materials
  • target

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Tantalum (Ta) target for communication purposes

Tantalum (Ta) target for communication purposes

Tantalum (Ta) target purity ≧ 5N

In the telecommunications industry, particularly for high-frequency applications, the transmission efficiency of signals and the durability of devices are important challenges. High-frequency devices are susceptible to high-temperature environments and the effects of electromagnetic waves, and the quality of the materials used greatly influences performance. Tantalum (Ta) targets possess high heat resistance, excellent corrosion resistance, and good conductivity, addressing these challenges. Our tantalum (Ta) targets enable the formation of high-quality thin films, contributing to the high performance of communication devices. 【Application Scenarios】 - High-frequency filters - High-frequency amplifiers - Communication satellite components - 5G base stations 【Benefits of Implementation】 - Improved high-frequency characteristics - Extended device lifespan - Enhanced stability of signal transmission - Increased thin film deposition efficiency

  • Other metal materials
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Tantalum (Ta) target for jewelry.

Tantalum (Ta) target for jewelry.

High-purity tantalum (Ta) target that enhances the beauty of jewelry.

In the jewelry industry, a beautiful appearance and high durability are essential in design. Particularly as design diversification progresses, the expressiveness of metallic luster and color significantly influences the appeal of products. Tantalum (Ta) targets are a crucial element in achieving both beauty and durability in surface treatment for jewelry due to their high corrosion resistance and high density. Our tantalum (Ta) targets enrich the design expression of jewelry by providing high-quality thin films to address these challenges. 【Usage Scenarios】 - Decorative items such as rings, necklaces, and bracelets - Decorative components for watches - High-design accessories 【Benefits of Implementation】 - Achieving beautiful metallic luster and color - Extending product lifespan through high corrosion resistance - Realizing design diversity

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Zirconium (Zr) target for nuclear fuel

Zirconium (Zr) target for nuclear fuel

Zirconium (Zr) target, purity ≧ 3N5, Hf ≦ 0.2 wt%, currently shipping.

In the nuclear fuel industry, materials with high heat resistance and corrosion resistance are required. In particular, the quality of zirconium alloys is crucial for ensuring the safety of fuel in the harsh environment within a reactor. Zirconium (Zr) targets have been developed to meet these demands. 【Application Scenes】 - Fuel manufacturing for nuclear power plants - Production of zirconium alloys in research and development 【Effects of Introduction】 - Manufacturing of high-quality zirconium alloys - Improvement of fuel safety - Achievement of long-term stable operation

  • Other metal materials
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Zirconium (Zr) target for electronics

Zirconium (Zr) target for electronics

Shipping zirconium (Zr) targets with purity ≥ 3N5 and Hf ≤ 0.2 wt%.

In the electronics industry, high-quality thin film formation is required for sputtering applications. Particularly in the manufacturing of semiconductor devices and electronic components, the purity and uniformity of the target material significantly affect product performance. Zirconium (Zr) targets are utilized in the production of various electronic components due to their excellent corrosion resistance and heat resistance. Our zirconium (Zr) targets enable high-quality thin film formation and contribute to improving the reliability of our customers' products. 【Usage Scenarios】 - Semiconductor manufacturing - Electronic component manufacturing - Thin film formation 【Benefits of Implementation】 - High-quality thin film formation - Improved product reliability - Enhanced sputtering efficiency

  • Other metal materials
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Zirconium (Zr) target for display applications

Zirconium (Zr) target for display applications

Zirconium (Zr) target, purity ≧ 3N5, Hf ≦ 0.2 wt%, in shipment.

In the display industry, the film deposition process requires the formation of high-quality thin films. In particular, the uniformity and adhesion of thin films, which influence the display's performance, are crucial. Zirconium (Zr) targets are materials that meet these demands. 【Application Scenarios】 - Sputtering deposition in display manufacturing - Situations requiring high-quality thin film formation 【Benefits of Implementation】 - Improved display performance through high-quality thin film formation - Realization of a stable deposition process

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Zirconium (Zr) target for automotive exhaust gases

Zirconium (Zr) target for automotive exhaust gases

Support for exhaust gas purification with zirconium (Zr) targets.

In the automotive industry, with the strengthening of exhaust gas regulations, there is a demand for improved exhaust gas purification performance. In particular, the reduction of harmful substance emissions is essential for reducing environmental impact. Zirconium (Zr) targets contribute to the manufacturing of exhaust gas purification catalysts and achieve high purification performance. Our zirconium (Zr) targets provide high quality and stable performance, supporting the development of our customers' exhaust gas purification technologies. 【Usage Scenarios】 - Manufacturing of exhaust gas purification catalysts - Research and development by automobile manufacturers - Quality improvement for catalyst manufacturers 【Effects of Implementation】 - Improved exhaust gas purification performance - Compliance with environmental regulations - Enhanced product reliability

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Zirconium (Zr) target for energy storage

Zirconium (Zr) target for energy storage

Zirconium (Zr) target, purity ≧ 3N5, Hf ≦ 0.2 wt%, currently shipping.

