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target Product List and Ranking from 25 Manufacturers, Suppliers and Companies | IPROS GMS

Last Updated： Aggregation Period:Feb 18, 2026～Mar 17, 2026
This ranking is based on the number of page views on our site.

target Manufacturer, Suppliers and Company Rankings

Last Updated： Aggregation Period:Feb 18, 2026～Mar 17, 2026
This ranking is based on the number of page views on our site.

  1. SPUTTERCORE CO.,LTD. Osaka//Electronic Components and Semiconductors
  2. 蝶理 無機ファイン部 Osaka//Chemical
  3. エドモンド・オプティクス・ジャパン Tokyo//Optical Instruments
  4. 4 ウエキコーポレーション Tokyo//Chemical
  5. 5 MSHシステムズ Tokyo//Optical Instruments
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target Product ranking

Last Updated： Aggregation Period:Feb 18, 2026～Mar 17, 2026
This ranking is based on the number of page views on our site.

  1. Aluminum Silicon (Al-Si) Target [Alloy Target] SPUTTERCORE CO.,LTD.
  2. Tin oxide (SnO) target SPUTTERCORE CO.,LTD.
  3. High purity sputtering target, manufactured by PRAXAIR. ウエキコーポレーション
  4. Nickel-Vanadium (NiV) Target SPUTTERCORE CO.,LTD.
  5. 4 Korean-made sputtering target (oxide-based ITO, IGZO) 蝶理 無機ファイン部

target Product List

91～116 item / All 116 items

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Hafnium (Hf) target for the energy sector

Hafnium (Hf) target for the energy sector

Support for improving energy efficiency in fuel cells and other applications with high-purity Hf targets.

In the energy sector, particularly in areas such as fuel cells, high-quality materials are required to enhance performance and durability. Hafnium (Hf) targets hold the potential to meet these demands. High-purity Hf targets ensure stability and consistency in thin film deposition, contributing to improved performance of fuel cells. 【Application Scenarios】 - Fuel cells - Energy storage devices 【Benefits of Implementation】 - Improved energy efficiency - Increased device longevity

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【For Research Institutions】 Hafnium (Hf) Target

【For Research Institutions】 Hafnium (Hf) Target

Improve the reliability of experiments with high-purity Hf targets.

In experiments conducted at research institutions, the purity and uniformity of materials significantly impact the results. Particularly in thin film formation experiments, the quality of the target material is crucial, as contamination by impurities or lack of uniformity can compromise the reproducibility of the experiments. Our hafnium (Hf) target achieves high purity and uniformity, contributing to the reliability of experiments. 【Application Scenes】 - Thin film formation experiments - Material property evaluation experiments - Sputtering experiments 【Effects of Introduction】 - Improved reliability of experimental data - Enhanced reproducibility of experiments - Formation of high-quality thin films

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  • target

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Tungsten (W) target for semiconductors

Tungsten (W) target for semiconductors

Improving sputtering efficiency with high-purity tungsten (W) targets.

In the semiconductor industry, sputtering is essential for the formation of high-quality thin films. Particularly as integration increases, the purity and uniformity of the target material become critical factors that influence device performance. Contamination by impurities and variations in film thickness can lead to reduced product yield and reliability issues. Our tungsten (W) targets achieve high purity (≧5N) and improve sputtering efficiency, addressing these challenges. 【Usage Scenarios】 - Thin film formation in semiconductor manufacturing - Manufacturing of high-density devices - Formation of metal films through sputtering 【Benefits of Implementation】 - Improved device performance through high-quality thin film formation - Enhanced yield - Realization of reliable products

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  • target

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Tungsten (W) target for medical devices

Tungsten (W) target for medical devices

Improve the performance of X-ray systems with high-purity tungsten (W) targets.

