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target Product List and Ranking from 25 Manufacturers, Suppliers and Companies | IPROS GMS

Last Updated： Aggregation Period:Sep 09, 2026～Oct 06, 2026
This ranking is based on the number of page views on our site.

target Manufacturer, Suppliers and Company Rankings

Last Updated： Aggregation Period:Sep 09, 2026～Oct 06, 2026
This ranking is based on the number of page views on our site.

  1. SPUTTERCORE CO.,LTD. Osaka//Electronic Components and Semiconductors
  2. WAVES　 Osaka//Ferrous/Non-ferrous metals
  3. 蝶理 無機ファイン部 Osaka//Chemical
  4. エドモンド・オプティクス・ジャパン Tokyo//Optical Instruments
  5. 5 USTRON Tokyo//Chemical
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target Product ranking

Last Updated： Aggregation Period:Sep 09, 2026～Oct 06, 2026
This ranking is based on the number of page views on our site.

  1. Aluminum Neodymium (Al-Nd) Target SPUTTERCORE CO.,LTD.
  2. Tantalum (Ta) target for semiconductor thin films SPUTTERCORE CO.,LTD.
  3. Unbreakable! Non-abrasive! Low-cost 'Sputtering Target' USTRON
  4. Nickel (Ni) target for semiconductor thin films SPUTTERCORE CO.,LTD.
  5. 4 Thin film materials (targets and deposition materials) for next-generation communication devices. WAVES　

target Product List

31～60 item / All 119 items

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Iron (Fe) target Sputtering Target Vapor deposition material

Iron (Fe) target Sputtering Target Vapor deposition material

Sputtering target Fe; Thin film deposition; Fe target evaporation source; Fe electron beam evaporation Fe; Fe pellet (for evaporation) high purity; Fe target (99.9%, 99.999%)

■ Purity: 99.9% ~ 99.999% ■ Density (16.6 g/cm³) ■ Applications 　 Thin film formation; superconducting materials; heat and corrosion resistant applications *For more details, please download the PDF or feel free to contact us.

  • Steel
  • Other metal materials
  • target

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Laser detection target

Laser detection target

All products are sold individually as standard specifications. We offer quick delivery due to complete stock availability.

The laser detection target is an essential tool for visualizing and aligning invisible lasers. This product features superior performance not found in conventional detection targets and is a groundbreaking product designed with user safety in mind when using UV to IR lasers. By using this product, it becomes possible to improve issues that have been problematic with traditional detection targets in beam visualization, beam profiling, and alignment work. We offer three types based on sensitivity wavelength: UV type, VIS (visible light) type, and IR type. Each type is available in three styles: card type, thin plate type, and bench mount type. For the product lineup of standard specifications, their details, and sales prices, please refer to the relevant product page on the official website of Edmund Optics Japan (accessible from the product homepage linked above). *You can download the catalog featuring this product from the link below on the Edmund Optics Japan website.

  • Laser Components
  • target

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Test Target List

Test Target List

Short delivery time for stock sales! All items available for sale from one piece.

Edmund Optics offers a wide range of test targets suitable for many imaging systems. The test targets are designed for easy implementation within imaging systems for quick and simple setup. The test targets can be reused across many different systems, allowing a limited number of targets to be utilized for numerous imaging systems. The test targets are available in a variety of user-friendly substrate material options, such as glass, chrome, and photo paper. ■ For more details, please visit the official Edmund Optics website via the link below.

  • Other electronic parts
  • target

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Tungsten-Molybdenum Sputtering Target

Tungsten-Molybdenum Sputtering Target

World's highest quality tungsten-molybdenum sputtering target.

Through Planze's unique powder metallurgy, we optimize the purity, crystal structure, density, and shape of tungsten and molybdenum targets, accommodating various requests up to the bonding with cooling substrates. We provide extensive support from development to mass production.

  • LCD display
  • Touch Panel
  • Non-ferrous metals
  • target

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Particle Image Velocimetry (PIV) - Active Target

Particle Image Velocimetry (PIV) - Active Target

Stereo PIV, volume (Tomo) reduces human errors generated by planar and three-dimensional targets in PIV/PTV, enabling calibration in a short time.