In the energy storage industry, there is a demand for the development of high-performance materials, and zirconium (Zr) targets may play a significant role in this. In particular, durability and reliability are crucial, and the quality of the target material affects the efficiency of film formation. Our zirconium (Zr) targets enable high-quality film formation and contribute to the performance enhancement of energy storage devices. 【Application Scenarios】 - High-performance batteries - Hydrogen storage 【Benefits of Implementation】 - Improved device performance through high-quality film formation - Assurance of long-term reliability

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Nickel (Ni) target for medical devices

Nickel (Ni) target for medical devices

Nickel (Ni) target pursued for biocompatibility.

In the medical device industry, materials with excellent biocompatibility are required. Particularly for devices that come into direct contact with the human body, such as implants and biosensors, the safety and durability of the materials are crucial. Inappropriate materials can cause allergic reactions and adverse effects on tissues. Our nickel (Ni) targets enable thin film formation with consideration for biocompatibility due to their high purity and density. 【Application Scenarios】 - Implant Coating - Biosensors - Medical Devices 【Benefits of Implementation】 - High biocompatibility - Improved durability - Enhanced functionality through precise thin film formation

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Nickel (Ni) target for electronic components

Nickel (Ni) target for electronic components

For the electrodes of electronic components. High purity nickel (Ni) target.

In the electronic components industry, the quality of electrode materials is a crucial factor that influences the performance and reliability of products. If the performance of the electrodes is low, it may lead to product malfunctions or a decrease in lifespan. Our nickel (Ni) targets provide high-purity and dense nickel materials, supporting the formation of high-quality electrodes. 【Application Scenarios】 - Electrodes for electronic components 【Benefits of Implementation】 - Improved product performance through high-quality thin film formation - Ensured high reliability

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Nickel (Ni) target for semiconductor thin films

Nickel (Ni) target for semiconductor thin films

Nickel (Ni) target purity ≧ 4N5. Contributes to the improvement of thin film formation quality.

In the semiconductor industry, thin films are a crucial factor that influences device performance. The quality of thin films is greatly affected by the purity, density, and uniformity of the target material. Contamination by impurities and density variations can lead to a decline in device performance and a decrease in yield. Our nickel (Ni) targets are of high purity and excellent density, enabling the formation of high-quality thin films. 【Application Scenarios】 - Thin film formation in semiconductor manufacturing - Formation of metal films through sputtering - Formation of NiCr, NiTi, NiCu, and NiCuTi alloy thin films 【Benefits of Implementation】 - Achievement of high-quality thin films - Improvement in device performance - Enhancement of yield

  • Other metal materials
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Nickel (Ni) target for optical coating

Nickel (Ni) target for optical coating

Improving the quality of optical coatings with a nickel (Ni) target.

In the optical industry, coating technology requires high film quality and uniformity. Particularly in optical components such as lenses and filters, even slight irregularities or defects in the coating can significantly affect the product's performance. Our nickel (Ni) target achieves high-quality thin film deposition due to its high purity and dense characteristics, contributing to the enhancement of optical product performance. 【Application Scenarios】 - Lens coating - Anti-reflective coatings - Optical filters 【Benefits of Implementation】 - High-density and uniform film quality - Stabilization of optical properties - Improved product durability

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Aerospace Nickel (Ni) Target

Aerospace Nickel (Ni) Target

For high-temperature applications in the aerospace field. High-purity nickel target.

In the aerospace industry, the durability of components under high-temperature conditions is crucial. In particular, materials with excellent heat resistance and corrosion resistance are required for jet engine and rocket components. Nickel (Ni) targets have been developed to meet these demands. High-purity nickel is essential for the production of heat-resistant alloys and contributes to the performance enhancement of aerospace components through thin film deposition technology. 【Application Scenarios】 - Jet engine components - Rocket components - Sensors used in high-temperature environments 【Effects of Implementation】 - Improved heat resistance and corrosion resistance - Increased lifespan of components - Enhanced reliability

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List of resolution test targets

List of resolution test targets

Short delivery time with stock sales! All items available for sale from one piece.

Edmund Optics offers a wide range of resolution test targets to meet many imaging measurement needs. Resolution test targets enable users to easily measure the accuracy of their imaging systems and monitor performance over the long-term use of the system, allowing for an extended lifespan of the system. The starter target consists of a circular pattern made up of many wedge-shaped lines, measuring resolution by assessing how well the imaging system can distinguish individual lines. The target with a Ronchi pattern similarly features a series of dense lines that are not wedge-shaped, measuring the performance of the imaging system. Many of the resolution test targets are available in both glass slide and photo paper types. ■ For more details, please visit the official Edmund Optics website via the link below.

  • Other electronic parts
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Sputtering target & bonding processing

Sputtering target & bonding processing

We offer sales of sputtering targets (planar/cylindrical) and support bonding processing.

