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target Product List and Ranking from 26 Manufacturers, Suppliers and Companies

Last Updated： Aggregation Period:Dec 24, 2025～Jan 20, 2026
This ranking is based on the number of page views on our site.

target Manufacturer, Suppliers and Company Rankings

Last Updated： Aggregation Period:Dec 24, 2025～Jan 20, 2026
This ranking is based on the number of page views on our site.

  1. SPUTTERCORE CO.,LTD. Osaka//Electronic Components and Semiconductors
  2. エドモンド・オプティクス・ジャパン Tokyo//Optical Instruments
  3. ウエキコーポレーション Tokyo//Chemical
  4. 井嶋金銀工業 Tokyo//Manufacturing and processing contract
  5. 5 MSHシステムズ Tokyo//Optical Instruments
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target Product ranking

Last Updated： Aggregation Period:Dec 24, 2025～Jan 20, 2026
This ranking is based on the number of page views on our site.

  1. Hafnium (Hf) target SPUTTERCORE CO.,LTD.
  2. Niobium oxide (Nb2O5) target SPUTTERCORE CO.,LTD.
  3. High purity sputtering target, manufactured by PRAXAIR. ウエキコーポレーション
  4. Aluminum Silicon (Al-Si) Target [Alloy Target] SPUTTERCORE CO.,LTD.
  5. 4 Sputtering target 井嶋金銀工業

target Product List

46～60 item / All 118 items

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Rare metal-based sputtering target

Rare metal-based sputtering target

We deliver high-purity, high-quality sputtering targets for semiconductors and electronic components in the specified alloy materials and shapes with a short lead time.

The main materials are pure metals and various alloys of tantalum, zirconium, titanium, and niobium. We can accommodate both cylindrical and disc shapes. We will carefully consider the materials and dimensions specified by the customer and inform you of the feasibility of meeting your requirements.

  • Rare metals

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Copper (Cu) target

Copper (Cu) target

Copper (Cu) target Purity: 3 N7~6N Crystal 40-80 um C18200 C18150 Handling

■It is often shipped for semiconductor including touch panel ■Planner target Width 2000 mm, length mm Possible ■Rotary target OD176*ID125*3100ｍｍⅬ 　Highest shipment record of 400MT/Y ■We can also produce Backing plate *For more details, please download the PDF or feel free to contact us.

  • Other metal materials

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Zirconium (Zr) target

Zirconium (Zr) target

Zirconium (Zr) Target Purity>3N5 Hf<0.2wt% In Shipping...

■Export license: Zirconium (Zr) targets are restricted to export from China and are difficult to obtain, but We are always shipping from the application to the permission law. ■Main characteristics: Warp Zirconium (Zr) target is easy to warp and it is hard to fix the sled. ■Guarantee Including warp inspection GDMS 100% inspection of purity *For more details, please download the PDF or feel free to contact us.

  • Other metal materials

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Aluminum Titanium (Al-Ti) Target

Aluminum Titanium (Al-Ti) Target

Aluminum Titanium (Al-Ti) Target

■Al, Ti ratio tolerance:+/-0.3wt% ■Segment difference possible ■Surface finish<Ra1.6a ■No scars, no broken edges *For more details, please download the PDF or feel free to contact us.

  • aluminum
  • alloy

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Indium Antimonide (IAO) Target

Indium Antimonide (IAO) Target

IAO materials are widely used in anti-static coatings and paints, significantly reducing static electricity accumulation and protecting the safety of equipment and people.

■ Purity > 99.99% ■ Density (7.15/cm³) ■ Manufacturing Method: Sintering method, HP method *For more details, please download the PDF or feel free to contact us.

  • Ceramics
  • Fine Ceramics

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Tungsten Titanium (W-Ti) Target

Tungsten Titanium (W-Ti) Target

Tungsten-titanium materials that can be used as diffusion barriers and adhesives for metal wiring in microchip gate circuits.

■ Purity: 99.95% ■ Density (19.3 g/cm³) ■ Manufacturing Method: Powder metallurgy *For more details, please download the PDF or feel free to contact us.*

  • alloy

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Nickel-chromium (NiCr) target

Nickel-chromium (NiCr) target

Nickel-chromium that can be used for thin film formation, microelectronics manufacturing, Low-E films for architectural glass, liquid crystal panels, and recording media!

■ Purity: 99.5% - 99.95% ■ Density (8.4 g/cm³) ■ Manufacturing method: Vacuum melting method *For more details, please download the PDF or feel free to contact us.