In the medical device industry, particularly in X-ray systems, high-precision imaging diagnostics are required. The quality of the target material, which serves as the X-ray source, is crucial as it directly affects the clarity of the images and the accuracy of the diagnosis. Contamination by impurities or a lack of uniformity in the target material can degrade the quality of the X-rays and compromise diagnostic accuracy. Our tungsten (W) targets contribute to the performance enhancement of X-ray systems by providing high purity and uniform quality. 【Usage Scenarios】 - X-ray diagnostic equipment - CT scans - Dental X-ray equipment - Industrial X-ray inspection equipment 【Benefits of Implementation】 - Achievement of high-quality X-ray images - Improvement in diagnostic accuracy - Increased longevity of equipment

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Tungsten (W) target for automobiles

Tungsten (W) target for automobiles

Tungsten (W) target purity ≧ 5N

In the automotive industry, electrode applications require high durability and reliability. Electrodes must withstand high-temperature environments and heavy loads, and their performance directly affects product quality. Inappropriate electrode materials can lead to performance degradation and failures, potentially shortening the product's lifespan. Our tungsten (W) targets are manufactured with high purity, making them ideal materials for electrode applications. 【Usage Scenarios】 - Electrode manufacturing through sputtering - Electrode components requiring high durability and high reliability 【Benefits of Implementation】 - Improved durability of electrodes - Enhanced product quality - Long-term cost reduction

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Optical Tungsten (W) Target

Optical Tungsten (W) Target

Tungsten (W) target purity ≧ 5N

In the optical industry, the quality of reflective materials is a crucial factor that influences optical performance. Particularly in high-precision optical devices and laser systems, uniformity, high purity, and durability of the reflective surface are required. Inappropriate reflective materials can cause light scattering and absorption, potentially leading to a decline in system performance. Our tungsten (W) targets address these challenges and contribute to the enhancement of optical performance. 【Use Cases】 - High-precision optical devices - Laser systems - Reflective mirrors - Optical coatings 【Benefits of Implementation】 - High reflectivity due to high-purity tungsten - Achievement of uniform film thickness and surface roughness - Increased durability leading to longer lifespan - Improvement in optical performance

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Tungsten (W) target for metal processing

Tungsten (W) target for metal processing

High-purity tungsten (W) targets that contribute to the efficiency of metal processing.

In the metalworking industry, the durability and precision of tools are crucial factors that influence production efficiency and product quality. Especially for tools exposed to high temperatures and heavy loads, wear resistance and heat resistance of materials are essential. Improper material selection can lead to premature wear or damage of tools, potentially resulting in decreased productivity. Our tungsten (W) targets are of high purity and possess excellent properties, allowing them to perform exceptionally well in tool manufacturing. 【Application Scenarios】 - Tools requiring wear resistance - Tools requiring heat resistance - Tools requiring high precision machining 【Benefits of Implementation】 - Extended tool lifespan - Improved machining accuracy - Enhanced production efficiency

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Tungsten (W) Target for Clock Decoration

Tungsten (W) Target for Clock Decoration

For clock decoration. High purity tungsten (W) target.

In the watch industry, both aesthetics and durability are required for decorative applications. Especially in high-end watches, the texture and shine of the materials greatly influence the product's value. If the quality of the decorative parts is low, it can compromise the overall image of the product. Our tungsten (W) target achieves high-quality sputtering deposition and provides the ideal material for watch decoration. 【Usage Scenarios】 - Watch dials - Bezels - Cases - Decorative components 【Benefits of Implementation】 - Achieving a beautiful appearance - High durability - High-quality finish due to uniform deposition - Adaptability to diverse designs

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Tungsten (W) Target for High-End Watches

Tungsten (W) Target for High-End Watches

For watch decoration. High-purity tungsten (W) target with excellent wear resistance.

In the luxury watch industry, the aesthetic appeal of products and the maintenance of long-term quality are crucial. In particular, the durability of materials significantly affects the value of products in areas that are prone to wear from everyday use, such as the watch bezel and case. Using materials that are susceptible to wear can lead to deterioration in appearance and a decline in functionality. Our tungsten (W) target achieves high wear resistance and provides an ideal material for the decoration of luxury watches. 【Application Scenarios】 - Watch dials - Bezels - Cases - Decorative components 【Benefits of Implementation】 - Maintenance of long-term aesthetics due to high wear resistance - High-quality finish achieved through uniform film formation - Compatibility with diverse designs

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Tungsten (W) target for jewelry.

Tungsten (W) target for jewelry.

Pursuing the beauty of jewelry. High purity tungsten (W) target.

