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Glove box Product List and Ranking from 74 Manufacturers, Suppliers and Companies

Last Updated: Aggregation Period:Dec 24, 2025~Jan 20, 2026
This ranking is based on the number of page views on our site.

Glove box Manufacturer, Suppliers and Company Rankings

Last Updated: Aggregation Period:Dec 24, 2025~Jan 20, 2026
This ranking is based on the number of page views on our site.

  1. 神港精機 東京支店 Tokyo//Industrial Machinery
  2. アイビック・リサーチ Ibaraki//Testing, Analysis and Measurement
  3. 昭和真空 Kanagawa//Industrial Machinery
  4. 4 美和製作所 営業部 Osaka//Industrial Electrical Equipment
  5. 5 エイエルエステクノロジー Kanagawa//Testing, Analysis and Measurement

Glove box Product ranking

Last Updated: Aggregation Period:Dec 24, 2025~Jan 20, 2026
This ranking is based on the number of page views on our site.

  1. Powder Artificial Gastric Juice Artificial Intestinal Juice BioWise アイビック・リサーチ
  2. Conveyor Furnace "SBC Series" 三共
  3. Contract film deposition service for experimental and research development purposes: "ALD (Atomic Layer Deposition) Equipment" ワッティー
  4. Research and development sputtering equipment 芝浦メカトロニクス
  5. 5 Thermal ALD (Atomic Layer Deposition) equipment ハイテック・システムズ

Glove box Product List

211~225 item / All 226 items

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Atmospheric Pressure Ion Source "SICRIT"

High-sensitivity analysis ion source for volatile components, easily connects to LCMS, direct ion source with ppt sensitivity.

The "SICRIT" developed by Plasmion is an ion source unit equipped with a flow-through soft ionization technology, which is the first of its kind for atmospheric pressure mass spectrometry. It is directly attached to the sample introduction section of the MS and ionizes molecules drawn into the introduction section using a uniquely shaped cold plasma. Since the plasma is generated just before the introduction section, the transmission rate and thus the sensitivity are significantly improved. It can be connected to LC and GC systems. 【Features】 ■ Robust and high sensitivity. A versatile ion source ■ Enables high-sensitivity analysis in the ppt order ■ Easily attachable to LC-MS systems from various manufacturers and ready for immediate use ■ Usable with LC and GC. Also capable of ppq order analysis with direct SPME-MS ■ No sample pretreatment or ionization adjustment required *For more details, please refer to the PDF document or feel free to contact us.

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Free Chamber Order System

Vacuum chamber design system that responds with a variety of colorful variations.

The "Free Chamber Order System" is a vacuum chamber design system planned on the premise of flexibly combining the various know-how accumulated by our company. By combining various technical sources, it enables us to offer solutions at a lower cost and with shorter delivery times. 【Equipment (excerpt)】 ■ Exhaust System - Rotary Pump - Turbo Molecular Pump ■ Film Deposition Sources - Sputtering Cathode - Electron Beam Evaporation Source ■ Other Mechanisms - Sample Stage Rotation and Vertical Movement Mechanism (Automatic/Manual) - Window with Shutter Mechanism *For more details, please download the PDF or feel free to contact us.

  • Vacuum Equipment
  • Processing Contract

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Glass for glove box (NC processing)

Various types of deformation processing, drilling, and cutting are possible.

We are confident in our technology and quality! If you are struggling with the processing of plate glass or mirrors, please feel free to consult us. Ikawa Plate Glass and Mirror Industry has focused on mechanization and mass production of glass processing, as well as enhancing our machinery and equipment. As a young player in the processing industry, we have sought to adapt to the times in the glass processing business and have come to occupy a significant position in the field of industrial glass processing. In particular, we are consistently introducing NC machines for high value-added processing and for the beveling process, which is said to be lacking in the industry as a whole, maintaining a mass production stance. *For more details, please contact us.

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Linear Ion Source "LION"

Robust and scalable design! High-energy, strongly focused beam.

"LION" is a component suitable for pre-treatment and surface modification. It removes hydrocarbons through argon processing and can add oxygen if necessary. The ion beam is strongly focused and has high energy. It is an ideal device for inline film deposition systems that require physical etching, and due to its simple and robust design, the ion source can be easily scaled up. The main applications are large-area glass film deposition and metal foil deposition. 【Features】 ■ Removes hydrocarbons through argon processing and can add oxygen if necessary ■ Available in an external version with adjustable angle and a flange-mounted version ■ Robust and scalable design ■ High-energy, strongly focused beam ■ Pre-treatment of various types of substrate materials *For more details, please refer to the PDF materials or feel free to contact us.