For applications such as semiconductors, MRAM, touch panels, anti-reflective films, solar cells (PV), lithium-ion batteries, and displays: - We offer a wide range of support from small-scale prototyping of sputtering targets to mass production supply. - We can provide reliable bonding solutions based on years of experience and knowledge, along with proposals tailored to your budget. - We support not only planar types but also cylindrical targets and bonding that offer cost advantages and excellent yield. - Quality assurance through our proprietary large UT inspection equipment (ultrasonic testing) and quality management system. - In addition to our own facilities, we leverage domestic and international networks to meet diverse needs. - We possess uniquely developed high-quality bonding materials and methods.

  • Non-ferrous metals
  • target

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High purity sputtering target, manufactured by PRAXAIR.

High purity sputtering target, manufactured by PRAXAIR.

As the exclusive domestic agent for Praxair's sputtering targets, we support our customers' manufacturing through a network spread across various regions in Japan.

Aiming for High Quality PRAXAIR has earned a reputation as a leading supplier through extensive research and development, as well as the manufacturing of the highest quality sputtering targets. AdvanTage Tantalum Targets AdvanTage tantalum targets provide consistent and reproducible process performance. They achieve reproducible sputtering film deposition through uniform thickness and mass production quality. Advanced manufacturing techniques generate a uniform microstructure, enhancing initial stability and ensuring consistent sputtering performance throughout the product's lifespan. Certified products are also available for each sputtering equipment manufacturer.

  • Other metal materials
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Thin film materials (targets and deposition materials) for IoT 5G devices.

Thin film materials (targets and deposition materials) for IoT 5G devices.

For those developing small quantities of diverse devices who are not satisfied with existing materials, we provide custom solutions that cater to their needs.

WAVES Corporation offers a wide range of sputtering targets and deposition materials for the semiconductor industry. We are the only partner company of VEM, which boasts over 30 years of experience in the U.S. thin film materials industry. VEM Company Website: https://www.vem-co.com 【Features】 - Purity from 99.9% to 99.9999% - Orders can be placed in small lots - Custom targets can be requested in specific shapes - Enhanced target support available - High quality - Includes analysis certificate and SDS

  • Non-ferrous metals
  • target

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[Research Material] Global Market for High Purity Alloy Sputtering Targets

[Research Material] Global Market for High Purity Alloy Sputtering Targets

Global Market for High Purity Alloy Sputtering Targets: Square Targets, Circular Targets, Shaped Targets, Electronics, Aerospace, Others

This research report (Global High Purity Alloy Sputtering Target Market) investigates and analyzes the current status and outlook for the global market of high purity alloy sputtering targets over the next five years. It includes information on the overview of the global high purity alloy sputtering target market, trends of major companies (sales, selling prices, market share), market size by segment, market size by major regions, and distribution channel analysis. The market segments by type include square targets, circle targets, and irregular targets, while the segments by application focus on electronics, aerospace, and others. The regional segments are divided into North America, the United States, Europe, Asia-Pacific, Japan, China, India, South Korea, Southeast Asia, South America, the Middle East, and Africa, calculating the market size for high purity alloy sputtering targets. It also includes the market share of major companies in high purity alloy sputtering targets, product and business overviews, and sales performance.

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Tin (Sn) target for semiconductors

Tin (Sn) target for semiconductors

Tin (Sn) target purity ≧ 4N

In the semiconductor industry, there is a demand for finer and higher-quality wiring. To enhance the reliability of wiring, the purity and conductivity of materials are crucial. Inappropriate materials or manufacturing processes can lead to wire breakage or performance degradation. Our tin (Sn) target contributes to the high quality of semiconductor wiring due to its high purity and excellent conductivity. 【Application Scenarios】 - Wiring formation in semiconductor manufacturing - Production of ITO thin films 【Benefits of Implementation】 - Improved wiring reliability with high-purity materials - Enhanced performance due to excellent conductivity - Increased yield through uniform film formation

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Hafnium (Hf) target for nuclear control rods

Hafnium (Hf) target for nuclear control rods

Improving the reliability of nuclear control rods with high-purity Hf targets.

In the nuclear power industry, control rods are essential for the safe operation of reactors. The performance of control rods is directly linked to the adjustment of reactor output and safety, which requires high reliability in their constituent materials. Hafnium (Hf) is important as a material for control rods due to its excellent neutron absorption capability. Our high-purity Hf targets achieve high safety and efficiency in the manufacturing of control rods. [Application Scenarios] - Nuclear power plants - Research reactors [Effects of Implementation] - Contributes to the safe operation of reactors - Efficient control due to high neutron absorption capability - Ensures long-term reliability

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High Purity Hf Target for Electronic Components

High Purity Hf Target for Electronic Components

Dielectric films for electronic components. Improved reliability with high-purity Hf targets.

In the electronic components industry, the performance of dielectric films is a crucial factor that affects the reliability of products. Particularly, as miniaturization progresses, the uniformity of thin films, high purity, and absence of internal defects are required. Hf targets contribute to the improvement of electronic component performance by meeting these demands. 【Application Scenarios】 - Formation of dielectric films - Capacitors, memory devices - Thin-film transistors 【Effects of Implementation】 - Improved dielectric properties due to high purity - Stabilization of performance through uniform film thickness - Enhanced reliability by eliminating internal defects

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