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  5. Annealing furnace
  6. Hydrogen annealing device (for electronic devices, currently supporting sample testing)

Hydrogen annealing device (for electronic devices, currently supporting sample testing)

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last updated:Apr 30, 2020

神港精機 東京支店
神港精機 東京支店
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Uniform heating in atmospheric pressure hydrogen atmosphere. Providing flexible hard support and sample testing with abundant experience and track record for thin films, wafers, compound, and ceramic substrates.

Maximizing the reducing power of hydrogen to achieve high-quality thin films and substrate surfaces that are unprecedented. Ideal for thermal processing (bake and anneal) of delicate compound devices and dielectric substrates. High reliability supported by proven results and experience ensures safety. Responding from the initial stage, including testing, based on extensive achievements in enhancing the quality of electrodes and wiring films, controlling the resistance and stress of high melting point metal films, and end processing of polished wafers for special applications.

    Annealing furnaceOxidation/Diffusion DeviceHeating device
真空アニール炉.jpg

Hydrogen annealing device (for electronic devices, currently supporting sample testing)

真空アニール炉.jpg
真空アニール炉.jpg
  • Special site - Product/service details - https://pr.mono.ipros.com/shinko-seiki/product/

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basic information

The standard is a horizontal furnace with a quartz tube compatible with 6-inch wafers, with options for 8-inch and vertical furnaces. A high vacuum exhaust system can also be equipped, allowing for heat treatment in a more pure reducing atmosphere. In addition to a proven equipment configuration, there is a rich lineup of peripheral devices such as boat loaders and data logging mechanisms. There is also a dedicated annealing device that can accommodate inert atmosphere annealing.

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Applications/Examples of results

Semiconductor - Wafer thermal treatment after polishing - Electrode film sintering - High melting point metal film annealing - Compound semiconductor bake SAW device - Dielectric wafer annealing Flexible device - Metal wiring pattern firing Small metal parts reduction annealing

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Variable Atmosphere Heat Treatment Device

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Catalog of Heat Treatment Equipment for Electronic Devices

Catalog of Heat Treatment Equipment for Electronic Devices

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Annealing device "Variable Atmosphere Heat Treatment Device"

Annealing device "Variable Atmosphere Heat Treatment Device"

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Liftoff process compatible vacuum deposition device

Liftoff process compatible vacuum deposition device

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[Prototype and Mass Production] Load Rock Sputtering Device

[Prototype and Mass Production] Load Rock Sputtering Device

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Plasma Etching Device "EXAM" Brochure

Plasma Etching Device "EXAM" Brochure

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ICP plasma etching device "SERIO"

ICP plasma etching device "SERIO"

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Hydrogen annealing device

Hydrogen annealing device

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Company information

神港精機

神港精機 東京支店

Industrial Machinery

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Shinko Seiki, as a technology-driven manufacturer, leverages the numerous know-how accumulated particularly in the field of vacuum equipment to deliver innovative products that meet user needs. In recent years, the company has also been challenging cutting-edge fields such as electronics and new materials, aiming to develop truly valuable hardware and software through the advancement of distinctive technologies and their organic integration.

Product/Service List (87)

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The related categories of Annealing furnace

  • Manufacturing and processing machinery
  • Semiconductor Manufacturing Equipment
  • Annealing furnace
  • Oxidation/Diffusion Device
  • Scientific and Physics Equipment
  • Heating equipment/furnace
  • Heating device
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