  • Electron beam lithography equipment

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Kiwa Industries Co., Ltd.

Processing technology recognized in the semiconductor manufacturing equipment industry.

We own many processing machines such as NC lathes, machining centers, and composite processing machines, and we are equipped with TIG welding processes, surface treatment processes, and leak testing processes, enabling consistent product manufacturing. Business Description: Centered around vacuum technology, we are expanding our business with three main pillars: vacuum component manufacturing, precision machining, and vacuum equipment sales. Main Processing Content: Precision cutting processing / Welding processing Main Products: Vacuum piping / Vacuum equipment components / Parts for vacuum pumps / Chambers for medical devices Processing Materials: Strong in precision cutting of difficult materials such as stainless steel, Hastelloy, and aluminum Specialized Fields: Vacuum equipment components and piping, stainless steel/aluminum parts and piping for semiconductor manufacturing equipment

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Horizontal hydrogen annealing device (variable atmosphere heat treatment device)

Supports small-diameter wafers (4 inches) and niche processes for compound semiconductors. Compatible with both crystal processes and wafer processes (alloying and electrode annealing).

A dedicated annealing device designed for special applications such as epitaxial layers of compound semiconductors and the annealing of polished Si wafers. After high vacuum evacuation, the atmosphere is replaced with hydrogen up to atmospheric pressure, allowing for uniform heating at high temperatures (1000°C) in a high-purity reducing atmosphere.

  • Annealing furnace
  • Electric furnace
  • Other surface treatment equipment

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ALN coating device (high-density plasma sputtering ADMS device)

Forming crystalline AlN films with high-density plasma sputtering, compatible with full coating on three-dimensional shapes. Fully automated mass production equipment lineup.

A high-density plasma sputtering method developed in-house, the ADMS method (arc discharge type magnetron sputtering), enables the deposition of a dense AlN film on three-dimensional substrates, unlike anything seen before. It achieves a high-density plasma sputtering with ten times the amount of ions compared to conventional methods. With a unique high-reactivity sputtering process, crystalline AlN is formed at low temperatures below 500°C. This new thin-film formation device creates new surface functions for everything from electronic devices to mechanical parts.

  • Other processing machines
  • Plasma surface treatment equipment

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Vacuum Type Glove Box "GBJV120"

It is possible to shorten the restart time during glove changes and other situations!

The "GBJV120" is a type of glove box that can perform vacuum gas replacement for both the main box and the pass box. It can shorten the re-start time after the removal of harmful substances, after handling large items, and during glove replacement. Additionally, by connecting to an inert gas circulation purification system, it allows for work to be conducted in a better atmosphere. 【Features】 ■ Type that allows vacuum replacement for both the main box and the pass box ■ Capable of reducing re-start time during glove replacement ■ Allows for work in a better atmosphere by connecting to an inert gas circulation purification system *The image shows the vacuum type glove box "GBJV080." *For more details, please refer to the catalog or feel free to contact us.

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Glovebox "Pure Box"

Shutting out oxygen and moisture! With voice transmission and recognition functions, voice operation is possible without touching.

Glove Box: "Realizing Custom-Made Products" We design and manufacture devices that can support our customers' research. The "Glove Box" (our product name "Pure Box") is a product that allows handling and working with samples that cannot be managed in the air by using gloves attached to a highly airtight stainless steel container. In addition to providing an environment through the "manufacturing" of glove boxes and gas circulation purification devices, we are also committed to "unique development" aimed at the evolution of our devices every day. For example, responding to customer requests to reduce the vibration and noise of the device itself, we have developed a unique silencer, commercialized it, and received evaluations after installing it on customer devices. Additionally, it features voice recognition capabilities, allowing operation via voice without removing hands from the gloves. It can recognize voice commands to start and stop, and it informs users of operation details and abnormalities through voice. (Note: Voice operation is limited to certain commands.)

  • Environmental Test Equipment
  • Other laboratory equipment and containers

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Ittria Coating Device (AF-IP Device)

A yttrium (Y2O3) film with excellent plasma resistance is formed using the PVD method. A thick film (10μm) is achieved with a newly developed ion plating method.

