Ultra-dense thick film of yttrium oxide using a unique ion-assisted deposition method.
Significantly improved semiconductor yield and equipment operating time with ultra-dense thick film formation using ion assist deposition method! Ideal for protective films and regeneration of dry etching equipment components!
We would like to introduce Tsubasa Vacuum Research Co., Ltd.'s "High Corrosion-Resistant Y2O3 (Yttrium Oxide) Film." Using our unique ion-assisted deposition method, we can achieve a highly adhesive and dense thick film of 15μm on alumina substrates and 10μm on quartz glass. The application is a protective film for dry etcher components that is resistant to plasma. If you are looking for a good film for dry etcher component deposition, please feel free to consult with us. 【Features】 ■ Achieves half the market price of the regeneration of RF windows for etching equipment ■ Significantly improves the maintenance cycle of etching equipment ■ Superior plasma resistance and corrosion resistance compared to films formed by thermal spraying, aerosol deposition, and ion plating *For more details, please refer to the PDF materials or feel free to contact us.
- Company：つばさ真空理研 横浜ラボラトリー
- Price：Other