In the jewelry industry, the aesthetics and durability of products are crucial factors that influence customer satisfaction. Particularly in high-end jewelry, where dense decoration is required, the texture and brilliance of the materials determine the product's value. If the quality of the decorative elements is low, it can undermine the overall image of the product. Our tungsten (W) target achieves high-quality sputtering deposition, providing the ideal material for jewelry decoration. 【Usage Scenarios】 - Watch dials - Bezels - Cases - Decorative components 【Benefits of Implementation】 - Achieving a beautiful appearance - High durability - High-quality finish through uniform deposition - Compatibility with diverse designs

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Aerospace Tungsten (W) Target

Aerospace Tungsten (W) Target

High-purity tungsten (W) targets for aerospace heat-resistant components.

In the aerospace industry, the reliability of components in high-temperature environments is extremely important. Particularly for rocket and aircraft engine parts, heat resistance and durability significantly affect product performance. Low-quality materials can lead to early degradation or malfunction of components. Our tungsten (W) targets enable high-quality sputtering deposition, providing the ideal material for aerospace components that require heat resistance. 【Application Scenarios】 - Rocket engine parts - Aircraft engine parts - Heat-resistant coatings 【Benefits of Implementation】 - Achieving high heat resistance - Excellent durability - High-quality finish through uniform film deposition - Adaptability to diverse designs

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Tantalum (Ta) target for semiconductor thin films

Tantalum (Ta) target for semiconductor thin films

High purity tantalum (Ta) target to improve the quality and efficiency of thin film formation.

In the semiconductor industry, thin films are a crucial factor that influences device performance. Particularly as miniaturization progresses, the uniformity, adhesion, heat resistance, and corrosion resistance of thin films are required. Improper thin film formation can lead to decreased device performance and worsened yield. Our tantalum (Ta) targets enable the formation of high-quality thin films and contribute to the reliability enhancement of semiconductor devices. 【Application Scenarios】 - Thin film formation in PVD/CVD processes - Wiring formation for semiconductor devices - Manufacturing of high-density recording media 【Effects of Implementation】 - Improved thin film uniformity - Enhanced device performance - Improved yield

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Tantalum (Ta) target for implants

Tantalum (Ta) target for implants

Tantalum (Ta) target purity ≧ 5N

In the implant industry, materials with high biocompatibility and durability are required. In particular, stability within the body over a long period and compatibility with bone are important. Inappropriate materials can lead to rejection reactions and early deterioration of the implant. Tantalum (Ta) targets are excellent in biocompatibility and suitable as implant materials. 【Usage Scenarios】 - Coating for implant surfaces - Bone bonding materials - Medical devices 【Effects of Introduction】 - Improved biocompatibility - Enhanced durability - Assurance of long-term stability

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Tantalum (Ta) target for electronic devices

Tantalum (Ta) target for electronic devices

Improving the performance of capacitors with tantalum (Ta) targets.

In the electronics industry, capacitors play a crucial role in achieving both miniaturization and high performance of products. Particularly for capacitors that require high reliability and long lifespan, the selection of high-quality materials is essential. Tantalum (Ta) targets have been developed to meet these needs. 【Application Scenarios】 - Capacitor manufacturing - Electronic device manufacturing 【Benefits of Implementation】 - Improved capacitor performance - Enhanced product reliability - Increased thin film deposition efficiency

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Tantalum (Ta) Target for the Chemical Industry

Tantalum (Ta) Target for the Chemical Industry

Tantalum (Ta) target purity ≧ 5N

In the chemical industry, there is a demand for the protection of components used in highly corrosive environments and for improving the corrosion resistance of reaction vessels. Particularly in environments exposed to strong acids or strong alkalis, material corrosion can lead to product quality deterioration and safety issues. Tantalum (Ta) targets contribute to solving these challenges due to their excellent corrosion resistance. 【Application Scenarios】 - Protection of components in corrosive environments - Improvement of corrosion resistance in reaction vessels - Piping materials in chemical plants 【Benefits of Implementation】 - Increased product lifespan - Enhanced safety - Cost reduction

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Tantalum (Ta) target for the energy sector

