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  6. Ultra-dense thick film of yttrium oxide using a unique ion-assisted deposition method.

Ultra-dense thick film of yttrium oxide using a unique ion-assisted deposition method.

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last updated:Jan 11, 2022

つばさ真空理研 横浜ラボラトリー
つばさ真空理研 横浜ラボラトリー
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Significantly improved semiconductor yield and equipment operating time with ultra-dense thick film formation using ion assist deposition method! Ideal for protective films and regeneration of dry etching equipment components!

We would like to introduce Tsubasa Vacuum Research Co., Ltd.'s "High Corrosion-Resistant Y2O3 (Yttrium Oxide) Film." Using our unique ion-assisted deposition method, we can achieve a highly adhesive and dense thick film of 15μm on alumina substrates and 10μm on quartz glass. The application is a protective film for dry etcher components that is resistant to plasma. If you are looking for a good film for dry etcher component deposition, please feel free to consult with us. 【Features】 ■ Achieves half the market price of the regeneration of RF windows for etching equipment ■ Significantly improves the maintenance cycle of etching equipment ■ Superior plasma resistance and corrosion resistance compared to films formed by thermal spraying, aerosol deposition, and ion plating *For more details, please refer to the PDF materials or feel free to contact us.

    Etching EquipmentProcessing ContractSurface treatment contract service
Y2O3成膜.jpg

Ultra-dense thick film of yttrium oxide using a unique ion-assisted deposition method.

Y2O3成膜.jpg
Y2O3成膜.jpg
  • Related Link - https://www.tsubasa-sci.com

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【Other Features】 ■ Film formation possible on quartz, alumina, and metallic aluminum ■ Achieves heat resistance of 500°C on quartz glass ■ Improved yield + significant reduction in equipment maintenance cycles *For more details, please refer to the PDF document or feel free to contact us.

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【Examples】 ■ Protective film for internal components of etching equipment ■ Protective film for components of silicon deep etching equipment for MEMS *For more details, please refer to the PDF document or feel free to contact us.

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Product catalog for plasma-resistant and corrosion-resistant yttrium oxide films for etching device components.

Product catalog for plasma-resistant and corrosion-resistant yttrium oxide films for etching device components.

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Tsubasa Vacuum Research Institute Co., Ltd. Company Profile

Tsubasa Vacuum Research Institute Co., Ltd. Company Profile

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つばさ真空理研

つばさ真空理研 横浜ラボラトリー

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Tsubasa Vacuum Research Co., Ltd. was established in 2019 as a consulting company related to protective films for semiconductor manufacturing equipment parts, leveraging years of experience in the semiconductor industry. In 2021, to materialize the know-how accumulated thus far and accelerate its implementation, we transformed into a "contract coating venture company" that also supplies corrosion-resistant protective films for manufacturing equipment used in Japan. When high melting point metal oxide films are considered as dense films, many applications beyond semiconductors emerge. By aiming for the pinnacle of niche industries, our company contributes to many industries and ultimately dedicates itself to the sustainable development of the future.

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