Last Updated： Aggregation Period:Nov 12, 2025～Dec 09, 2025
This ranking is based on the number of page views on our site.
Last Updated： Aggregation Period:Nov 12, 2025～Dec 09, 2025
This ranking is based on the number of page views on our site.
Last Updated： Aggregation Period:Nov 12, 2025～Dec 09, 2025
This ranking is based on the number of page views on our site.
16～30 item / All 62 items
Niobium (Nb) target Purity≧3N5
■ Four sides C processing ■ Controllable surface roughness ■ Internal Grain Size can be customized according to customer requirements ■ Configurable Import License ■ Experience in supplying semiconductor companies *For more details, please download the PDF or feel free to contact us.
Tin (Sn) target Purity≧4N
■ High purity Purity≧99.99% (4N) High purity requirements for materials such as semiconductors and optical films ■ Good conductivity Tin (Sn) has excellent conductivity and is suitable for the production of transparent conductive films such as ITO thin films *For more details, please download the PDF or feel free to contact us.
Tantalum (Ta) Target Purity>5N
■Tantalum target materials are often used in PVD and CVD coating processes ■High temperature resistance and strong corrosion resistance ■High density Can be used for high-intensity sputtering, with high film deposition efficiency ■Good conductivity *For more details, please download the PDF or feel free to contact us.
Chromium (Cr) target Purity>3N8
■Purity: 2N5-3N8 Manufacturing method: HIP ■ High hardness ■ Strong abrasion resistance *For more details, please download the PDF or feel free to contact us.
Hafnium (Hf) target Purity>4N5
■High-purity Hf target Application in the semiconductor industry GDMS with purity measurement values Under the regulatory environment, strictly follow the laws of each country and apply for a license to export ■ Available for civilian use *For more details, please download the PDF or feel free to contact us.
Nickel (Ni) target Purity2N~4N5
■High Purity Using in the semiconductor industry. ■Density High density and uniformity ■Nickel alloys are also available NiCr, NiTi, NiCu, NiCuTi *For more details, please download the PDF or feel free to contact us.
Titanium Ti Target, Each type purity is possible
■Purity: Each type purity is possible ■Shape: Planner target Rotary target Any abnormal form target ■Titanium alloy target Thin film characteristics such as hardness and conductivity can be adjusted *For more details, please download the PDF or feel free to contact us.
Aluminum neodymium materials suitable for wiring of flat panel displays, magnetic recording media, and magnetic sensors.
■ Purity: 99.95% ■ Density (2.72 g/cm³) ■ Usable AlNd ratios (wt%): 90:10; 94:6; 98:2, etc. ■ Manufacturing method: Vacuum melting method *For more details, please download the PDF or feel free to contact us.*
Contributing to the manufacturing of integrated circuits (ICs) and the semiconductor and microelectronics industry! Nickel-vanadium materials capable of depositing high-quality thin films.
■ Purity: 99.5% ~ 99.9% ■ Density (8.4 g/cm³) ■ Manufacturing method: Vacuum melting method *For more details, please download the PDF or feel free to contact us.
Alloy materials that can be used for semiconductor integrated circuits (VLSI), flat panel displays, optical discs, surface coatings, etc.
■ Purity: 99.9% ■ Density (8.9 g/cm³) ■ Manufacturing method: Vacuum melting method *For more details, please download the PDF or feel free to contact us.
For the manufacturing of insulating films in chip production, as well as the production of other high-performance electronic components, sensors, solar panels, and surface modification of optical devices such as displays!
■ Purity > 99.9% ■ Density (3.95 g/cm³) ■ Manufacturing method: Powder metallurgy *For more details, please download the PDF or feel free to contact us.
Indium oxide materials suitable for use as electrode materials for voltage application in LCDs, organic ELs, plasma displays, and the like.
■Purity > 99.99% ■ Density (7.15/cm³) ■ Manufacturing method: Sintering method, HP method *For more details, please download the PDF or feel free to contact us.*
Used as an electrode, an important material that makes up the screen! As a transparent electrode, it enables touch operation on the screen, as well as for antistatic films and electromagnetic shielding films!
■ Purity > 99.99% ■ Density (7.15/cm³) ■ Manufacturing method: Sintering method, HP method * For more details, please download the PDF or feel free to contact us.
Titanium oxide used in semiconductor manufacturing processes, recording media such as HDDs, and thin film formation for flat panel displays!
■ Purity > 99.9% ■ Density (4.49 g/cm³) ■ Manufacturing Method: HIP *For more details, please download the PDF or feel free to contact us.*
Resistive change memory (RRAM), transparent conductive films (TCO), gas sensors, and nickel oxide materials usable in spintronics!
■ Purity > 99.99% ■ Density (6.67g/cm³) * For more details, please download the PDF or feel free to contact us.