Active Target reduces human errors that occur with traditional stereo PIV and volume (Tomo) PIV/PTV in planar or three-dimensional targets, allowing for calibration to be completed in a shorter time. The target is equipped with LEDs, which can be automatically flashed through software control, enabling quick calibration in the depth direction. By using a traverse device, extensive calibration can be performed, and by connecting multiple targets, calibration for large areas can also be accommodated.

  • Thermo-fluid analysis
  • Flow Meter
  • target

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Silicon side sputtering target

Silicon side sputtering target

This processing requires a significant amount of positioning. We maintain a guarantee of ±0.05.

Sputtering: Several pieces of tile-shaped silicon are joined together and used as side sputtering.

  • Sputtering Equipment
  • target

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Sputtering target

Sputtering target

We manufacture precious metal sputtering targets at our own factory. We can accommodate small lots.

- Direct sales from the manufacturer enable low-cost and short delivery time for products. - Capable of processing from small lots to mass-produced items, as well as special materials for experimental development. - Providing high-quality materials with high purity, uniform composition, high density, and low gas quality. - Thorough quality control and stable supply of products are ensured by ISO9001. - After-sales support including reuse of used materials, recovery and refining, and purchasing.

  • Non-ferrous metals
  • target

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Cylindrical target

Cylindrical target

We offer high-quality cylindrical targets, planar targets, and deposition materials for sputtering equipment at reasonable prices.

The following methods will be used to produce cylindrical targets. 1. Method: Integrated extrusion of melting materials Typical materials: Ti, Al, Cu Advantages: No risk of breaking, can rotate at low speeds Disadvantages: No high-purity products available 2. Method: Plasma spray Typical materials: Si, Ag, ZnAl, etc. Advantages: Relatively low risk of breaking, inexpensive Disadvantages: Difficult to achieve high-purity products above 5N, prone to defects, takes time to start up Note: Initial startup time can be shortened depending on the surface finishing method 3. Method: Cold spray Typical materials: Ag, etc. Advantages: Relatively low risk of breaking, can be sprayed directly onto used targets. Disadvantages: More expensive than plasma spray method. Takes time to start up. Note: Same as above 2 4. Method: Indium bonding of cast targets Typical materials: Special alloys, etc. Advantages: High-purity products are possible. Disadvantages: Risk of arcing from cuts. Can break or melt indium at low rotation speeds. Expensive. Low power input limit. 5. Method: Indium bonding of sintered targets Typical materials: ITO, AZO, etc. Advantages: High-purity products are possible. No restrictions on materials. Disadvantages: Same as above 4.

  • Vacuum Equipment
  • Touch Panel
  • Organic EL
  • target

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Zenith polymer standard diffuse reflection target

Zenith polymer standard diffuse reflection target

99% reflective standard reflector. Reflective characteristics that approximate a flat reflectance and ideal Lambertian reflection in the wavelength range of 250 to 2450 nm.

The Zenith Polymer standard diffuse reflective target manufactured by SphereOptics is made from the unique Zenith Polymer reflective material. It is durable against heat, humidity, and exposure to high-output light sources, has a nearly flat reflectance across the wavelength range of 250 to 2450 nm, and possesses reflective characteristics that approximate ideal Lambertian reflection, making it optimal as a standard reflector. These targets have a thickness of 10 mm and can be easily mounted on a frame for secure attachment. ■ Features - 99% diffuse reflectance - Nearly flat reflectance across the wavelength range of 250 to 2450 nm - Approximates ideal Lambertian reflection - Reflectance tolerance by batch ±3% - Laser damage threshold: 8 J/cm² @ pulse laser - Certified calibration using PTB and NIST traceable PerkinElmer Lambda 950 - Non-polar, insulating, hydrophobic - Chemically inert (except for reactions with organic lithium and sodium compounds) - Operating temperature range: -50 to 250 ℃ - Operating humidity range: 5 to 95%

  • Other optical parts
  • Optical Experimental Parts
  • Other laboratory equipment and containers
  • target

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Industrial Grade Diffuse Reflective Target RTI Series

Industrial Grade Diffuse Reflective Target RTI Series

A large standard reflector with a nearly flat reflectance in the wavelength range of 250 to 2450 nm and reflective characteristics approximating ideal Lambertian reflection.