Tantalum (Ta) target for the energy sector

Tantalum (Ta) target purity ≧ 5N

In the energy sector, especially in applications under high-temperature environments, the heat resistance and corrosion resistance of materials are extremely important. If the materials cannot withstand high temperatures, it may lead to decreased energy efficiency or, in the worst case, system failure. Tantalum (Ta) targets possess high heat resistance and excellent corrosion resistance, making them ideal for use in high-temperature environments in the energy sector. 【Application Scenarios】 - Thin film formation in high-temperature environments - Manufacturing of components requiring heat and corrosion resistance - Production of devices requiring high energy efficiency 【Benefits of Implementation】 - Stable performance maintenance in high-temperature environments - Increased system longevity - Improved energy efficiency

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Tungsten (W) target for clock parts

Tungsten (W) target for clock parts

For the decoration of watches. High-purity tungsten (W) target.

In the watch component industry, a balance between aesthetics and durability is required. Especially in high-end watches, the texture and shine of the materials greatly influence the product's value. If the quality of the decorative parts is low, it can undermine the overall image of the product. Our tungsten (W) target achieves high-quality sputtering deposition and provides the ideal material for watch decoration. 【Usage Scenarios】 - Watch dials - Bezels - Cases - Decorative parts 【Benefits of Implementation】 - Achieving a beautiful appearance - High durability - High-quality finish through uniform film deposition - Compatibility with diverse designs

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[Tantalum (Ta) Target for Research Institutions]

[Tantalum (Ta) Target for Research Institutions]

Tantalum (Ta) target purity ≧ 5N

In experiments conducted at research institutions, high-quality materials are essential to obtain reliable results. Particularly in thin film formation experiments, the quality of the target material significantly influences the experimental outcomes. Tantalum (Ta) targets possess high heat resistance, excellent corrosion resistance, and good conductivity, contributing to the efficiency and accuracy of experiments. Our tantalum (Ta) targets strongly support research and development through high-quality materials and advanced manufacturing techniques. 【Application Scenarios】 - Thin film formation experiments using PVD/CVD processes - High-energy sputtering experiments - Research and development of semiconductor devices - Research on corrosion-resistant materials 【Effects of Implementation】 - Formation of high-quality thin films - Improved reliability of experimental results - Increased experimental efficiency - Acceleration of research and development

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Tantalum (Ta) target for clock decoration

Tantalum (Ta) target for clock decoration

With tantalum (Ta) as the target, beauty and durability in watch decoration.

In the watch industry, both aesthetics and durability are required for decorative applications. It is particularly important to be resistant to scratches and to maintain a beautiful appearance over a long period. Tantalum (Ta) targets meet these challenges due to their high heat resistance, excellent corrosion resistance, and high density. By using sputtering technology, a beautiful metallic film can be formed on watch dials and bezels, enhancing design quality. 【Usage Scenarios】 - Formation of metallic films on watch dials - Decoration of bezels - Surface treatment of watch components 【Effects of Implementation】 - Achieving a beautiful appearance - High wear resistance - Increased product value

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Zirconium (Zr) target for semiconductor thin films

Zirconium (Zr) target for semiconductor thin films

High-quality zirconium (Zr) targets support the improvement of semiconductor thin film quality.

In the semiconductor industry, thin film formation is a crucial process that significantly affects device performance. Zirconium (Zr) targets require high purity and uniform film quality. In particular, the adhesion and corrosion resistance of the thin films greatly influence product reliability, making the selection of high-quality target materials essential. Our zirconium (Zr) targets address these challenges through high purity and stringent quality control. 【Application Scenarios】 - Thin film formation through sputtering - Semiconductor device manufacturing - Research and development requiring high-quality thin films 【Benefits of Implementation】 - Improved device performance through high-quality thin film formation - Increased yield - Provision of reliable products

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Zirconium (Zr) target for implants

Zirconium (Zr) target for implants

Zirconium (Zr) targets that contribute to the improvement of implant quality.

In the implant industry, materials with high biocompatibility and durability are required. Zirconium (Zr) is one of the promising materials that meet these demands. However, zirconium (Zr) used for implants must have high purity and uniform quality. Our zirconium (Zr) targets support the manufacturing of high-quality implants. 【Application Scenarios】 - Coating for implant surfaces - Biocompatible coatings - Durability enhancement 【Effects of Implementation】 - Improvement in implant quality - Assurance of long-term stability - Enhancement of patient quality of life (QOL)

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Aerospace Zirconium (Zr) Target

Aerospace Zirconium (Zr) Target

Providing high-purity zirconium targets for the aerospace field pursuing heat resistance.