  • alloy

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Thin film materials (targets and deposition materials) for MEMs devices

Thin film materials (targets and deposition materials) for MEMs devices

Realizing custom support for those developing small quantities of diverse devices who are not satisfied with existing materials.

WAVES Corporation offers a wide range of sputtering targets and deposition materials for the semiconductor industry. We are the only partner company of VEM, which boasts over 30 years of experience in the U.S. thin film materials industry. VEM Company Website: https://www.vem-co.com <Product Examples> Pt-based, Au-based, Ti-based, Cr-based, Al-based <Features> - Purity from 99.9% to 99.9999% - Orders can be placed in small lots - Custom targets in specific shapes can be requested - Enhanced target options available - High quality - Includes analysis certificate and SDS

  • Non-ferrous metals

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[Research Material] Global Market for High-Purity Metal Sputtering Targets

[Research Material] Global Market for High-Purity Metal Sputtering Targets

World Market for High Purity Metal Sputtering Targets: Metal Targets, Alloy Targets, Semiconductors, Solar Energy, Flat Panel Displays ...

This research report (Global High Purity Metal Sputtering Target Market) investigates and analyzes the current status and outlook for the global market of high purity metal sputtering targets over the next five years. It includes information on the overview of the global high purity metal sputtering target market, trends of major companies (sales, selling prices, market share), market size by segment, market size by major regions, and distribution channel analysis. The market segments by type include metal targets and alloy targets, while the segments by application cover semiconductors, solar energy, flat panel displays, and others. The regional segments are categorized into North America, the United States, Europe, Asia-Pacific, Japan, China, India, South Korea, Southeast Asia, South America, the Middle East, and Africa, to calculate the market size of high purity metal sputtering targets. It also includes the market share of major companies in the high purity metal sputtering target market, product and business overviews, and sales performance.

  • Other services

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High Purity Hafnium (Hf) Target for Semiconductors

High Purity Hafnium (Hf) Target for Semiconductors

For semiconductor thin film formation. High-quality thin films with high-purity Hf targets.

In the semiconductor industry, the quality of thin films is becoming increasingly important as devices become more high-performance. In particular, when forming thin films using Hf (hafnium) targets, the purity and uniformity of the target material significantly influence the properties of the thin films. Contamination by impurities and variations in crystal grain size can lead to a decrease in the reliability of the thin films. Our high-purity Hf targets support the formation of high-quality thin films. 【Application Scenarios】 - Thin film formation in semiconductor manufacturing - Production of Hf thin films through sputtering - Manufacturing of high-performance devices 【Benefits of Implementation】 - Achievement of high-quality thin films - Improvement in device performance - Enhancement of yield

  • Other metal materials

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Aerospace Hafnium (Hf) Target

Aerospace Hafnium (Hf) Target

High-purity Hf targets to improve heat resistance in the aerospace field.

In the aerospace industry, the durability of materials under high-temperature conditions is crucial. Particularly for rocket and aircraft engine components, heat resistance and stability are required. Hafnium (Hf) targets have been developed to meet these demands. 【Application Scenarios】 - Rocket nozzles - Aircraft engine components - Heat-resistant coatings 【Benefits of Introduction】 - Improved heat resistance - Stability of thin film deposition - Extended product lifespan

  • Other metal materials

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Medical-grade Hafnium (Hf) Target

Medical-grade Hafnium (Hf) Target

Support for improving the quality of contrast agents with high-purity Hf targets.

In the medical industry, the quality of contrast agents is directly linked to diagnostic accuracy and is a crucial factor that affects patient health. To maximize the performance of contrast agents, the selection of high-quality materials is essential. Our hafnium (Hf) targets achieve high purity and uniformity, contributing to quality improvement in the manufacturing process of contrast agents. [Application Scenarios] - Contrast agent manufacturing [Effects of Introduction] - Improvement in the quality of contrast agents - Enhancement of diagnostic accuracy

  • Other metal materials

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High Purity Hafnium (Hf) Target for Chemical Catalysts

High Purity Hafnium (Hf) Target for Chemical Catalysts

Supports the optimization of catalytic reactions with high-purity Hf targets.

In the chemical industry, the purity and uniformity of catalyst materials are crucial for enhancing reaction efficiency. In particular, high-purity Hf targets have the potential to improve the selectivity and activity of catalytic reactions. Our high-purity Hf targets achieve stability and reproducibility in catalytic reactions due to their high purity and uniformity. 【Application Scenarios】 - Research and development of catalyst materials - Manufacturing of high-performance catalysts - Optimization of chemical reaction processes 【Benefits of Implementation】 - Improved catalyst performance - Enhanced reaction efficiency - Stabilization of product quality

  • Other metal materials

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