The industrial-grade diffuse reflection target RTI series from SphereOptics is a large standard diffuse reflector made by attaching ZenithPolymer diffuse reflection sheets to an aluminum breadboard using a special adhesive. It has a nearly flat reflectance over a wide spectral range of 250 to 2450 nm and exhibits reflection characteristics that approximate ideal Lambertian reflection, making it optimal as a standard reflector. ■ Features - 14 types of diffuse reflectance from 2% to 95% - Nearly flat reflectance over the wavelength range of 250 to 2450 nm - Approximates ideal Lambertian reflection - Laser damage threshold: 8 J/cm² @ pulse laser - Non-polar, insulating, hydrophobic - Chemically inert (except reacts with organic lithium and sodium compounds) - Operating temperature range: -5 to 65 ℃ - Operating humidity range: 10 to 90%

  • Other optical parts
  • Optical Experimental Parts
  • Other laboratory equipment and containers
  • target

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Industrial alloy sputtering target, ingot

Industrial alloy sputtering target, ingot

60 years of establishment, reliable technology

Our company also manufactures industrial products made of alloys, such as sputtering targets for electronic devices, semiconductors, and other electronic components. We can accommodate detailed requests and accept small lot production for research and trial purposes. We can create square targets, chips, and other shapes according to your specifications. Please feel free to contact us.

  • alloy
  • target

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Thin film materials (targets and deposition materials) for next-generation communication devices.

Thin film materials (targets and deposition materials) for next-generation communication devices.

Unable to be satisfied with existing materials, we provide custom solutions tailored to those developing small quantities of diverse devices.

WAVES Corporation offers a wide range of sputtering targets and deposition materials for the semiconductor industry. We are the only partner company of VEM, which boasts over 30 years of experience in the U.S. thin film materials industry. VEM Company Website: https://www.vem-co.com <Product Examples> AlSc, Ni-based, Ti-based, Al-based <Features> - Purity from 99.9% to 99.9999% - Orders can be placed in small lots - Custom targets can be requested in specific shapes - Enhanced target compatibility available - High quality - Accompanied by analysis certificates and SDS

  • Non-ferrous metals
  • target

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Korean-made sputtering target (oxide-based ITO, IGZO)

Korean-made sputtering target (oxide-based ITO, IGZO)

Proven track record for transparent conductive electrodes used in LCDs, touch panels, etc. Please consider as a source for reducing dependence on China.

* Numerous hiring achievements with major liquid crystal panel manufacturers. * Dense ceramic coating materials using nanoparticles. * For optical devices. * ITO (Indium Tin Oxide, In2O3 + SnO2) and IGZO (Indium Gallium Zinc Oxide, In-Ga-Zn) target materials are available. * We can provide them in your preferred shapes, such as flat plates or cylindrical forms. * We can offer high purity and high density products. * There are fewer disruptive particles during deposition, resulting in fewer cracks. Please also visit our inorganic fine materials department's website.

  • LED Module
  • LCD display
  • Touch Panel
  • target

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Korean-made sputtering targets (AZO, ZnO, GZO types)

Korean-made sputtering targets (AZO, ZnO, GZO types)

Transparent conductive sputtering target with numerous adoption records in solar cells and displays. It has a high purity of over 99.99%.

* TCO (Transparent Conductive Oxide) target material * Dense ceramic coating material using nanoparticles * AZO (ZnO (Zinc Oxide) + Al2O3 (Aluminum Oxide)) system, ZnO (Zinc Oxide) system, GZO (ZnO (Zinc Oxide) + Ga2O3 (Gallium Oxide (III))) system are available. AZO and ZnO targets have a high density with a theoretical density of over 99.5%. GZO targets have a high density of over 99%. * Target surface resistance: 5 x 10^-3 Ω/Square * There are few scattered particles during deposition, which helps suppress crack formation. Please also visit our inorganic fine materials department website.

  • LCD display
  • Touch Panel
  • Other FPD related
  • target

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Rare metal-based sputtering target

Rare metal-based sputtering target

We deliver high-purity, high-quality sputtering targets for semiconductors and electronic components in the specified alloy materials and shapes with a short lead time.

The main materials are pure metals and various alloys of tantalum, zirconium, titanium, and niobium. We can accommodate both cylindrical and disc shapes. We will carefully consider the materials and dimensions specified by the customer and inform you of the feasibility of meeting your requirements.