In the aerospace industry, the durability of components under high-temperature conditions is crucial. Particularly for jet engines and rocket parts, materials with excellent heat resistance and oxidation resistance are required. Zirconium (Zr) targets serve as sputtering materials that meet these demands, enabling the realization of high-quality thin films. Our zirconium (Zr) targets have a purity of ≧3N5 and Hf ≦0.2wt%, supporting the development of reliable products for aerospace applications. 【Application Scenarios】 - Jet engine components - Rocket nozzles - Heat-resistant coatings 【Benefits of Implementation】 - Increased longevity of components in high-temperature environments - Improved oxidation resistance - Enhanced product reliability

  • Other metal materials
  • target

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Zirconium (Zr) target for chemical reactions

Zirconium (Zr) target for chemical reactions

Shipping zirconium (Zr) targets with purity ≧ 3N5 and Hf ≦ 0.2wt%.

In the field of chemical reactions, high-quality materials influence the efficiency and reproducibility of reactions. In particular, zirconium (Zr) plays an important role due to its corrosion resistance and suitability for specific reactions. However, the stable supply of high-quality Zr targets can be challenging due to limitations in sourcing and variations in quality. Our zirconium (Zr) targets address these challenges through high purity and strict quality control, supporting stable reaction processes. 【Application Scenarios】 - Research and development of chemical reaction processes - Special chemical synthesis - Material testing in corrosive environments 【Benefits of Implementation】 - Improved reaction efficiency - Enhanced reproducibility of experimental results - Reliable experiments with high-quality materials

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Zirconium (Zr) target for optical coatings

Zirconium (Zr) target for optical coatings

High-quality zirconium (Zr) target to enhance the performance of optical coatings.

In the optical coating industry, high-quality thin film formation is required. Particularly for optical components such as lenses and filters, the uniformity and adhesion of the film thickness significantly impact product performance. Zirconium (Zr) targets are used in optical coatings due to their properties such as corrosion resistance and high refractive index. Our zirconium (Zr) targets enable high-quality thin film formation and contribute to the performance enhancement of our customers' products. 【Application Scenarios】 - Coating of optical lenses - Coating of optical filters - Production of anti-reflective films 【Effects of Implementation】 - Improvement in product performance due to high-quality thin film formation - Enhanced uniformity of film thickness - Improved adhesion

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  • target

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Zirconium (Zr) target for research purposes

Zirconium (Zr) target for research purposes

Shipping zirconium (Zr) targets with purity ≧ 3N5 and Hf ≦ 0.2 wt%.

In the research and analysis industry, obtaining accurate analytical results using high-quality materials is essential. Particularly in trace element analysis and material property evaluation, the purity and uniformity of the target material are crucial for acquiring reliable data. The use of inappropriate target materials can lead to errors in analytical results and incorrect interpretations. Our zirconium (Zr) target is of high purity, has obtained export approval, and can be supplied stably. 【Application Scenarios】 - Trace element analysis - Material property evaluation - Thin film production by sputtering 【Benefits of Implementation】 - Improved analytical accuracy through the use of high-purity target materials - Smooth execution of research plans due to a stable supply system - Enhanced research outcomes through the production of high-quality thin films

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Zirconium (Zr) target for watch decoration

Zirconium (Zr) target for watch decoration

High-quality zirconium (Zr) target to enhance the decorative quality of watches.

In the watch industry, decoration is a significant factor that greatly influences the value of a product. Particularly in high-end watches and those with high design quality, the quality of the materials used for decoration becomes crucial. Zirconium (Zr) targets contribute to achieving both aesthetics and durability required for watch decoration due to their properties. Our zirconium (Zr) targets help solve challenges in watch decoration through high-quality materials and manufacturing techniques. 【Application Scenarios】 - Watch dials - Watch bezels - Watch cases 【Effects of Implementation】 - Realization of a beautiful appearance - Provision of high durability - Enhancement of product added value

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  • target

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