A dense oxide film with a thickness of 10 μm is formed at low temperatures using a newly developed arc filament-type ion plating method. This method enables the deposition of yttria films with excellent plasma resistance, suitable for semiconductor manufacturing equipment components. A simple process using ion plating achieves a dense film quality. Not only yttria films but also various reactive films such as SiC, TiC, and CrN can be formed from solid metal materials. The uniquely developed ion plating method opens up new applications for surface treatment.

  • Other machine tools
  • Other processing machines
  • Other semiconductor manufacturing equipment

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Hydrogen annealing device (for electronic devices, currently supporting sample testing)

Uniform heating in atmospheric pressure hydrogen atmosphere. Providing flexible hard support and sample testing with abundant experience and track record for thin films, wafers, compound, and ceramic substrates.

Maximizing the reducing power of hydrogen to achieve high-quality thin films and substrate surfaces that are unprecedented. Ideal for thermal processing (bake and anneal) of delicate compound devices and dielectric substrates. High reliability supported by proven results and experience ensures safety. Responding from the initial stage, including testing, based on extensive achievements in enhancing the quality of electrodes and wiring films, controlling the resistance and stress of high melting point metal films, and end processing of polished wafers for special applications.

  • Annealing furnace
  • Oxidation/Diffusion Device
  • Heating device

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Inert gas circulation purification device

Inert gas circulation purification device - deoxygenation device

The power supply is fine with a plug. It does not require cooling water. It is repeatable. We also have a lineup of dewatering devices and deoxygenation dewatering devices.

  • Glove box

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Vacuum-type glove box 'GBJV065'

Standard equipment includes main box fluorescent lights, internal sample shelves, and internal outlets!

The "GBJV065" is a type of glove box that allows for vacuum gas replacement in both the main box and the pass box. During manual operations inside the box, precise internal pressure can be controlled using a footswitch-type internal pressure regulator. The gas replacement operation bubbles are concentrated on the panel. Additionally, it comes standard with internal lighting in the main box, an internal sample shelf, two internal outlets, and a spare port. 【Features】 ■ Type that allows vacuum replacement in both the main box and the pass box ■ Equipped with a footswitch-type internal pressure regulator ■ Allows for precise control of internal pressure during manual operations ■ Standard features include internal lighting in the main box, an internal sample shelf, internal outlets, and a spare port ■ Gas replacement operation bubbles are concentrated on the panel *The image shows the vacuum-type glove box "GBJV050." *For more details, please refer to the catalog or feel free to contact us.

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Vacuum Type Glove Box "GBJV100"

Even during manual operation, exquisite control of internal pressure is possible! It is equipped with a foot switch type internal pressure regulator.

The "GBJV100" is a type of glove box that can perform vacuum gas replacement for both the main box and the pass box. The gas replacement operation bubble is concentrated on the panel. Additionally, by using a footswitch-type internal pressure regulator, precise internal pressure control is possible even during manual operations inside the box. The main box is also equipped with internal lighting, an internal sample shelf, two internal outlets, a spare port, and a dedicated stand as standard features. 【Features】 ■ Type that allows vacuum replacement for both the main box and the pass box ■ Equipped with a footswitch-type internal pressure regulator ■ Precise internal pressure control possible even during manual operations ■ Standard equipment includes internal lighting, internal sample shelf, internal outlets, spare port, and dedicated stand ■ Gas replacement operation bubble is concentrated on the panel *The image shows the vacuum-type glove box "GBJV080." *For more details, please refer to the catalog or feel free to contact us.

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[Custom-made Specialized Equipment Manufacturing Case] Annealing Device

We will introduce a case of achieving miniaturization and weight reduction of a device for annealing (baking) silicon thin films.

We would like to introduce a case of modifying an "annealing device" for the semiconductor industry. It was necessary to renew the electrical equipment of the existing machine due to aging. The machine operates by creating a low vacuum in the chamber and injecting nitrogen for transport, while maintaining vacuum pressure when moving from the stocker to the annealing stage, and it was requested to design it so that only the stocker part can be removed, as well as to arrange cleaning windows for easier cleaning. We achieved miniaturization and weight reduction through the modification of the existing machine, meeting the requirements. [Case Overview] ■ Issues - Maintain vacuum pressure when moving from the stocker to the annealing stage - Design a structure that allows only the stocker part to be removed - Arrange cleaning windows for easier cleaning *For more details, please feel free to contact us.

  • Other machine tools

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