  • Rare metals
  • target

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Copper (Cu) target

Copper (Cu) target

Copper (Cu) target Purity: 3 N7~6N Crystal 40-80 um C18200 C18150 Handling

■It is often shipped for semiconductor including touch panel ■Planner target Width 2000 mm, length mm Possible ■Rotary target OD176*ID125*3100ｍｍⅬ 　Highest shipment record of 400MT/Y ■We can also produce Backing plate *For more details, please download the PDF or feel free to contact us.

  • Other metal materials
  • target

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Zirconium (Zr) target

Zirconium (Zr) target

Zirconium (Zr) Target Purity>3N5 Hf<0.2wt% In Shipping...

■Export license: Zirconium (Zr) targets are restricted to export from China and are difficult to obtain, but We are always shipping from the application to the permission law. ■Main characteristics: Warp Zirconium (Zr) target is easy to warp and it is hard to fix the sled. ■Guarantee Including warp inspection GDMS 100% inspection of purity *For more details, please download the PDF or feel free to contact us.

  • Other metal materials
  • target

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Aluminum Silicon (Al-Si) Target [Alloy Target]

Aluminum Silicon (Al-Si) Target [Alloy Target]

In adjustment.

For more details, please download the PDF or feel free to contact us.

  • aluminum
  • Other metal materials
  • target

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Aluminum Titanium (Al-Ti) Target

Aluminum Titanium (Al-Ti) Target

Aluminum Titanium (Al-Ti) Target

■Al, Ti ratio tolerance:+/-0.3wt% ■Segment difference possible ■Surface finish<Ra1.6a ■No scars, no broken edges *For more details, please download the PDF or feel free to contact us.

  • aluminum
  • alloy
  • target

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Indium Antimonide (IAO) Target

Indium Antimonide (IAO) Target

IAO materials are widely used in anti-static coatings and paints, significantly reducing static electricity accumulation and protecting the safety of equipment and people.

■ Purity > 99.99% ■ Density (7.15/cm³) ■ Manufacturing Method: Sintering method, HP method *For more details, please download the PDF or feel free to contact us.

  • Ceramics
  • Fine Ceramics
  • target

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Tungsten Titanium (W-Ti) Target

Tungsten Titanium (W-Ti) Target

Tungsten-titanium materials that can be used as diffusion barriers and adhesives for metal wiring in microchip gate circuits.

■ Purity: 99.95% ■ Density (19.3 g/cm³) ■ Manufacturing Method: Powder metallurgy *For more details, please download the PDF or feel free to contact us.*

  • alloy
  • target

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Nickel-chromium (NiCr) target

Nickel-chromium (NiCr) target

Nickel-chromium that can be used for thin film formation, microelectronics manufacturing, Low-E films for architectural glass, liquid crystal panels, and recording media!

■ Purity: 99.5% - 99.95% ■ Density (8.4 g/cm³) ■ Manufacturing method: Vacuum melting method *For more details, please download the PDF or feel free to contact us.

  • alloy
  • target

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Niobium oxide (Nb2O5) target

Niobium oxide (Nb2O5) target

Niobium oxide (Nb2O5) target

For more details, please download the PDF or feel free to contact us.

  • Rare metals
  • Other metal materials
  • target

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Thin film materials (targets and deposition materials) for MEMs devices

Thin film materials (targets and deposition materials) for MEMs devices

Realizing custom support for those developing small quantities of diverse devices who are not satisfied with existing materials.

WAVES Corporation offers a wide range of sputtering targets and deposition materials for the semiconductor industry. We are the only partner company of VEM, which boasts over 30 years of experience in the U.S. thin film materials industry. VEM Company Website: https://www.vem-co.com <Product Examples> Pt-based, Au-based, Ti-based, Cr-based, Al-based <Features> - Purity from 99.9% to 99.9999% - Orders can be placed in small lots - Custom targets in specific shapes can be requested - Enhanced target options available - High quality - Includes analysis certificate and SDS

  • Non-ferrous metals
  • target

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[Research Material] Global Market for ITO Sputtering Target Materials

[Research Material] Global Market for ITO Sputtering Target Materials

World Market for ITO Sputtering Target Materials: Flat Targets, Rotating Targets, Flat Panel Displays, Solar Energy, Others

This research report (Global ITO Sputtering Target Material Market) investigates and analyzes the current state and outlook for the global market of ITO sputtering target materials over the next five years. It includes information on the overview of the global ITO sputtering target material market, trends of major companies (sales, selling prices, market share), market size by segment, market size by major regions, and distribution channel analysis. The market segments by type include flat targets and rotary targets, while the segments by application cover flat panel displays, solar energy, and others. The regional segments are divided into North America, the United States, Europe, Asia-Pacific, Japan, China, India, South Korea, Southeast Asia, South America, the Middle East, and Africa, to calculate the market size of ITO sputtering target materials. It also includes the market share of major companies in the ITO sputtering target materials sector, product and business overviews, and sales performance.

  • Other services
  • target

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High Purity Hafnium (Hf) Target for Semiconductors

High Purity Hafnium (Hf) Target for Semiconductors

For semiconductor thin film formation. High-quality thin films with high-purity Hf targets.

In the semiconductor industry, the quality of thin films is becoming increasingly important as devices become more high-performance. In particular, when forming thin films using Hf (hafnium) targets, the purity and uniformity of the target material significantly influence the properties of the thin films. Contamination by impurities and variations in crystal grain size can lead to a decrease in the reliability of the thin films. Our high-purity Hf targets support the formation of high-quality thin films. 【Application Scenarios】 - Thin film formation in semiconductor manufacturing - Production of Hf thin films through sputtering - Manufacturing of high-performance devices 【Benefits of Implementation】 - Achievement of high-quality thin films - Improvement in device performance - Enhancement of yield

  • Other metal materials
  • target

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Aerospace Hafnium (Hf) Target

Aerospace Hafnium (Hf) Target

High-purity Hf targets to improve heat resistance in the aerospace field.

In the aerospace industry, the durability of materials under high-temperature conditions is crucial. Particularly for rocket and aircraft engine components, heat resistance and stability are required. Hafnium (Hf) targets have been developed to meet these demands. 【Application Scenarios】 - Rocket nozzles - Aircraft engine components - Heat-resistant coatings 【Benefits of Introduction】 - Improved heat resistance - Stability of thin film deposition - Extended product lifespan

  • Other metal materials
  • target

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Medical-grade Hafnium (Hf) Target

Medical-grade Hafnium (Hf) Target

Support for improving the quality of contrast agents with high-purity Hf targets.

In the medical industry, the quality of contrast agents is directly linked to diagnostic accuracy and is a crucial factor that affects patient health. To maximize the performance of contrast agents, the selection of high-quality materials is essential. Our hafnium (Hf) targets achieve high purity and uniformity, contributing to quality improvement in the manufacturing process of contrast agents. [Application Scenarios] - Contrast agent manufacturing [Effects of Introduction] - Improvement in the quality of contrast agents - Enhancement of diagnostic accuracy

  • Other metal materials
  • target

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High Purity Hafnium (Hf) Target for Chemical Catalysts

High Purity Hafnium (Hf) Target for Chemical Catalysts

Supports the optimization of catalytic reactions with high-purity Hf targets.

In the chemical industry, the purity and uniformity of catalyst materials are crucial for enhancing reaction efficiency. In particular, high-purity Hf targets have the potential to improve the selectivity and activity of catalytic reactions. Our high-purity Hf targets achieve stability and reproducibility in catalytic reactions due to their high purity and uniformity. 【Application Scenarios】 - Research and development of catalyst materials - Manufacturing of high-performance catalysts - Optimization of chemical reaction processes 【Benefits of Implementation】 - Improved catalyst performance - Enhanced reaction efficiency - Stabilization of product quality

  • Other metal materials
  • target

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Hafnium (Hf) target for display applications

Hafnium (Hf) target for display applications

Contributing to the improvement of display quality with high-purity Hf targets.

In the display industry, thin film formation technology significantly influences product performance. In particular, high-quality thin film formation using sputtering technology requires high-purity Hf targets. The purity and uniformity of Hf targets greatly impact the display's visual performance and durability. Our products provide high-purity Hf targets, contributing to the quality enhancement of our customers' display products. 【Usage Scenarios】 - Sputtering process in display manufacturing - Thin Film Transistor (TFT) manufacturing - Touch panel manufacturing 【Effects of Implementation】 - Improved display performance through high-quality thin film formation - Enhanced product durability - Improved yield

  • Other metal materials
  • target

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